Hong Qiu

Person

Union City, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System, method, and computer program product for automatically dete...
- Patent number 10,393,647
- Issue date Aug 27, 2019
- KLA-Tencor Corporation
- Qiang Jimmy Zhao
- G01 - MEASURING TESTING
Information Patent Grant
Metrology system, method, and computer program product employing au...
- Patent number 10,190,868
- Issue date Jan 29, 2019
- KLA-Tencor Corporation
- Liequan Lee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Data flow management in generating profile models used in optical m...
- Patent number 7,783,669
- Issue date Aug 24, 2010
- Tokyo Electron Limited
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Grant
Data flow management in generating different signal formats used in...
- Patent number 7,765,234
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Grant
Allocating processing units to processing clusters to generate simu...
- Patent number 7,765,076
- Issue date Jul 27, 2010
- Tokyo Electron Limited
- Hemalatha Erva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Allocating processing units to generate simulated diffraction signa...
- Patent number 7,742,888
- Issue date Jun 22, 2010
- Tokyo Electron Limited
- Hemalatha Erva
- G01 - MEASURING TESTING
Information Patent Grant
Parallel profile determination in optical metrology
- Patent number 7,515,283
- Issue date Apr 7, 2009
- Tokyo Electron, Ltd.
- Tri Thanh Khuong
- G01 - MEASURING TESTING
Information Patent Grant
Parallel profile determination for an optical metrology system
- Patent number 7,469,192
- Issue date Dec 23, 2008
- Tokyo Electron Ltd.
- Tri Thanh Khuong
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT EMPLOYING AU...
- Publication number 20160320315
- Publication date Nov 3, 2016
- KLA-Tencor Corporation
- Liequan Lee
- G01 - MEASURING TESTING
Information Patent Application
Allocating processing units to processing clusters to generate simu...
- Publication number 20080115140
- Publication date May 15, 2008
- TOKYO ELECTRON LIMITED
- Hemalatha Erva
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Data flow management in generating profile models used in optical m...
- Publication number 20080091724
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Application
Data flow management in generating different signal formats used in...
- Publication number 20080089574
- Publication date Apr 17, 2008
- TOKYO ELECTRON LIMITED
- Hong Qiu
- G01 - MEASURING TESTING
Information Patent Application
Allocating processing units to generate simulated diffraction signa...
- Publication number 20080027565
- Publication date Jan 31, 2008
- TOKYO ELECTRON LIMITED
- Hemalatha Erva
- G01 - MEASURING TESTING
Information Patent Application
Generating a profile model to characterize a structure to be examin...
- Publication number 20080013107
- Publication date Jan 17, 2008
- TOKYO ELECTRON LIMITED
- Jeffrey A. Chard
- G01 - MEASURING TESTING
Information Patent Application
Parallel profile determination in optical metrology
- Publication number 20080013108
- Publication date Jan 17, 2008
- TOKYO ELECTRON LIMITED
- Tri Thanh Khuong
- G01 - MEASURING TESTING

Person

Patents Grantslast 30 patents

System, method, and computer program product for automatically dete...

Metrology system, method, and computer program product employing au...

Data flow management in generating profile models used in optical m...

Data flow management in generating different signal formats used in...

Allocating processing units to processing clusters to generate simu...

Allocating processing units to generate simulated diffraction signa...

Parallel profile determination in optical metrology

Parallel profile determination for an optical metrology system

Patents Applicationslast 30 patents

METROLOGY SYSTEM, METHOD, AND COMPUTER PROGRAM PRODUCT EMPLOYING AU...

Allocating processing units to processing clusters to generate simu...

Data flow management in generating profile models used in optical m...

Data flow management in generating different signal formats used in...

Allocating processing units to generate simulated diffraction signa...

Generating a profile model to characterize a structure to be examin...

Parallel profile determination in optical metrology