Hoon Sang LEE

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Hwasung City, KR

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming features in a silicon containing layer
- Patent number 9,627,216
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask passivation using plasma
- Patent number 9,418,867
- Issue date Aug 16, 2016
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of removing residual polymers formed during a boron-doped a...
- Patent number 9,390,923
- Issue date Jul 12, 2016
- Applied Materials, Inc.
- Jeong Hyun Yoo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aspect ratio dependent etch (ARDE) lag reduction process by selecti...
- Patent number 9,064,812
- Issue date Jun 23, 2015
- Applied Materials, Inc.
- Jinsu Kim
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF REMOVING RESIDUAL POLYMERS FORMED DURING A BORON-DOPED A...
- Publication number 20160005602
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- JEONG HYUN YOO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MASK PASSIVATION USING PLASMA
- Publication number 20150200109
- Publication date Jul 16, 2015
- Applied Materials, Inc.
- Byungkook Kong
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER
- Publication number 20150099345
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- BYUNGKOOK KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ASPECT RATIO DEPENDENT ETCH (ARDE) LAG REDUCTION PROCESS BY SELECTI...
- Publication number 20150064919
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jinsu KIM
- H01 - BASIC ELECTRIC ELEMENTS