Holger Tuitje

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Normal-incident in-situ process monitor sensor
- Patent number 10,978,278
- Issue date Apr 13, 2021
- Tokyo Electron Limited
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatially resolved optical emission spectroscopy (OES) in plasma pr...
- Patent number 10,473,525
- Issue date Nov 12, 2019
- Tokyo Electron Limited
- Ching-Ling Meng
- G01 - MEASURING TESTING
Information Patent Grant
Spatially resolved optical emission spectroscopy (OES) in plasma pr...
- Patent number 9,970,818
- Issue date May 15, 2018
- Tokyo Electron Limited
- Junwei Bao
- G01 - MEASURING TESTING
Information Patent Grant
Differential acoustic time of flight measurement of temperature of...
- Patent number 9,846,088
- Issue date Dec 19, 2017
- Tokyo Electron Limited
- Jun Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System for in-situ film stack measurement during etching and etch c...
- Patent number 9,059,038
- Issue date Jun 16, 2015
- Tokyo Electron Limited
- Shifang Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Diffraction order sorting filter for optical metrology
- Patent number 8,107,073
- Issue date Jan 31, 2012
- Tokyo Electron Limited
- Adam Norton
- G01 - MEASURING TESTING
Information Patent Grant
Calibration method for optical metrology
- Patent number 7,924,422
- Issue date Apr 12, 2011
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Matching optical metrology tools using spectra enhancement
- Patent number 7,505,148
- Issue date Mar 17, 2009
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Matching optical metrology tools using hypothetical profiles
- Patent number 7,446,887
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Matching optical metrology tools using diffraction signals
- Patent number 7,446,888
- Issue date Nov 4, 2008
- Tokyo Electron Limited
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Grant
Drift compensation for an optical metrology tool
- Patent number 7,428,044
- Issue date Sep 23, 2008
- Tokyo Electron Limited
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for position-dependent optical metrology calib...
- Patent number 7,224,450
- Issue date May 29, 2007
- Tokyo Electron Limited
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for position-dependent optical metrology calib...
- Patent number 7,215,419
- Issue date May 8, 2007
- Tokyo Electron Limited
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for position-dependent optical metrology calib...
- Patent number 7,095,496
- Issue date Aug 22, 2006
- Tokyo Electron Limited
- Abdurrahman Sezginer
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR
- Publication number 20210193444
- Publication date Jun 24, 2021
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR
- Publication number 20200043710
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Ching Ling Meng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEG...
- Publication number 20200043764
- Publication date Feb 6, 2020
- TOKYO ELECTRON LIMITED
- Robert Clark
- G05 - CONTROLLING REGULATING
Information Patent Application
SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEG...
- Publication number 20200006100
- Publication date Jan 2, 2020
- TOKYO ELECTRON LIMITED
- Robert Clark
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...
- Publication number 20180286643
- Publication date Oct 4, 2018
- TOKYO ELECTRON LIMITED
- Holger TUITJE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...
- Publication number 20170314991
- Publication date Nov 2, 2017
- TOKYO ELECTRON LIMITED
- Ching-Ling MENG
- G01 - MEASURING TESTING
Information Patent Application
SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...
- Publication number 20150124250
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Junwei BAO
- G01 - MEASURING TESTING
Information Patent Application
DIFFERENTIAL ACOUSTIC TIME OF FLIGHT MEASUREMENT OF TEMPERATURE OF...
- Publication number 20150078416
- Publication date Mar 19, 2015
- TOKYO ELECTRON LIMITED
- Jun PEI
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...
- Publication number 20140024143
- Publication date Jan 23, 2014
- TOKYO ELECTRON LIMITED
- Shifang LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION METHOD FOR OPTICAL METROLOGY
- Publication number 20100201981
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Fred STANKE
- G01 - MEASURING TESTING
Information Patent Application
DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY
- Publication number 20100202055
- Publication date Aug 12, 2010
- TOKYO ELECTRON LIMITED
- Adam Norton
- G02 - OPTICS
Information Patent Application
Drift compensation for an optical metrology tool
- Publication number 20080117437
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using spectra enhancement
- Publication number 20080117411
- Publication date May 22, 2008
- TOKYO ELECTRON LIMITED
- Vi Vuong
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using hypothetical profiles
- Publication number 20070268497
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
Matching optical metrology tools using diffraction signals
- Publication number 20070268498
- Publication date Nov 22, 2007
- TOKYO ELECTRON LIMITED
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for position-dependent optical metrology calib...
- Publication number 20060164632
- Publication date Jul 27, 2006
- TOKYO ELECTRON LIMITED
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for position-dependent optical metrology calib...
- Publication number 20060146321
- Publication date Jul 6, 2006
- Therma-Wave, Inc. to Tokyo Electron Limited
- Abdurrahman Sezginer
- G01 - MEASURING TESTING
Information Patent Application
Method and apparatus for position-dependent optical metrology calib...
- Publication number 20030147070
- Publication date Aug 7, 2003
- Abdurrahman Sezginer
- G01 - MEASURING TESTING

Holger Tuitje

Person

Patents Grantslast 30 patents

Normal-incident in-situ process monitor sensor

Spatially resolved optical emission spectroscopy (OES) in plasma pr...

Spatially resolved optical emission spectroscopy (OES) in plasma pr...

Differential acoustic time of flight measurement of temperature of...

System for in-situ film stack measurement during etching and etch c...

Diffraction order sorting filter for optical metrology

Calibration method for optical metrology

Matching optical metrology tools using spectra enhancement

Matching optical metrology tools using hypothetical profiles

Matching optical metrology tools using diffraction signals

Drift compensation for an optical metrology tool

Method and apparatus for position-dependent optical metrology calib...

Method and apparatus for position-dependent optical metrology calib...

Method and apparatus for position-dependent optical metrology calib...

Patents Applicationslast 30 patents

NORMAL-INCIDENCE IN-SITU PROCESS MONITOR SENSOR

NORMAL-INCIDENT IN-SITU PROCESS MONITOR SENSOR

SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEG...

SELF-AWARE AND CORRECTING HETEROGENOUS PLATFORM INCORPORATING INTEG...

ADVANCED OPTICAL SENSOR, SYSTEM, AND METHODOLOGIES FOR ETCH PROCESS...

SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...

SPATIALLY RESOLVED OPTICAL EMISSION SPECTROSCOPY (OES) IN PLASMA PR...

DIFFERENTIAL ACOUSTIC TIME OF FLIGHT MEASUREMENT OF TEMPERATURE OF...

SYSTEM FOR IN-SITU FILM STACK MEASUREMENT DURING ETCHING AND ETCH C...

CALIBRATION METHOD FOR OPTICAL METROLOGY

DIFFRACTION ORDER SORTING FILTER FOR OPTICAL METROLOGY

Drift compensation for an optical metrology tool

Matching optical metrology tools using spectra enhancement

Matching optical metrology tools using hypothetical profiles

Matching optical metrology tools using diffraction signals

Method and apparatus for position-dependent optical metrology calib...

Method and apparatus for position-dependent optical metrology calib...

Method and apparatus for position-dependent optical metrology calib...