Hua Song

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inverse etch model for mask synthesis
- Patent number 11,644,746
- Issue date May 9, 2023
- Synopsys, Inc.
- Guangming Xiao
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
3D resist profile aware resolution enhancement techniques
- Patent number 11,200,362
- Issue date Dec 14, 2021
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Fabric items with thermally imprinted light-emitting regions
- Patent number 10,989,868
- Issue date Apr 27, 2021
- Apple Inc.
- Yi Zou
- D10 - INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEX...
Information Patent Grant
Method for modeling a photoresist profile
- Patent number 10,386,718
- Issue date Aug 20, 2019
- Synopsys, Inc.
- Cheng En Wu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
3D resist profile aware etch-bias model
- Patent number 9,646,127
- Issue date May 9, 2017
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling and correcting short-range and long-range effects in E-bea...
- Patent number 9,484,186
- Issue date Nov 1, 2016
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection and removal of self-aligned double patterning artifacts
- Patent number 8,826,193
- Issue date Sep 2, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Multi-patterning for sharp corner printing
- Patent number 8,689,149
- Issue date Apr 1, 2014
- Synopsys, Inc.
- Yuelin Du
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling EUV lithography shadowing effect
- Patent number 8,601,404
- Issue date Dec 3, 2013
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling an arbitrarily polarized illumination source in an optical...
- Patent number 8,527,253
- Issue date Sep 3, 2013
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography flare calculation and compensation
- Patent number 8,443,308
- Issue date May 14, 2013
- Synopsys Inc.
- James Shiely
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Modeling thin-film stack topography effect on a photolithography pr...
- Patent number 8,423,917
- Issue date Apr 16, 2013
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for performing lithography verification for a dou...
- Patent number 8,132,128
- Issue date Mar 6, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for using a database to quickly identify and c...
- Patent number 7,934,174
- Issue date Apr 26, 2011
- Synopsys, Inc.
- Zong Wu Tang
- G05 - CONTROLLING REGULATING
Information Patent Grant
Locating critical dimension(s) of a layout feature in an IC design...
- Patent number 7,636,904
- Issue date Dec 22, 2009
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for using a database to quickly identify and c...
- Patent number 7,584,450
- Issue date Sep 1, 2009
- Synopsys, Inc.
- Zong Wu Tang
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
3D RESIST PROFILE AWARE RESOLUTION ENHANCEMENT TECHNIQUES
- Publication number 20170220723
- Publication date Aug 3, 2017
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
3D RESIST PROFILE AWARE ETCH-BIAS MODEL
- Publication number 20160335384
- Publication date Nov 17, 2016
- Synopsys, Inc.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method for Modeling a Photoresist Profile
- Publication number 20160012175
- Publication date Jan 14, 2016
- Synopsys, Inc.
- Cheng En Wu
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS
- Publication number 20140245239
- Publication date Aug 28, 2014
- Synopsys, Inc.
- Yuelin Du
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...
- Publication number 20140114634
- Publication date Apr 24, 2014
- Synopsys, Inc.
- Hua Song
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV LITHOGRAPHY FLARE CALCULATION AND COMPENSATION
- Publication number 20120284675
- Publication date Nov 8, 2012
- Synopsys Inc.
- James SHIELY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING EUV LITHOGRAPHY SHADOWING EFFECT
- Publication number 20120240086
- Publication date Sep 20, 2012
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...
- Publication number 20110029940
- Publication date Feb 3, 2011
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...
- Publication number 20100115489
- Publication date May 6, 2010
- Synopsys, Inc.
- Hua Song
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR USING A DATABASE TO QUICKLY IDENTIFY AND C...
- Publication number 20090288047
- Publication date Nov 19, 2009
- Synopsys, Inc.
- Zong Wu Tang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MODELING A SECTOR-POLARIZED-ILLUMINATION SOURCE IN AN OPTICAL LITHO...
- Publication number 20090265148
- Publication date Oct 22, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT I...
- Publication number 20090070730
- Publication date Mar 12, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MODELING AN ARBITRARILY POLARIZED ILLUMINATION SOURCE IN AN OPTICAL...
- Publication number 20090070083
- Publication date Mar 12, 2009
- Synopsys, Inc.
- Qiaolin Zhang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Locating critical dimension(s) of a layout feature in an IC design...
- Publication number 20080109766
- Publication date May 8, 2008
- SYNOPSYS, INC.
- Hua Song
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method and apparatus for using a database to quickly identify and c...
- Publication number 20070198958
- Publication date Aug 23, 2007
- Zong Wu Tang
- G06 - COMPUTING CALCULATING COUNTING

Person

Patents Grantslast 30 patents

Inverse etch model for mask synthesis

3D resist profile aware resolution enhancement techniques

Fabric items with thermally imprinted light-emitting regions

Method for modeling a photoresist profile

3D resist profile aware etch-bias model

Modeling and correcting short-range and long-range effects in E-bea...

Detection and removal of self-aligned double patterning artifacts

Multi-patterning for sharp corner printing

Modeling EUV lithography shadowing effect

Modeling an arbitrarily polarized illumination source in an optical...

EUV lithography flare calculation and compensation

Modeling thin-film stack topography effect on a photolithography pr...

Method and system for performing lithography verification for a dou...

Method and apparatus for using a database to quickly identify and c...

Locating critical dimension(s) of a layout feature in an IC design...

Method and apparatus for using a database to quickly identify and c...

Patents Applicationslast 30 patents

3D RESIST PROFILE AWARE RESOLUTION ENHANCEMENT TECHNIQUES

3D RESIST PROFILE AWARE ETCH-BIAS MODEL

Method for Modeling a Photoresist Profile

DETECTION AND REMOVAL OF SELF-ALIGNED DOUBLE PATTERNING ARTIFACTS

MODELING AND CORRECTING SHORT-RANGE AND LONG-RANGE EFFECTS IN E-BEA...

EUV LITHOGRAPHY FLARE CALCULATION AND COMPENSATION

MODELING EUV LITHOGRAPHY SHADOWING EFFECT

METHOD AND APPARATUS FOR MODELING THIN-FILM TOPOGRAPHY EFFECT ON A...

METHOD AND SYSTEM FOR PERFORMING LITHOGRAPHY VERIFICATION FOR A DOU...

METHOD AND APPARATUS FOR USING A DATABASE TO QUICKLY IDENTIFY AND C...

MODELING A SECTOR-POLARIZED-ILLUMINATION SOURCE IN AN OPTICAL LITHO...

METHOD AND APPARATUS FOR MODELING A VECTORIAL POLARIZATION EFFECT I...

MODELING AN ARBITRARILY POLARIZED ILLUMINATION SOURCE IN AN OPTICAL...

Locating critical dimension(s) of a layout feature in an IC design...

Method and apparatus for using a database to quickly identify and c...