Holger Walter

Person

Abtsgmuend, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical correction arrangement, projection objective having such an...
- Patent number 10,859,815
- Issue date Dec 8, 2020
- Carl Zeiss SMT GmbH
- Holger Walter
- G02 - OPTICS
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,684,551
- Issue date Jun 16, 2020
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,317,802
- Issue date Jun 11, 2019
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 10,054,860
- Issue date Aug 21, 2018
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 10,031,423
- Issue date Jul 24, 2018
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Projection exposure apparatus comprising a manipulator, and method...
- Patent number 9,760,019
- Issue date Sep 12, 2017
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,746,778
- Issue date Aug 29, 2017
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Microlithographic apparatus and method of varying a light irradianc...
- Patent number 9,720,336
- Issue date Aug 1, 2017
- Carl Zeiss SMT GmbH
- Holger Walter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,354,524
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV exposure apparatus with reflective elements having reduced infl...
- Patent number 9,316,929
- Issue date Apr 19, 2016
- Carl Zeiss SMT GmbH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Arrangement for mirror temperature measurement and/or thermal actua...
- Patent number 9,207,541
- Issue date Dec 8, 2015
- Carl Zeiss SMT GmbH
- Markus Hauf
- G01 - MEASURING TESTING
Information Patent Grant
Method of operating a microlithographic projection exposure apparat...
- Patent number 9,164,402
- Issue date Oct 20, 2015
- Carl Zeiss SMT GmbH
- Holger Walter
- G02 - OPTICS
Information Patent Grant
Optical system of microlithographic projection exposure apparatus a...
- Patent number 9,081,310
- Issue date Jul 14, 2015
- Carl Zeiss SMT GmbH
- Matthias Exler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 9,052,609
- Issue date Jun 9, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 8,928,858
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection exposure apparatus with optimized adjustment possibility
- Patent number 8,203,696
- Issue date Jun 19, 2012
- Carl Zeiss SMT GmbH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Symmetrical objective having four lens groups for microlithography
- Patent number 7,697,211
- Issue date Apr 13, 2010
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20190310555
- Publication date Oct 10, 2019
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20180299784
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL CORRECTION ARRANGEMENT, PROJECTION OBJECTIVE HAVING SUCH AN...
- Publication number 20180196256
- Publication date Jul 12, 2018
- Carl Zeiss SMT GMBH
- Holger Walter
- G02 - OPTICS
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20170315449
- Publication date Nov 2, 2017
- Carl Zeiss SMT GMBH
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20160252824
- Publication date Sep 1, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS COMPRISING A MANIPULATOR, AND METHOD...
- Publication number 20160216616
- Publication date Jul 28, 2016
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...
- Publication number 20160195818
- Publication date Jul 7, 2016
- Carl Zeiss SMT GMBH
- Norman Baer
- G02 - OPTICS
Information Patent Application
MICROLITHOGRAPHIC APPARATUS AND METHOD OF VARYING A LIGHT IRRADIANC...
- Publication number 20160004174
- Publication date Jan 7, 2016
- Carl Zeiss SMT GMBH
- Holger Walter
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARAT...
- Publication number 20140327892
- Publication date Nov 6, 2014
- Holger Walter
- G02 - OPTICS
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20140176924
- Publication date Jun 26, 2014
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Arrangement for mirror temperature measurement and/or thermal actua...
- Publication number 20130176544
- Publication date Jul 11, 2013
- Carl Zeiss SMT GMBH
- Markus Hauf
- G02 - OPTICS
Information Patent Application
EUV Exposure Apparatus
- Publication number 20130141707
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Norman Baer
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A...
- Publication number 20130016331
- Publication date Jan 17, 2013
- Carl Zeiss SMT GMBH
- Matthias Exler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20120188524
- Publication date Jul 26, 2012
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY
- Publication number 20110181855
- Publication date Jul 28, 2011
- Carl Zeiss SMT GMBH
- Boris Bittner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY
- Publication number 20090080086
- Publication date Mar 26, 2009
- Carl Zeiss SMT AG
- David R. Shafer
- G02 - OPTICS

Holger Walter

Person

Patents Grantslast 30 patents

Optical correction arrangement, projection objective having such an...

EUV exposure apparatus with reflective elements having reduced infl...

EUV exposure apparatus with reflective elements having reduced infl...

Projection exposure apparatus with optimized adjustment possibility

EUV exposure apparatus with reflective elements having reduced infl...

Projection exposure apparatus comprising a manipulator, and method...

EUV exposure apparatus with reflective elements having reduced infl...

Microlithographic apparatus and method of varying a light irradianc...

Projection exposure apparatus with optimized adjustment possibility

EUV exposure apparatus with reflective elements having reduced infl...

Arrangement for mirror temperature measurement and/or thermal actua...

Method of operating a microlithographic projection exposure apparat...

Optical system of microlithographic projection exposure apparatus a...

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

Projection exposure apparatus with optimized adjustment possibility

Symmetrical objective having four lens groups for microlithography

Patents Applicationslast 30 patents

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

OPTICAL CORRECTION ARRANGEMENT, PROJECTION OBJECTIVE HAVING SUCH AN...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS COMPRISING A MANIPULATOR, AND METHOD...

EUV EXPOSURE APPARATUS WITH REFLECTIVE ELEMENTS HAVING REDUCED INFL...

MICROLITHOGRAPHIC APPARATUS AND METHOD OF VARYING A LIGHT IRRADIANC...

METHOD OF OPERATING A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARAT...

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

Arrangement for mirror temperature measurement and/or thermal actua...

EUV Exposure Apparatus

OPTICAL SYSTEM OF MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS A...

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

PROJECTION EXPOSURE APPARATUS WITH OPTIMIZED ADJUSTMENT POSSIBILITY

SYMMETRICAL OBJECTIVE HAVING FOUR LENS GROUPS FOR MICROLITHOGRAPHY