Holger Seitz

Person

Jene, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 11,867,642
- Issue date Jan 9, 2024
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for characterizing a microlithographic mask
- Patent number 11,619,882
- Issue date Apr 4, 2023
- Carl Zeiss SMT GmbH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Inspection device for masks for semiconductor lithography and method
- Patent number 10,928,332
- Issue date Feb 23, 2021
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Method and appliance for predicting the imaging result obtained wit...
- Patent number 10,788,748
- Issue date Sep 29, 2020
- Carl Zeiss SMT GmbH
- Thomas Thaler
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for characterizing a mask for microlithography
- Patent number 10,698,318
- Issue date Jun 30, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for a metrology system and metrology syst...
- Patent number 10,578,881
- Issue date Mar 3, 2020
- Carl Zeiss AG
- Thomas Frank
- G02 - OPTICS
Information Patent Grant
Method and device for determining an OPC model
- Patent number 10,539,865
- Issue date Jan 21, 2020
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Illumination optical unit for a metrology system and metrology syst...
- Patent number 10,168,539
- Issue date Jan 1, 2019
- Carl Zeiss SMT GmbH
- Thomas Frank
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Illumination optical unit for a metrology system and metrology syst...
- Patent number 9,904,060
- Issue date Feb 27, 2018
- Carl Zeiss AG
- Thomas Frank
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Emulation of reproduction of masks corrected by local density varia...
- Patent number 9,535,244
- Issue date Jan 3, 2017
- Carl Zeiss SMT GmbH
- Holger Seitz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microscope and method for characterizing structures on an object
- Patent number 9,268,124
- Issue date Feb 23, 2016
- Carl Zeiss SMS GmbH
- Holger Seitz
- G02 - OPTICS
Information Patent Grant
Method for characterizing a feature on a mask and device for carryi...
- Patent number 9,222,897
- Issue date Dec 29, 2015
- Carl Zeiss SMT GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Grant
Mask inspection microscope with variable illumination setting
- Patent number 8,970,951
- Issue date Mar 3, 2015
- Carl Zeiss SMS GmbH
- Ulrich Matejka
- G02 - OPTICS
Information Patent Grant
Method and apparatus for measuring of masks for the photo-lithography
- Patent number 8,730,474
- Issue date May 20, 2014
- Carl Zeiss SMS GmbH
- Thomas Scheruebl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK
- Publication number 20220075272
- Publication date Mar 10, 2022
- Carl Zeiss SMT GMBH
- Ulrich Matejka
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD
- Publication number 20210156809
- Publication date May 27, 2021
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...
- Publication number 20190121145
- Publication date Apr 25, 2019
- Carl-Zeiss AG
- Thomas Frank
- G02 - OPTICS
Information Patent Application
METHOD AND APPLIANCE FOR PREDICTING THE IMAGING RESULT OBTAINED WIT...
- Publication number 20190107776
- Publication date Apr 11, 2019
- Carl Zeiss SMT GMBH
- Thomas Thaler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY
- Publication number 20190011839
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Holger Seitz
- G02 - OPTICS
Information Patent Application
INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD
- Publication number 20190011376
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...
- Publication number 20180173001
- Publication date Jun 21, 2018
- Carl-Zeiss AG
- Thomas Frank
- G02 - OPTICS
Information Patent Application
METHOD AND DEVICE FOR DETERMINING AN OPC MODEL
- Publication number 20180095358
- Publication date Apr 5, 2018
- Carl Zeiss SMT GMBH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...
- Publication number 20150198798
- Publication date Jul 16, 2015
- CARL ZEISS SMS GMBH
- Holger Seitz
- G02 - OPTICS
Information Patent Application
ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...
- Publication number 20150001408
- Publication date Jan 1, 2015
- Carl-Zeiss AG
- Thomas Frank
- G01 - MEASURING TESTING
Information Patent Application
MICROSCOPE AND METHOD FOR CHARACTERIZING STRUCTURES ON AN OBJECT
- Publication number 20130321609
- Publication date Dec 5, 2013
- Holger Seitz
- G02 - OPTICS
Information Patent Application
MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING
- Publication number 20120162755
- Publication date Jun 28, 2012
- CARL ZEISS SMS GMBH
- Ulrich Stroessner
- G02 - OPTICS
Information Patent Application
METHOD FOR CHARACTERIZING A FEATURE ON A MASK AND DEVICE FOR CARRYI...
- Publication number 20120075456
- Publication date Mar 29, 2012
- Carl Zeiss SMS GmbH
- Holger Seitz
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR MEASURING OF MASKS FOR THE PHOTO-LITHOGRAPHY
- Publication number 20110016437
- Publication date Jan 20, 2011
- Thomas Scherübl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Holger Seitz

Person

Patents Grantslast 30 patents

Inspection device for masks for semiconductor lithography and method

Method and apparatus for characterizing a microlithographic mask

Inspection device for masks for semiconductor lithography and method

Method and appliance for predicting the imaging result obtained wit...

Method and device for characterizing a mask for microlithography

Illumination optical unit for a metrology system and metrology syst...

Method and device for determining an OPC model

Illumination optical unit for a metrology system and metrology syst...

Illumination optical unit for a metrology system and metrology syst...

Emulation of reproduction of masks corrected by local density varia...

Microscope and method for characterizing structures on an object

Method for characterizing a feature on a mask and device for carryi...

Mask inspection microscope with variable illumination setting

Method and apparatus for measuring of masks for the photo-lithography

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR CHARACTERIZING A MICROLITHOGRAPHIC MASK

INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...

METHOD AND APPLIANCE FOR PREDICTING THE IMAGING RESULT OBTAINED WIT...

METHOD AND DEVICE FOR CHARACTERIZING A MASK FOR MICROLITHOGRAPHY

INSPECTION DEVICE FOR MASKS FOR SEMICONDUCTOR LITHOGRAPHY AND METHOD

ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...

METHOD AND DEVICE FOR DETERMINING AN OPC MODEL

EMULATION OF REPRODUCTION OF MASKS CORRECTED BY LOCAL DENSITY VARIA...

ILLUMINATION OPTICAL UNIT FOR A METROLOGY SYSTEM AND METROLOGY SYST...

MICROSCOPE AND METHOD FOR CHARACTERIZING STRUCTURES ON AN OBJECT

MASK INSPECTION MICROSCOPE WITH VARIABLE ILLUMINATION SETTING

METHOD FOR CHARACTERIZING A FEATURE ON A MASK AND DEVICE FOR CARRYI...

METHOD AND APPARATUS FOR MEASURING OF MASKS FOR THE PHOTO-LITHOGRAPHY