Holger MALTOR

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate for an EUV-lithography mirror
- Patent number 10,935,704
- Issue date Mar 2, 2021
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Grant
Substrate for mirrors for EUV lithography
- Patent number 8,976,927
- Issue date Mar 10, 2015
- Carl Zeiss SMT GmbH
- Claudia Ekstein
- G02 - OPTICS
Information Patent Grant
Irradiation with high energy ions for surface structuring and treat...
- Patent number 8,466,047
- Issue date Jun 18, 2013
- Carl Zeiss SMT GmbH
- Martin Weiser
- G02 - OPTICS
Information Patent Grant
Irradiation with high energy ions for surface structuring and treat...
- Patent number 8,163,632
- Issue date Apr 24, 2012
- Carl Zeiss SMT GmbH
- Martin Weiser
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR
- Publication number 20210149093
- Publication date May 20, 2021
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR
- Publication number 20170160447
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR
- Publication number 20130301151
- Publication date Nov 14, 2013
- Claudia EKSTEIN
- C22 - METALLURGY FERROUS OR NON-FERROUS ALLOYS TREATMENT OF ALLOYS OR NON-FER...
Information Patent Application
SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY
- Publication number 20130170056
- Publication date Jul 4, 2013
- Carl Zeiss SMT GMBH
- Claudia EKSTEIN
- G02 - OPTICS
Information Patent Application
IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...
- Publication number 20120206795
- Publication date Aug 16, 2012
- Martin WEISER
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE...
- Publication number 20100033696
- Publication date Feb 11, 2010
- Carl Zeiss SMT AG
- Thure BOEHM
- B24 - GRINDING POLISHING
Information Patent Application
IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...
- Publication number 20080149858
- Publication date Jun 26, 2008
- Carl Zeiss SMT AG
- Martin Weiser
- G02 - OPTICS

Holger MALTOR

Person

Patents Grantslast 30 patents

Substrate for an EUV-lithography mirror

Substrate for mirrors for EUV lithography

Irradiation with high energy ions for surface structuring and treat...

Irradiation with high energy ions for surface structuring and treat...

Patents Applicationslast 30 patents

SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR

SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR

SUBSTRATE FOR AN EUV-LITHOGRAPHY MIRROR

SUBSTRATE FOR MIRRORS FOR EUV LITHOGRAPHY

IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...

METHOD AND APPARATUS FOR PRODUCING AN ELEMENT HAVING AT LEAST ONE...

IRRADIATION WITH HIGH ENERGY IONS FOR SURFACE STRUCTURING AND TREAT...