Holger Schmidt

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Aalen, DE

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Patents Grantslast 30 patents

Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 12,025,818
- Issue date Jul 2, 2024
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 11,112,543
- Issue date Sep 7, 2021
- Carl Zeiss SMT GmbH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Optical element having a coating for influencing heating radiation...
- Patent number 10,401,540
- Issue date Sep 3, 2019
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS
Information Patent Grant
Projection lens for EUV microlithography, film element and method f...
- Patent number 10,001,631
- Issue date Jun 19, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20210364677
- Publication date Nov 25, 2021
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20190377107
- Publication date Dec 12, 2019
- Carl Zeiss SMT GMBH
- Boris Bittner
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20170261730
- Publication date Sep 14, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT HAVING A COATING FOR INFLUENCING HEATING RADIATION...
- Publication number 20170123118
- Publication date May 4, 2017
- Carl Zeiss SMT GMBH
- Boris Bittner
- G02 - OPTICS
Information Patent Application
MIRROR FOR A MICROLITHOGRAPHIC PROJECTION EXPOSURE SYSTEM AND METHO...
- Publication number 20160161852
- Publication date Jun 9, 2016
- Carl Zeiss SMT GMBH
- Karl-Heinz SCHUSTER
- G02 - OPTICS
Information Patent Application
Projection Lens for EUV Microlithography, Film Element and Method f...
- Publication number 20140347721
- Publication date Nov 27, 2014
- Boris Bittner
- B82 - NANO-TECHNOLOGY