Hong Sik Byun

Person

Songnam-shi, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Electrostatic chuck for preventing an arc
- Patent number 6,847,516
- Issue date Jan 25, 2005
- Jusung Engineering Co., Ltd.
- Gi-Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Impedance matching circuit for inductively coupled plasma source
- Patent number 6,770,836
- Issue date Aug 3, 2004
- Jusung Engineering Co., Ltd.
- Gi-Chung Kwon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Plasma process chamber monitoring method and system used therefor
- Patent number 6,768,269
- Issue date Jul 27, 2004
- Jusung Engineering Co., Ltd.
- Gi-Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for generating inductively coupled plasma
- Patent number 6,685,800
- Issue date Feb 3, 2004
- Jusung Engineering Co. Ltd.
- Hong Seub Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer susceptor
- Patent number 6,683,274
- Issue date Jan 27, 2004
- Junsung Engineering Co., Ltd.
- Gi Chung Kwon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Parallel resonance whirl antenna
- Patent number 6,653,988
- Issue date Nov 25, 2003
- Jusung Engineering, Co., LTD
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Antenna electrode for inductively coupled plasma generation apparatus
- Publication number 20030095072
- Publication date May 22, 2003
- Gi-Chung Kwon
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Plasma process chamber monitoring method and system used therefor
- Publication number 20030085662
- Publication date May 8, 2003
- Gi-Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma generating apparatus and SiO2 thin film etching method using...
- Publication number 20030052087
- Publication date Mar 20, 2003
- Jusung Engineering Co.
- Gi-Chung Kwon
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Application
Electrostatic chuck for preventing an arc
- Publication number 20030043530
- Publication date Mar 6, 2003
- Gi-Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Parallel resonance whirl antenna
- Publication number 20030001792
- Publication date Jan 2, 2003
- Jusung Engineering Co., Ltd.
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus having parallel resonance antenna for v...
- Publication number 20020189763
- Publication date Dec 19, 2002
- Jusung Engineering Co., Ltd.
- Gi Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Impedance matching circuit for inductively coupled plasma source
- Publication number 20020130110
- Publication date Sep 19, 2002
- Gi-Chung Kwon
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for generating inductively coupled plasma
- Publication number 20020088548
- Publication date Jul 11, 2002
- JUSUNG ENGINEERING CO., LTD.
- Hong Seub Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus
- Publication number 20020007794
- Publication date Jan 24, 2002
- Hong-Sik Byun
- H01 - BASIC ELECTRIC ELEMENTS

Hong Sik Byun

Person

Patents Grantslast 30 patents

Electrostatic chuck for preventing an arc

Impedance matching circuit for inductively coupled plasma source

Plasma process chamber monitoring method and system used therefor

Apparatus for generating inductively coupled plasma

Wafer susceptor

Parallel resonance whirl antenna

Patents Applicationslast 30 patents

Antenna electrode for inductively coupled plasma generation apparatus

Plasma process chamber monitoring method and system used therefor

Plasma generating apparatus and SiO2 thin film etching method using...

Electrostatic chuck for preventing an arc

Parallel resonance whirl antenna

Plasma processing apparatus having parallel resonance antenna for v...

Impedance matching circuit for inductively coupled plasma source

Apparatus for generating inductively coupled plasma

Plasma processing apparatus