Hooi-Sung KIM

Person

Tualatin, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Compositions for polishing cobalt and low-K material surfaces
- Patent number 11,001,733
- Issue date May 11, 2021
- FUJIMI INCORPORATED
- Hooi-Sung Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Anti-corrosion polishing composition
- Patent number 10,858,543
- Issue date Dec 8, 2020
- FUJIMI INCORPORATED
- Hooi-Sung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Buffered slurry formulation for cobalt CMP
- Patent number 10,570,315
- Issue date Feb 25, 2020
- Fujimi Incorporated
- Hooi-Sung Kim
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
SiCN and SiN polishing slurries and polishing methods using the same
- Patent number 9,284,472
- Issue date Mar 15, 2016
- Fujimi Incorporated
- Fusayo Saeki
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Patents Applicationslast 30 patents

Information Patent Application
POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
- Publication number 20240124744
- Publication date Apr 18, 2024
- Hooi-Sung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF
- Publication number 20230295465
- Publication date Sep 21, 2023
- Fujimi Incorporated
- Hooi-Sung Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COMPOSITIONS FOR POLISHING COBALT AND LOW-K MATERIAL SURFACES
- Publication number 20200308446
- Publication date Oct 1, 2020
- FUJIMI CORPORATION
- Hooi-Sung KIM
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
COMPOSITIONS FOR POLISHING COBALT AND LOW-K MATERIAL SURFACES
- Publication number 20200308447
- Publication date Oct 1, 2020
- FUJIMI CORPORATION
- Hooi-Sung KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SLURRIES FOR CHEMICAL MECHANICAL POLISHING OF COBALT CONTAINING SUB...
- Publication number 20190292405
- Publication date Sep 26, 2019
- Fujimi Incorporated
- Hooi-Sung KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ANTI-CORROSION POLISHING COMPOSITION
- Publication number 20190112504
- Publication date Apr 18, 2019
- Fujimi Incorporated
- Hooi-Sung KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
BUFFERED SLURRY FORMULATION FOR COBALT CMP
- Publication number 20180127618
- Publication date May 10, 2018
- Fujimi Incorporated
- Hooi-Sung KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SiCN and SiN Polishing Slurries and Polishing Methods Using The Same
- Publication number 20150044872
- Publication date Feb 12, 2015
- Fujimi Incorporated
- Fusayo SAEKI
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
SURFACE SELECTIVE POLISHING COMPOSITIONS
- Publication number 20140220779
- Publication date Aug 7, 2014
- Hooi-Sung Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Hooi-Sung KIM

Person

Patents Grantslast 30 patents

Compositions for polishing cobalt and low-K material surfaces

Anti-corrosion polishing composition

Buffered slurry formulation for cobalt CMP

SiCN and SiN polishing slurries and polishing methods using the same

Patents Applicationslast 30 patents

POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME

CHEMICAL MECHANICAL POLISHING COMPOSITIONS AND METHODS OF USE THEREOF

COMPOSITIONS FOR POLISHING COBALT AND LOW-K MATERIAL SURFACES

COMPOSITIONS FOR POLISHING COBALT AND LOW-K MATERIAL SURFACES

SLURRIES FOR CHEMICAL MECHANICAL POLISHING OF COBALT CONTAINING SUB...

ANTI-CORROSION POLISHING COMPOSITION

BUFFERED SLURRY FORMULATION FOR COBALT CMP

SiCN and SiN Polishing Slurries and Polishing Methods Using The Same

SURFACE SELECTIVE POLISHING COMPOSITIONS