HsuSheng CHANG

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Method for forming high aspect ratio patterning structure
- Patent number 9,991,116
- Issue date Jun 5, 2018
- Shanghai Huali Microelectronics Corporation
- Peng Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for detecting the flatness of wafer and the method thereof
- Patent number 9,134,122
- Issue date Sep 15, 2015
- Shanghai Huali Microelectronics Corporation
- WenLiang Li
- B24 - GRINDING POLISHING
Information Patent Grant
Method for etching polysilicon gate
- Patent number 8,900,887
- Issue date Dec 2, 2014
- Shanghai Huali Microelectronics Corporation
- Zaifeng Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Layout pattern modification method
- Patent number 8,898,598
- Issue date Nov 25, 2014
- Shanghai Huali Microelectronics Corporation
- Chenming Zhang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Optical proximity correction method based on hybrid simulation model
- Patent number 8,863,045
- Issue date Oct 14, 2014
- Shanghai Huali Microelectronics Corporation
- Han Chen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Dummy wafer structure and method of forming the same
- Patent number 8,822,348
- Issue date Sep 2, 2014
- Shanghai Huali Microelectronics Corporation
- Chuan Ren
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for reducing morphological difference between N-doped and un...
- Patent number 8,658,502
- Issue date Feb 25, 2014
- Shanghai Huali Microelectronics Corporation
- Zaifeng Tang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Algorithm of Cu interconnect dummy inserting
- Patent number 8,645,879
- Issue date Feb 4, 2014
- Shanghai Huali Microelectronics Corporation
- Jingxun Fang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR FORMING HIGH ASPECT RATIO PATTERNING STRUCTURE
- Publication number 20180144929
- Publication date May 24, 2018
- Peng Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS OF MANUFACTURING THE GATE OXIDE LAYER
- Publication number 20150064930
- Publication date Mar 5, 2015
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- ZHONGPING LI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING NICKEL SALICIDE ON A SILICON-GERMANIUM LAYER
- Publication number 20150004767
- Publication date Jan 1, 2015
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Junsheng Cai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR DETECTING THE FLATNESS OF WAFER AND THE METHOD THEREOF
- Publication number 20140153000
- Publication date Jun 5, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- WenLiang Li
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR ETCHING POLYSILICON GATE
- Publication number 20140106475
- Publication date Apr 17, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Zaifeng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUMMY WAFER STRUCTURE AND METHOD OF FORMING THE SAME
- Publication number 20140077343
- Publication date Mar 20, 2014
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Chuan REN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR REDUCING MORPHOLOGICAL DIFFERENCE BETWEEN N-DOPED AND UN...
- Publication number 20130316539
- Publication date Nov 28, 2013
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Zaifeng TANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALGORITHM OF CU INTERCONNECT DUMMY INSERTING
- Publication number 20130227502
- Publication date Aug 29, 2013
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- JINGXUN FANG
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD OF FORMING NITROGEN-FREE DIELECTRIC ANTI-REFLECTION LAYER
- Publication number 20130224399
- Publication date Aug 29, 2013
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- ChienWei CHEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Process for Eliminating Fog Particles on a Surface of High P Concen...
- Publication number 20130064992
- Publication date Mar 14, 2013
- SHANGHAI HUALI MICROELECTRONICS CORPORATION
- Meimei GU
- C03 - GLASS MINERAL OR SLAG WOOL

HsuSheng CHANG

Person

Patents Grantslast 30 patents

Method for forming high aspect ratio patterning structure

Apparatus for detecting the flatness of wafer and the method thereof

Method for etching polysilicon gate

Layout pattern modification method

Optical proximity correction method based on hybrid simulation model

Dummy wafer structure and method of forming the same

Method for reducing morphological difference between N-doped and un...

Algorithm of Cu interconnect dummy inserting

Patents Applicationslast 30 patents

METHOD FOR FORMING HIGH ASPECT RATIO PATTERNING STRUCTURE

PROCESS OF MANUFACTURING THE GATE OXIDE LAYER

METHOD OF FORMING NICKEL SALICIDE ON A SILICON-GERMANIUM LAYER

APPARATUS FOR DETECTING THE FLATNESS OF WAFER AND THE METHOD THEREOF

METHOD FOR ETCHING POLYSILICON GATE

DUMMY WAFER STRUCTURE AND METHOD OF FORMING THE SAME

METHOD FOR REDUCING MORPHOLOGICAL DIFFERENCE BETWEEN N-DOPED AND UN...

ALGORITHM OF CU INTERCONNECT DUMMY INSERTING

METHOD OF FORMING NITROGEN-FREE DIELECTRIC ANTI-REFLECTION LAYER

Process for Eliminating Fog Particles on a Surface of High P Concen...