Hua CHUNG

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective cobalt deposition on copper surfaces
- Patent number 11,959,167
- Issue date Apr 16, 2024
- Applied Materials, Inc.
- Sang-Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,946,135
- Issue date Apr 2, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for the treatment of workpieces
- Patent number 11,791,181
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch process using hydrofluoric acid and ozone gases
- Patent number 11,791,166
- Issue date Oct 17, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of utilizing a degassing chamber to reduce arsenic outgassin...
- Patent number 11,649,559
- Issue date May 16, 2023
- Applied Materials, Inc.
- Xinyu Bao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature deposition of iridium containing films
- Patent number 11,643,721
- Issue date May 9, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chamber seasoning to improve etch uniformity by reducing chemistry
- Patent number 11,626,269
- Issue date Apr 11, 2023
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Surface pretreatment process to improve quality of oxide films prod...
- Patent number 11,495,437
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone for selective hydrophilic surface treatment
- Patent number 11,495,456
- Issue date Nov 8, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing of workpieces using deposition process and etch process
- Patent number 11,462,413
- Issue date Oct 4, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective cobalt deposition on copper surfaces
- Patent number 11,384,429
- Issue date Jul 12, 2022
- Applied Materials, Inc.
- Sang-Ho Yu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Processing of workpieces with reactive species generated using alky...
- Patent number 11,387,111
- Issue date Jul 12, 2022
- Mattson Technology, Inc.
- Michael X. Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon mandrel etch after native oxide punch-through
- Patent number 11,387,115
- Issue date Jul 12, 2022
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Processing of workpieces using ozone gas and hydrogen radicals
- Patent number 11,315,801
- Issue date Apr 26, 2022
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Silicon oxide selective dry etch process
- Patent number 11,251,050
- Issue date Feb 15, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spacer open process by dual plasma
- Patent number 11,195,718
- Issue date Dec 7, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Tsai Wen Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective etch process using hydrofluoric acid and ozone gases
- Patent number 11,183,397
- Issue date Nov 23, 2021
- BEIJING E-TOWN SEMICONDUCTOR TECHNOLOGY, CO., LTD
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated system for semiconductor process
- Patent number 11,164,767
- Issue date Nov 2, 2021
- Applied Materials, Inc.
- Xinyu Bao
- C30 - CRYSTAL GROWTH
Information Patent Grant
Processing of workpieces using hydrogen radicals and ozone gas
- Patent number 11,164,727
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective deposition using methylation treatment
- Patent number 11,164,742
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Generation of hydrogen reactive species for processing of workpieces
- Patent number 11,164,725
- Issue date Nov 2, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for depositing metallic iridium and iridium silicide
- Patent number 11,124,874
- Issue date Sep 21, 2021
- Applied Materials, Inc.
- Hua Chung
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface smoothing of workpieces
- Patent number 11,107,695
- Issue date Aug 31, 2021
- Beijing E-Town Semiconductor Technology Co., Ltd.
- Qi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Surface treatment of silicon or silicon germanium surfaces using or...
- Patent number 11,062,910
- Issue date Jul 13, 2021
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ozone treatment for selective silicon nitride etch over silicon
- Patent number 11,043,393
- Issue date Jun 22, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Air leak detection in plasma processing apparatus with separation grid
- Patent number 11,039,527
- Issue date Jun 15, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Grant
Method of selective silicon germanium epitaxy at low temperatures
- Patent number 11,018,003
- Issue date May 25, 2021
- Applied Materials, Inc.
- Yi-Chiau Huang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming conformal epitaxial semiconductor cladding materi...
- Patent number 11,011,635
- Issue date May 18, 2021
- Applied Materials, Inc.
- Sheng-Chin Kung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integration of materials removal and surface treatment in semicondu...
- Patent number 10,964,528
- Issue date Mar 30, 2021
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chamber seasoning to improve etch uniformity by reducing chemistry
- Patent number 10,950,416
- Issue date Mar 16, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
- Publication number 20240218503
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Sang-Ho YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
- Publication number 20240200188
- Publication date Jun 20, 2024
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS
- Publication number 20230227968
- Publication date Jul 20, 2023
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR LOW TEMPERATURE SELECTIVE EPITAXY IN A DEE...
- Publication number 20230036426
- Publication date Feb 2, 2023
- Applied Materials, Inc.
- Abhishek DUBE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SELECTIVE COBALT DEPOSITION ON COPPER SURFACES
- Publication number 20220298625
- Publication date Sep 22, 2022
- Applied Materials, Inc.
- Sang-Ho YU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective Etch Process Using Hydrofluoric Acid and Ozone Gases
- Publication number 20220084839
- Publication date Mar 17, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Generation of Hydrogen Reactive Species For Processing of Workpieces
- Publication number 20220059321
- Publication date Feb 24, 2022
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Smoothing of Workpieces
- Publication number 20210391185
- Publication date Dec 16, 2021
- Beijing E-Town Semiconductor Technology, Co., LTD
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing of Workpieces Using Ozone Gas and Hydrogen Radicals
- Publication number 20210366727
- Publication date Nov 25, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...
- Publication number 20210343506
- Publication date Nov 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20210307151
- Publication date Sep 30, 2021
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Plasma Processing Apparatus and Methods
- Publication number 20210257196
- Publication date Aug 19, 2021
- Mattson Technology, Inc.
- Shawming Ma
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry
- Publication number 20210202214
- Publication date Jul 1, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Systems and Methods for Removal of Hardmask
- Publication number 20210202231
- Publication date Jul 1, 2021
- Mattson Technology, Inc.
- Jeyta Anand Sahay
- B08 - CLEANING
Information Patent Application
Selective Etch Process Using Hydrofluoric Acid and Ozone Gases
- Publication number 20210118694
- Publication date Apr 22, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR THE TREATMENT OF WORKPIECES
- Publication number 20210082724
- Publication date Mar 18, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Silicon Oxide Selective Dry Etch Process
- Publication number 20210066088
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Processing a Workpiece
- Publication number 20210066074
- Publication date Mar 4, 2021
- Mattson Technology, Inc.
- Ting Xie
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS
- Publication number 20210020413
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Processing Of Workpieces Using Deposition Process And Etch Process
- Publication number 20210020445
- Publication date Jan 21, 2021
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Spacer Open Process By Dual Plasma
- Publication number 20210005456
- Publication date Jan 7, 2021
- Mattson Technology, Inc.
- Tsai Wen Sung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...
- Publication number 20200373129
- Publication date Nov 26, 2020
- Mattson Technology, Inc.
- Ting Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Selective Deposition Using Methylation Treatment
- Publication number 20200350161
- Publication date Nov 5, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Air Leak Detection In Plasma Processing Apparatus With Separation Grid
- Publication number 20200245444
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Shuang Meng
- G01 - MEASURING TESTING
Information Patent Application
Post Plasma Gas Injection In A Separation Grid
- Publication number 20200243305
- Publication date Jul 30, 2020
- Mattson Technology, Inc.
- Weimin Zeng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ozone Treatment for Selective Silicon Nitride Etch Over Silicon
- Publication number 20200234969
- Publication date Jul 23, 2020
- Mattson Technology, Inc.
- Shanyu Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON MANDREL ETCH AFTER NATIVE OXIDE PUNCH-THROUGH
- Publication number 20200203182
- Publication date Jun 25, 2020
- Mattson Technology, Inc.
- Chun Yan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Surface Smoothing of Workpieces
- Publication number 20200203173
- Publication date Jun 25, 2020
- Mattson Technology, Inc.
- Qi Zhang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Integration Of Materials Removal And Surface Treatment In Semicondu...
- Publication number 20200185216
- Publication date Jun 11, 2020
- Mattson Technology, Inc.
- Michael X. Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry
- Publication number 20200161094
- Publication date May 21, 2020
- Mattson Technology, Inc.
- Qi Zhang
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Selective cobalt deposition on copper surfaces

