Hong Lin

Person

Vancouver, WA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Application of gate edge liner to maintain gate length CD in a repl...
- Patent number 8,384,165
- Issue date Feb 26, 2013
- LSI Corporation
- Richard J. Carter
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Process and apparatus for simultaneous light and radical surface tr...
- Patent number 7,553,772
- Issue date Jun 30, 2009
- LSI Corporation
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of gate edge liner to maintain gate length CD in a repl...
- Patent number 7,405,116
- Issue date Jul 29, 2008
- LSI Corporation
- Richard J. Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Damascene replacement metal gate process with controlled gate profi...
- Patent number 7,365,015
- Issue date Apr 29, 2008
- LSI Logic Corporation
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Superconductor wires for back end interconnects
- Patent number 7,341,978
- Issue date Mar 11, 2008
- LSI Logic Corporation
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect dielectric tuning
- Patent number 7,259,462
- Issue date Aug 21, 2007
- LSI Corporation
- Wai Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of trenches with multiple depths on the same substrate
- Patent number 7,189,628
- Issue date Mar 13, 2007
- LSI Logic Corporation
- Mohammad R. Mirbedini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect dielectric tuning
- Patent number 7,081,406
- Issue date Jul 25, 2006
- LSI Logic Corporation
- Wai Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Fabrication of trenches with multiple depths on the same substrate
- Patent number 6,864,152
- Issue date Mar 8, 2005
- LSI Logic Corporation
- Mohammad R. Mirbedini
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective high k dielectrics removal
- Patent number 6,818,516
- Issue date Nov 16, 2004
- LSI Logic Corporation
- Wai Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma passivation
- Patent number 6,806,038
- Issue date Oct 19, 2004
- LSI Logic Corporation
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for reducing microtrenching for borderless via...
- Patent number 6,794,304
- Issue date Sep 21, 2004
- LSI Logic Corporation
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High-k dielectric bird's beak optimizations using in-situ O...
- Patent number 6,746,925
- Issue date Jun 8, 2004
- LSI Logic Corporation
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of reducing leakage using Si3N4 or SiON block dielectric films
- Patent number 6,743,669
- Issue date Jun 1, 2004
- LSI Logic Corporation
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
APPLICATION OF GATE EDGE LINER TO MAINTAIN GATE LENGTH CD IN A REPL...
- Publication number 20080308882
- Publication date Dec 18, 2008
- LSI Corporation
- Richard J. Carter
- G02 - OPTICS
Information Patent Application
DAMASCENE REPLACEMENT METAL GATE PROCESS WITH CONTROLLED GATE PROFI...
- Publication number 20080150090
- Publication date Jun 26, 2008
- LSI Logic Corporation
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Superconductor wires for back end interconnects
- Publication number 20060197193
- Publication date Sep 7, 2006
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Interconnect dielectric tuning
- Publication number 20060035455
- Publication date Feb 16, 2006
- Wai Lo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Application of gate edge liner to maintain gate length CD in a repl...
- Publication number 20060035425
- Publication date Feb 16, 2006
- Richard J. Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Damascene replacement metal gate process with controlled gate profi...
- Publication number 20060011994
- Publication date Jan 19, 2006
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma removal of high k metal oxide
- Publication number 20050064716
- Publication date Mar 24, 2005
- Hong Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma passivation
- Publication number 20040005517
- Publication date Jan 8, 2004
- Shiqun Gu
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Application of gate edge liner to maintain gate length CD in a repl...

Process and apparatus for simultaneous light and radical surface tr...

Application of gate edge liner to maintain gate length CD in a repl...

Damascene replacement metal gate process with controlled gate profi...

Superconductor wires for back end interconnects

Interconnect dielectric tuning

Fabrication of trenches with multiple depths on the same substrate

Interconnect dielectric tuning

Fabrication of trenches with multiple depths on the same substrate

Selective high k dielectrics removal

Plasma passivation

Method and apparatus for reducing microtrenching for borderless via...

High-k dielectric bird&#x00027;s beak optimizations using in-situ O...

Method of reducing leakage using Si3N4 or SiON block dielectric films

Patents Applicationslast 30 patents

APPLICATION OF GATE EDGE LINER TO MAINTAIN GATE LENGTH CD IN A REPL...

DAMASCENE REPLACEMENT METAL GATE PROCESS WITH CONTROLLED GATE PROFI...

Superconductor wires for back end interconnects

Interconnect dielectric tuning

Application of gate edge liner to maintain gate length CD in a repl...

Damascene replacement metal gate process with controlled gate profi...

Plasma removal of high k metal oxide

Plasma passivation

High-k dielectric bird's beak optimizations using in-situ O...