Hoyoon PARK

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Suwon-si, KR

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Patents Applicationslast 30 patents

Information Patent Application
PHOTOREACTIVE POLYMER COMPOUND, PHOTORESIST COMPOSITION COMPRISING...
- Publication number 20240319595
- Publication date Sep 26, 2024
- SAMSUNG ELECTRONICS CO., LTD.
- Hoyoon PARK
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYCARBOXYLATE COMPOUND, RESIST COMPOSITION COMPRISING THE SAME AN...
- Publication number 20240317672
- Publication date Sep 26, 2024
- Samsung Electronics Co., Ltd.
- Dmitry ANDROSOV
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND METHO...
- Publication number 20240255847
- Publication date Aug 1, 2024
- Samsung Electronics Co., Ltd.
- Hana KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CARBOXYLATE SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND M...
- Publication number 20240199540
- Publication date Jun 20, 2024
- Samsung Electronics Co., Ltd.
- Hoyoon PARK
- C07 - ORGANIC CHEMISTRY