Hong-Chang Hsieh

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Hsin-Chu, TW

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Patents Grantslast 30 patents

Information Patent Grant
Multiple resist layer phase shift mask (PSM) blank and PSM formatio...
- Patent number 7,906,252
- Issue date Mar 15, 2011
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dimension monitoring method and system
- Patent number 7,460,251
- Issue date Dec 2, 2008
- Taiwan Semiconductor Manufacturing Co.
- Shih-Ming Chang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for processing masks with oblique features
- Patent number 7,314,689
- Issue date Jan 1, 2008
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resolution enhancement method for deep quarter micron technology
- Patent number 6,348,288
- Issue date Feb 19, 2002
- Taiwan Semiconductor Manufacturing Company
- Shinn-Sheng Yu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
OPC method to improve e-beam writing time
- Patent number 6,316,152
- Issue date Nov 13, 2001
- Taiwan Semiconductor Manufacturing Company
- Hong-Chang Hsieh
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Double-decker mask-pellicle assembly
- Publication number 20070264582
- Publication date Nov 15, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multiple resist layer phase shift mask (PSM) blank and PSM formatio...
- Publication number 20070207391
- Publication date Sep 6, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Chang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dimension monitoring method and system
- Publication number 20070075037
- Publication date Apr 5, 2007
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Shih-Ming Chang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for processing masks with oblique features
- Publication number 20050164098
- Publication date Jul 28, 2005
- Burn Jeng Lin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY