Hongjun Zhou

Person

Chandler, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
High oxide film removal rate shallow trench (STI) chemical mechanic...
- Patent number 12,091,581
- Issue date Sep 17, 2024
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical planarization composition for polishing oxide m...
- Patent number 11,718,767
- Issue date Aug 8, 2023
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- B24 - GRINDING POLISHING
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,692,110
- Issue date Jul 4, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,667,839
- Issue date Jun 6, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,608,451
- Issue date Mar 21, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Oxide chemical mechanical planarization (CMP) polishing compositions
- Patent number 11,549,034
- Issue date Jan 10, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Shallow trench isolation (STI) chemical mechanical planarization (C...
- Patent number 11,326,076
- Issue date May 10, 2022
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Low oxide trench dishing shallow trench isolation chemical mechanic...
- Patent number 11,254,839
- Issue date Feb 22, 2022
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Suppressing SiN removal rates and reducing oxide trench dishing for...
- Patent number 11,180,678
- Issue date Nov 23, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization of films comprising elemental sil...
- Patent number 11,111,415
- Issue date Sep 7, 2021
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal compound chemically anchored colloidal particles and methods...
- Patent number 11,104,825
- Issue date Aug 31, 2021
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,078,417
- Issue date Aug 3, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low oxide trench dishing chemical mechanical polishing
- Patent number 11,072,726
- Issue date Jul 27, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical planarization for tungsten-containing substrates
- Patent number 11,066,575
- Issue date Jul 20, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite particles, method of refining and use thereof
- Patent number 10,894,906
- Issue date Jan 19, 2021
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,669,449
- Issue date Jun 2, 2020
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite particles, method of refining and use thereof
- Patent number 10,421,890
- Issue date Sep 24, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,418,247
- Issue date Sep 17, 2019
- VERSUM MATERIALS US, LLC
- Krishna P. Murella
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal compound chemically anchored colloidal particles and methods...
- Patent number 10,160,884
- Issue date Dec 25, 2018
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Composite abrasive particles for chemical mechanical planarization...
- Patent number 10,109,493
- Issue date Oct 23, 2018
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 10,011,741
- Issue date Jul 3, 2018
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 9,305,476
- Issue date Apr 5, 2016
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 9,062,230
- Issue date Jun 23, 2015
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) composition for shallow trench...
- Patent number 8,859,428
- Issue date Oct 14, 2014
- Air Products and Chemicals, Inc.
- Xiaobo Shi
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Chemical Mechanical Planarization Polishing For Shallow Trench Isol...
- Publication number 20240395558
- Publication date Nov 28, 2024
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanic...
- Publication number 20240297049
- Publication date Sep 5, 2024
- VERSUM MATERIALS US, LLC
- Joseph D. Rose
- B24 - GRINDING POLISHING
Information Patent Application
Chemical Mechanical Planarization (CMP) For Copper And Through-Sili...
- Publication number 20240006189
- Publication date Jan 4, 2024
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shared Data Induced Quality Control For A Chemical Mechanical Plana...
- Publication number 20230325751
- Publication date Oct 12, 2023
- VERSUM MATERIALS US, LLC
- Cesar Clavero
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Low Dishing Oxide CMP Polishing Compositions For Shallow Trench Iso...
- Publication number 20230193079
- Publication date Jun 22, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
High Oxide Film Removal Rate Shallow Trench (STI) Chemical Mechanic...
- Publication number 20230020073
- Publication date Jan 19, 2023
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20210324270
- Publication date Oct 21, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20210309885
- Publication date Oct 7, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanic...
- Publication number 20210179890
- Publication date Jun 17, 2021
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Shallow Trench Isolation Chemical And Mechanical Polishing Slurry
- Publication number 20200270479
- Publication date Aug 27, 2020
- VERSUM MATERIALS US, LLC
- Joseph D. Rose
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...
- Publication number 20200239736
- Publication date Jul 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...
- Publication number 20200239735
- Publication date Jul 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For...
- Publication number 20200131404
- Publication date Apr 30, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- B24 - GRINDING POLISHING
Information Patent Application
Composite Abrasive Particles for Chemical Mechanical Planarization...
- Publication number 20200115590
- Publication date Apr 16, 2020
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Application
High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dis...
- Publication number 20200095502
- Publication date Mar 26, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization For Tungsten-Containing Substrates
- Publication number 20200079976
- Publication date Mar 12, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions
- Publication number 20200048496
- Publication date Feb 13, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization Composition For Polishing Oxide M...
- Publication number 20200048551
- Publication date Feb 13, 2020
- VERSUM MATERIALS US, LLC
- Ming-Shih Tsai
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Mechanical Planarization Of Films Comprising Elemental Sil...
- Publication number 20200032108
- Publication date Jan 30, 2020
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- B24 - GRINDING POLISHING
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002607
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002608
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Low Oxide Trench Dishing Chemical Mechanical Polishing
- Publication number 20200002574
- Publication date Jan 2, 2020
- VERSUM MATERIALS US, LLC
- Xiaobo Shi
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Particles, Method of Refining And Use Thereof
- Publication number 20190359868
- Publication date Nov 28, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- B24 - GRINDING POLISHING
Information Patent Application
Composite Particles, Method of Refining and Use Thereof
- Publication number 20190127607
- Publication date May 2, 2019
- VERSUM MATERIALS US, LLC
- Joseph D. Rose
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Compound Chemically Anchored Colloidal Particles and Methods...
- Publication number 20190100678
- Publication date Apr 4, 2019
- VERSUM MATERIALS US, LLC
- Hongjun Zhou
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemical Mechanical Planarization of Films Comprising Elemental Sil...
- Publication number 20180244955
- Publication date Aug 30, 2018
- VERSUM MATERIALS US, LLC
- James Matthew Henry
- B24 - GRINDING POLISHING
Information Patent Application
Composite Particles, Method of Refining and Use Thereof
- Publication number 20170283673
- Publication date Oct 5, 2017
- Versum Materials US, LLC
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Abrasive Particles For Chemical Mechanical Planarization...
- Publication number 20170133236
- Publication date May 11, 2017
- Air Products and Chemicals, Inc.
- Krishna P. Murella
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Metal Compound Chemically Anchored Colloidal Particles and Methods...
- Publication number 20160280962
- Publication date Sep 29, 2016
- Air Products and Chemicals, Inc.
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Composite Abrasive Particles For Chemical Mechanical Planarization...
- Publication number 20160200944
- Publication date Jul 14, 2016
- Air Products and Chemicals, Inc.
- Hongjun Zhou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Hongjun Zhou

