Holger Kierey

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Arrangement for an EUV lithography apparatus
- Patent number 11,231,658
- Issue date Jan 25, 2022
- Carl Zeiss SMT GmbH
- Holger Kierey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for repairing reflective optical elements for EUV lithography
- Patent number 11,099,484
- Issue date Aug 24, 2021
- Carl Zeiss SMT GmbH
- Robert Meier
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV collector for use in an EUV projection exposure apparatus
- Patent number 10,578,972
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Grant
Optical element, in particular for a microlithographic projection e...
- Patent number 10,578,974
- Issue date Mar 3, 2020
- Carl Zeiss SMT GmbH
- Ralf Moser
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV Collector
- Patent number 10,503,075
- Issue date Dec 10, 2019
- Carl Zeiss SMT GmbH
- Ingrid Schuster
- G02 - OPTICS
Information Patent Grant
Cooler for use in a device in a vacuum
- Patent number 10,303,067
- Issue date May 28, 2019
- Carl Zeiss SMT GmbH
- Willi Anderl
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Method for producing a reflective optical component for an EUV proj...
- Patent number 9,541,685
- Issue date Jan 10, 2017
- Carl Zeiss SMT GmbH
- Holger Kierey
- B24 - GRINDING POLISHING
Information Patent Grant
Reflective optical element for use in an EUV system
- Patent number 8,342,701
- Issue date Jan 1, 2013
- Carl Zeiss Laser Optics GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Grant
Optical devices and related systems and methods
- Patent number 7,629,572
- Issue date Dec 8, 2009
- Carl Zeiss Laser Optics GmbH
- Vitaliy Shklover
- G02 - OPTICS
Information Patent Grant
Method for manufacturing a blazed grating, such a blazed grating an...
- Patent number 7,175,773
- Issue date Feb 13, 2007
- Carl Zeiss Laser Optics GmbH
- Klaus Heidemann
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL

Patents Applicationslast 30 patents

Information Patent Application
MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE AP...
- Publication number 20210263423
- Publication date Aug 26, 2021
- Carl Zeiss SMT GMBH
- Christof Jalics
- G02 - OPTICS
Information Patent Application
ARRANGEMENT FOR AN EUV LITHOGRAPHY APPARATUS
- Publication number 20200285142
- Publication date Sep 10, 2020
- Carl Zeiss SMT GMBH
- Holger KIEREY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION E...
- Publication number 20190302624
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Ralf Moser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY
- Publication number 20190302628
- Publication date Oct 3, 2019
- Carl Zeiss SMT GMBH
- Robert MEIER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV COLLECTOR
- Publication number 20190094699
- Publication date Mar 28, 2019
- Carl Zeiss SMT GMBH
- Ingrid Schuster
- G02 - OPTICS
Information Patent Application
EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS
- Publication number 20190033723
- Publication date Jan 31, 2019
- Carl Zeiss SMT GMBH
- Holger Kierey
- G02 - OPTICS
Information Patent Application
COOLER FOR USE IN A DEVICE IN A VACUUM
- Publication number 20160299443
- Publication date Oct 13, 2016
- Carl Zeiss SMT GMBH
- Willi Anderl
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENT
- Publication number 20150092170
- Publication date Apr 2, 2015
- CARL ZEISS LASER OPTICS GmbH
- Oli Ehrler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCE
- Publication number 20150083938
- Publication date Mar 26, 2015
- CARL ZEISS LASER OPTICS GmbH
- Willi Anderl
- G02 - OPTICS
Information Patent Application
METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJ...
- Publication number 20130335816
- Publication date Dec 19, 2013
- Holger Kierey
- G02 - OPTICS
Information Patent Application
EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY
- Publication number 20130176614
- Publication date Jul 11, 2013
- CARL ZEISS LASER OPTICS GmbH
- Willi Anderl
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM
- Publication number 20110051267
- Publication date Mar 3, 2011
- CARL ZEISS LASER OPTICS GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Application
Optical devices and related systems and methods
- Publication number 20080272275
- Publication date Nov 6, 2008
- Vitaliy Shklover
- G02 - OPTICS
Information Patent Application
Method for manufacturing an optical element having a structured sur...
- Publication number 20040179564
- Publication date Sep 16, 2004
- Mandred Maul
- G02 - OPTICS

Holger Kierey

Person

Patents Grantslast 30 patents

Arrangement for an EUV lithography apparatus

Method for repairing reflective optical elements for EUV lithography

Reflective optical element for EUV lithography

EUV collector for use in an EUV projection exposure apparatus

Optical element, in particular for a microlithographic projection e...

EUV Collector

Cooler for use in a device in a vacuum

Method for producing a reflective optical component for an EUV proj...

Reflective optical element for use in an EUV system

Optical devices and related systems and methods

Method for manufacturing a blazed grating, such a blazed grating an...

Patents Applicationslast 30 patents

MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOSURE AP...

ARRANGEMENT FOR AN EUV LITHOGRAPHY APPARATUS

OPTICAL ELEMENT, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION E...

METHOD FOR REPAIRING REFLECTIVE OTPICAL ELEMENTS FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

EUV COLLECTOR

EUV COLLECTOR FOR USE IN AN EUV PROJECTION EXPOSURE APPARATUS

COOLER FOR USE IN A DEVICE IN A VACUUM

METHOD FOR REPAIRING OPTICAL ELEMENTS, AND OPTICAL ELEMENT

COOLER FOR PLASMA GENERATION CHAMBER OF EUV RADIATION SOURCE

METHOD FOR PRODUCING A REFLECTIVE OPTICAL COMPONENT FOR AN EUV PROJ...

EUV COLLECTOR MIRROR SHELL OF AN EUV COLLECTOR FOR EUV LITHOGRAPHY

REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM

Optical devices and related systems and methods

Method for manufacturing an optical element having a structured sur...