Hsiao-Kuan Wei

Person

Longtan Township, Taoyuan County, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Selective capping processes and structures formed thereby
- Patent number 11,830,742
- Issue date Nov 28, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chien Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 11,721,740
- Issue date Aug 8, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 11,710,638
- Issue date Jul 25, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective capping processes and structures formed thereby
- Patent number 11,380,542
- Issue date Jul 5, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chien Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having gate dielectric and inhibitor film over...
- Patent number 11,211,465
- Issue date Dec 28, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunal A. Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure with barrier layer and method for forming the same
- Patent number 11,201,227
- Issue date Dec 14, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
FinFET structure
- Patent number 11,145,747
- Issue date Oct 12, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsin-Yun Hsu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 11,088,257
- Issue date Aug 10, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 11,024,505
- Issue date Jun 1, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure with multi-layer composition
- Patent number 10,998,414
- Issue date May 4, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chin Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure passivating species drive-in method and structure fo...
- Patent number 10,854,459
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective capping processes and structures formed thereby
- Patent number 10,790,142
- Issue date Sep 29, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chien Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective capping processes and structures formed thereby
- Patent number 10,770,288
- Issue date Sep 8, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Chien Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of manufacturing the same
- Patent number 10,707,318
- Issue date Jul 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of fabricating semiconductor devices with metal-gate work-f...
- Patent number 10,515,807
- Issue date Dec 24, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device having gate body and inhibitor film between co...
- Patent number 10,510,854
- Issue date Dec 17, 2019
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunal A. Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with sidewall passivation and method of making
- Patent number 10,014,382
- Issue date Jul 3, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunal A. Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal gate structure with multi-layer composition
- Patent number 9,679,984
- Issue date Jun 13, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chin Chung
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20250022911
- Publication date Jan 16, 2025
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Shih-Cheng Chou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATION THEREOF
- Publication number 20240387615
- Publication date Nov 21, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Po LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETO-RESISTIVE RANDOM-ACCESS MEMORY (MRAM) DEVICES AND METHODS O...
- Publication number 20230403948
- Publication date Dec 14, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hsuan-Yi PENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATION THEREOF
- Publication number 20230395647
- Publication date Dec 7, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jen-Po LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20230335613
- Publication date Oct 19, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structure Passivating Species Drive-In Method and Structure Fo...
- Publication number 20230317457
- Publication date Oct 5, 2023
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Capping Processes and Structures Formed Thereby
- Publication number 20220328309
- Publication date Oct 13, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chien CHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20210367056
- Publication date Nov 25, 2021
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structure Passivating Species Drive-In Method and Structure Fo...
- Publication number 20210287905
- Publication date Sep 16, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Capping Processes and Structures Formed Thereby
- Publication number 20200402795
- Publication date Dec 24, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chien CHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20200287014
- Publication date Sep 10, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH SIDEWALL PASSIVATION AND METHOD OF MAKING
- Publication number 20200119153
- Publication date Apr 16, 2020
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunal A. KHADERBAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF FABRICATING SEMICONDUCTOR DEVICES WITH METAL-GATE WORK-F...
- Publication number 20190385855
- Publication date Dec 19, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Fen CHIEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE WITH BARRIER LAYER AND METHOD FOR FORMING THE SAME
- Publication number 20190334007
- Publication date Oct 31, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Capping Processes and Structures Formed Thereby
- Publication number 20190164752
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chih-Chien Chi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Capping Processes and Structures Formed Thereby
- Publication number 20190164751
- Publication date May 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Chien CHI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME
- Publication number 20190148510
- Publication date May 16, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Jui-Fen Chien
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFET STRUCTURE AND METHOD FOR FORMING THE SAME
- Publication number 20190123175
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsin-Yun HSU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structure Passivating Species Drive-In Method and Structure Fo...
- Publication number 20190096681
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Kuan Wei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE STRUCTURE PASSIVATING SPECIES DRIVE-IN METHOD AND STRUCTURE FO...
- Publication number 20190096680
- Publication date Mar 28, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Hsiao-Kuan WEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND SIDEWALL PASSIVATION AND METHOD OF MAKING
- Publication number 20180308944
- Publication date Oct 25, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunal A. KHADERBAD
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Structure with Device Gain and Yield Improvement
- Publication number 20170278941
- Publication date Sep 28, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Hung-Chin Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH SIDEWALL PASSIVATION AND METHOD OF MAKING
- Publication number 20150262827
- Publication date Sep 17, 2015
- Taiwan Semiconductor Manufacturing Company Limited
- Mrunai A. Khaderbad
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal Gate Structure with Device Gain and Yield Improvement
- Publication number 20140124875
- Publication date May 8, 2014
- Hung-Chin Chung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma device for liquid crystal alignment
- Publication number 20080129207
- Publication date Jun 5, 2008
- National Chiao Tung University
- Ru-Pin Chao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Hsiao-Kuan Wei

Person

Patents Grantslast 30 patents

Selective capping processes and structures formed thereby

Semiconductor device and method of manufacturing the same

Gate structure passivating species drive-in method and structure fo...

Selective capping processes and structures formed thereby

Semiconductor device having gate dielectric and inhibitor film over...

Gate structure with barrier layer and method for forming the same

FinFET structure

Semiconductor device and method of manufacturing the same

Gate structure passivating species drive-in method and structure fo...

Metal gate structure with multi-layer composition

Gate structure passivating species drive-in method and structure fo...

Selective capping processes and structures formed thereby

Selective capping processes and structures formed thereby

Semiconductor device and method of manufacturing the same

Methods of fabricating semiconductor devices with metal-gate work-f...

Semiconductor device having gate body and inhibitor film between co...

Semiconductor device with sidewall passivation and method of making

Metal gate structure with multi-layer composition

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATION THEREOF

MAGNETO-RESISTIVE RANDOM-ACCESS MEMORY (MRAM) DEVICES AND METHODS O...

SEMICONDUCTOR DEVICES AND METHODS FOR FABRICATION THEREOF

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Gate Structure Passivating Species Drive-In Method and Structure Fo...

Selective Capping Processes and Structures Formed Thereby

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

Gate Structure Passivating Species Drive-In Method and Structure Fo...

Selective Capping Processes and Structures Formed Thereby

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

SEMICONDUCTOR DEVICE WITH SIDEWALL PASSIVATION AND METHOD OF MAKING

METHODS OF FABRICATING SEMICONDUCTOR DEVICES WITH METAL-GATE WORK-F...

GATE STRUCTURE WITH BARRIER LAYER AND METHOD FOR FORMING THE SAME

Selective Capping Processes and Structures Formed Thereby

Selective Capping Processes and Structures Formed Thereby

SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME

FINFET STRUCTURE AND METHOD FOR FORMING THE SAME

Gate Structure Passivating Species Drive-In Method and Structure Fo...

GATE STRUCTURE PASSIVATING SPECIES DRIVE-IN METHOD AND STRUCTURE FO...

SEMICONDUCTOR DEVICE AND SIDEWALL PASSIVATION AND METHOD OF MAKING

Metal Gate Structure with Device Gain and Yield Improvement

SEMICONDUCTOR DEVICE WITH SIDEWALL PASSIVATION AND METHOD OF MAKING

Metal Gate Structure with Device Gain and Yield Improvement

Plasma device for liquid crystal alignment