Person

Patents Grantslast 30 patents

High oxide film removal rate shallow trench (STI) chemical mechanic...

Chemical mechanical planarization composition for polishing oxide m...

Low oxide trench dishing chemical mechanical polishing

Low oxide trench dishing chemical mechanical polishing

Shallow trench isolation (STI) chemical mechanical planarization (C...

Oxide chemical mechanical planarization (CMP) polishing compositions

Shallow trench isolation (STI) chemical mechanical planarization (C...

Low oxide trench dishing shallow trench isolation chemical mechanic...

Suppressing SiN removal rates and reducing oxide trench dishing for...

Chemical mechanical planarization of films comprising elemental sil...

Metal compound chemically anchored colloidal particles and methods...

Low oxide trench dishing chemical mechanical polishing

Low oxide trench dishing chemical mechanical polishing

Chemical mechanical planarization for tungsten-containing substrates

Composite particles, method of refining and use thereof

Composite abrasive particles for chemical mechanical planarization...

Composite particles, method of refining and use thereof

Composite abrasive particles for chemical mechanical planarization...

Metal compound chemically anchored colloidal particles and methods...

Composite abrasive particles for chemical mechanical planarization...

Chemical mechanical polishing (CMP) composition for shallow trench...

Chemical mechanical polishing (CMP) composition for shallow trench...

Chemical mechanical polishing (CMP) composition for shallow trench...

Chemical mechanical polishing (CMP) composition for shallow trench...

Patents Applicationslast 30 patents

Chemical Mechanical Planarization Polishing For Shallow Trench Isol...

High Oxide Removal Rates Shallow Trench Isolation Chemical Mechanic...

Chemical Mechanical Planarization (CMP) For Copper And Through-Sili...

Shared Data Induced Quality Control For A Chemical Mechanical Plana...

Low Dishing Oxide CMP Polishing Compositions For Shallow Trench Iso...

High Oxide Film Removal Rate Shallow Trench (STI) Chemical Mechanic...

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Shallow Trench Isolation Chemical Mechanic...

Shallow Trench Isolation Chemical And Mechanical Polishing Slurry

Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...

Shallow Trench Isolation (STI) Chemical Mechanical Planarization (C...

Suppressing SiN Removal Rates And Reducing Oxide Trench Dishing For...

Composite Abrasive Particles for Chemical Mechanical Planarization...

High Oxide VS Nitride Selectivity, Low And Uniform Oxide Trench Dis...

Chemical Mechanical Planarization For Tungsten-Containing Substrates

Oxide Chemical Mechanical Planarization (CMP) Polishing Compositions

Chemical Mechanical Planarization Composition For Polishing Oxide M...

Chemical Mechanical Planarization Of Films Comprising Elemental Sil...

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Low Oxide Trench Dishing Chemical Mechanical Polishing

Composite Particles, Method of Refining And Use Thereof

Composite Particles, Method of Refining and Use Thereof

Metal Compound Chemically Anchored Colloidal Particles and Methods...

Chemical Mechanical Planarization of Films Comprising Elemental Sil...

Composite Particles, Method of Refining and Use Thereof

Composite Abrasive Particles For Chemical Mechanical Planarization...

Metal Compound Chemically Anchored Colloidal Particles and Methods...

Composite Abrasive Particles For Chemical Mechanical Planarization...