Hsiao-Chun YEH

Person

Hsinchu, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Polyurethane urea composition and preparation method thereof
- Patent number 10,731,034
- Issue date Aug 4, 2020
- Industrial Technology Research Institute
- Mao-Lin Hsueh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Self-assembly coating material, heat sink and method of forming hea...
- Patent number 9,611,392
- Issue date Apr 4, 2017
- Industrial Technology Research Institute
- Yu-Lin Hsin
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Double patterning strategy for contact hole and trench in photolith...
- Patent number 9,323,155
- Issue date Apr 26, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Kuang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Double patterning strategy for contact hole and trench in photolith...
- Patent number 8,741,552
- Issue date Jun 3, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Kuang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material and method for photolithography
- Patent number 8,460,856
- Issue date Jun 11, 2013
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Catalyst carrier, catalyst thereon and C-C coupling method use the...
- Patent number 8,415,504
- Issue date Apr 9, 2013
- Industrial Technology Research Institute
- Mao-Lin Hsueh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
High etch resistant material for double patterning
- Patent number 8,158,335
- Issue date Apr 17, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Si device making method by using a novel material for packing and u...
- Patent number 8,039,195
- Issue date Oct 18, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material and method for photolithography
- Patent number 8,029,969
- Issue date Oct 4, 2011
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Method for photoresist characterization and analysis
- Patent number 7,777,184
- Issue date Aug 17, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for automatic purge of HMDS vapor piping
- Patent number 6,019,849
- Issue date Feb 1, 2000
- Taiwan Semiconductor Manufacturing Company
- Chang Chu Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for cleaning a photoresist developer spray stream nozzle
- Patent number 5,908,041
- Issue date Jun 1, 1999
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Gey-Fung Wei
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for automatic purge of HMDS vapor piping
- Patent number 5,763,006
- Issue date Jun 9, 1998
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chang-Chu Yao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
POLYURETHANE UREA COMPOSITION AND PREPARATION METHOD THEREOF
- Publication number 20190185668
- Publication date Jun 20, 2019
- Industrial Technology Research Institute
- Mao-Lin Hsueh
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITH...
- Publication number 20140272714
- Publication date Sep 18, 2014
- Taiwan Semiconductor Manufacturing Company, Ltd.
- CHUN-KUANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ASSEMBLY COATING MATERIAL, HEAT SINK AND METHOD OF FORMING HEA...
- Publication number 20130157041
- Publication date Jun 20, 2013
- Industrial Technology Research Institute
- Yu-Lin Hsin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Catalsyt carrier, catalsyt thereon and C-C coupling method use the...
- Publication number 20120165574
- Publication date Jun 28, 2012
- Mao-Lin HSUEH
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20120009524
- Publication date Jan 12, 2012
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITH...
- Publication number 20100310995
- Publication date Dec 9, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chun-Kuang Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACK NOZZLE SYSTEM FOR SEMICONDUCTOR FABRICATION
- Publication number 20100209852
- Publication date Aug 19, 2010
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH ETCH RESISTANT MATERIAL FOR DOUBLE PATTERNING
- Publication number 20100068656
- Publication date Mar 18, 2010
- Taiwan Semiconductor Manufacturing Co., LTD
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Si Device Making Method By Using A Novel Material For Packing and U...
- Publication number 20090203224
- Publication date Aug 13, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Chieh Shih
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PHOTORESIST CHARACTERIZATION AND ANALYSIS
- Publication number 20090057554
- Publication date Mar 5, 2009
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY
- Publication number 20080286682
- Publication date Nov 20, 2008
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsiao-Wei Yeh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ACTIVE MATRIX ORGANIC ELECTROLUMINESCENT SUBSTRATE AND METHOD OF MA...
- Publication number 20080230798
- Publication date Sep 25, 2008
- Shu-Hui Huang
- H01 - BASIC ELECTRIC ELEMENTS

Hsiao-Chun YEH

Person

Patents Grantslast 30 patents

Polyurethane urea composition and preparation method thereof

Self-assembly coating material, heat sink and method of forming hea...

Double patterning strategy for contact hole and trench in photolith...

Double patterning strategy for contact hole and trench in photolith...

Material and method for photolithography

Catalyst carrier, catalyst thereon and C-C coupling method use the...

High etch resistant material for double patterning

Si device making method by using a novel material for packing and u...

Material and method for photolithography

Method for photoresist characterization and analysis

Method and apparatus for automatic purge of HMDS vapor piping

Method for cleaning a photoresist developer spray stream nozzle

Method and apparatus for automatic purge of HMDS vapor piping

Patents Applicationslast 30 patents

POLYURETHANE UREA COMPOSITION AND PREPARATION METHOD THEREOF

DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITH...

SELF-ASSEMBLY COATING MATERIAL, HEAT SINK AND METHOD OF FORMING HEA...

Catalsyt carrier, catalsyt thereon and C-C coupling method use the...

MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY

DOUBLE PATTERNING STRATEGY FOR CONTACT HOLE AND TRENCH IN PHOTOLITH...

TRACK NOZZLE SYSTEM FOR SEMICONDUCTOR FABRICATION

HIGH ETCH RESISTANT MATERIAL FOR DOUBLE PATTERNING

Si Device Making Method By Using A Novel Material For Packing and U...

METHOD FOR PHOTORESIST CHARACTERIZATION AND ANALYSIS

MATERIAL AND METHOD FOR PHOTOLITHOGRAPHY

ACTIVE MATRIX ORGANIC ELECTROLUMINESCENT SUBSTRATE AND METHOD OF MA...