Low temperature deposition of iridium containing films

Methods for the treatment of workpieces

Selective etch process using hydrofluoric acid and ozone gases

Method of utilizing a degassing chamber to reduce arsenic outgassin...

Low temperature deposition of iridium containing films

Chamber seasoning to improve etch uniformity by reducing chemistry

Surface pretreatment process to improve quality of oxide films prod...

Ozone for selective hydrophilic surface treatment

Processing of workpieces using deposition process and etch process

Selective cobalt deposition on copper surfaces

Processing of workpieces with reactive species generated using alky...

Silicon mandrel etch after native oxide punch-through

Processing of workpieces using ozone gas and hydrogen radicals

Silicon oxide selective dry etch process

Spacer open process by dual plasma

Selective etch process using hydrofluoric acid and ozone gases

Integrated system for semiconductor process

Processing of workpieces using hydrogen radicals and ozone gas

Selective deposition using methylation treatment

Generation of hydrogen reactive species for processing of workpieces

Methods for depositing metallic iridium and iridium silicide

Surface smoothing of workpieces

Surface treatment of silicon or silicon germanium surfaces using or...

Ozone treatment for selective silicon nitride etch over silicon

Air leak detection in plasma processing apparatus with separation grid

Method of selective silicon germanium epitaxy at low temperatures

Method of forming conformal epitaxial semiconductor cladding materi...

Integration of materials removal and surface treatment in semicondu...

Chamber seasoning to improve etch uniformity by reducing chemistry

Patents Applicationslast 30 patents

SELECTIVE COBALT DEPOSITION ON COPPER SURFACES

LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS

LOW TEMPERATURE DEPOSITION OF IRIDIUM CONTAINING FILMS

METHOD AND APPARATUS FOR LOW TEMPERATURE SELECTIVE EPITAXY IN A DEE...

SELECTIVE COBALT DEPOSITION ON COPPER SURFACES

Selective Etch Process Using Hydrofluoric Acid and Ozone Gases

Generation of Hydrogen Reactive Species For Processing of Workpieces

Surface Smoothing of Workpieces

Processing of Workpieces Using Ozone Gas and Hydrogen Radicals

Methods And Apparatus For Pulsed Inductively Coupled Plasma For Sur...

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Plasma Processing Apparatus and Methods

Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry

Systems and Methods for Removal of Hardmask

Selective Etch Process Using Hydrofluoric Acid and Ozone Gases

METHODS FOR THE TREATMENT OF WORKPIECES

Silicon Oxide Selective Dry Etch Process

Method for Processing a Workpiece

PROCESSING OF WORKPIECES USING HYDROGEN RADICALS AND OZONE GAS

Processing Of Workpieces Using Deposition Process And Etch Process

Spacer Open Process By Dual Plasma

Surface Pretreatment Process To Improve Quality Of Oxide Films Prod...

Selective Deposition Using Methylation Treatment

Air Leak Detection In Plasma Processing Apparatus With Separation Grid

Post Plasma Gas Injection In A Separation Grid

Ozone Treatment for Selective Silicon Nitride Etch Over Silicon

SILICON MANDREL ETCH AFTER NATIVE OXIDE PUNCH-THROUGH

Surface Smoothing of Workpieces

Integration Of Materials Removal And Surface Treatment In Semicondu...

Chamber Seasoning to Improve Etch Uniformity by Reducing Chemistry