Hubert Holderer

Person

Koenigsbronn, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Facet mirror for an illumination optical unit of a projection expos...
- Patent number 11,789,367
- Issue date Oct 17, 2023
- Carl Zeiss SMT GmbH
- Willi Anderl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement illumination optical unit for guiding illumination ligh...
- Patent number 11,720,028
- Issue date Aug 8, 2023
- Carl Zeiss SMT GmbH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Beam-forming and illuminating system for a lithography system, lith...
- Patent number 11,448,968
- Issue date Sep 20, 2022
- Carl Zeiss SMT GmbH
- Hubert Holderer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging optical unit for EUV microlithography
- Patent number 11,422,470
- Issue date Aug 23, 2022
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an illumination system for an EUV projection e...
- Patent number 11,048,172
- Issue date Jun 29, 2021
- Carl Zeiss SMT GmbH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for producing an illumination system for an EUV projection e...
- Patent number 10,514,608
- Issue date Dec 24, 2019
- Carl Zeiss SMT GmbH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 9,810,996
- Issue date Nov 7, 2017
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 8,902,401
- Issue date Dec 2, 2014
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 8,514,371
- Issue date Aug 20, 2013
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Holding arrangement for an optical element
- Patent number 8,508,868
- Issue date Aug 13, 2013
- Carl Zeiss SMT GmbH
- Ulrich Weber
- G02 - OPTICS
Information Patent Grant
Holding arrangement for an optical element
- Patent number 8,456,771
- Issue date Jun 4, 2013
- Carl Zeiss Laser Optics GmbH
- Ulrich Weber
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Optical system having heat dissipation arrangement
- Patent number 8,456,615
- Issue date Jun 4, 2013
- Carl Zeiss Laser Optics GmbH
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Optical imaging device with thermal attenuation
- Patent number 8,363,206
- Issue date Jan 29, 2013
- Carl Zeiss SMT GmbH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element for use in an EUV system
- Patent number 8,342,701
- Issue date Jan 1, 2013
- Carl Zeiss Laser Optics GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,990,622
- Issue date Aug 2, 2011
- Carl Zeiss SMT GmbH
- Olaf Conradi
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,961,294
- Issue date Jun 14, 2011
- Carl Zeiss SMT GmbH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Projection objective of a microlithographic projection exposure app...
- Patent number 7,830,611
- Issue date Nov 9, 2010
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Grant
Composite structure for microlithography and optical arrangement
- Patent number 7,816,022
- Issue date Oct 19, 2010
- Carl Zeiss SMT AG
- Claudia Ekstein
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Apparatus for mounting two or more elements and method for processi...
- Patent number 7,800,849
- Issue date Sep 21, 2010
- Carl Zeiss SMT AG
- Hubert Holderer
- G01 - MEASURING TESTING
Information Patent Grant
Projection method including pupillary filtering and a projection le...
- Patent number 7,791,711
- Issue date Sep 7, 2010
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,710,542
- Issue date May 4, 2010
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment arrangement of an optical element
- Patent number 7,656,595
- Issue date Feb 2, 2010
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Grant
Microlithographic projection exposure apparatus
- Patent number 7,570,343
- Issue date Aug 4, 2009
- Carl Zeis SMT AG
- Aurelian Dodoc
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process for connecting an optical element of a microlithographic pr...
- Patent number 7,551,375
- Issue date Jun 23, 2009
- Carl Zeiss SMT AG
- Johannes Rau
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Imaging device in a projection exposure machine
- Patent number 7,486,382
- Issue date Feb 3, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adjustment arrangement of an optical element
- Patent number 7,457,059
- Issue date Nov 25, 2008
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Grant
Method for connection of an optical element to a mount structure
- Patent number 7,400,460
- Issue date Jul 15, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Facet mirror having a number of mirror facets
- Patent number 7,354,168
- Issue date Apr 8, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Projection method including pupillary filtering and a projection le...
- Patent number 7,336,342
- Issue date Feb 26, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Grant
Imaging device in a projection exposure facility
- Patent number 7,304,717
- Issue date Dec 4, 2007
- Carl Zelss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOS...
- Publication number 20220206398
- Publication date Jun 30, 2022
- Carl Zeiss SMT GMBH
- Willi Anderl
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...
- Publication number 20220057717
- Publication date Feb 24, 2022
- Carl Zeiss SMT GMBH
- Thomas Fischer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BEAM-FORMING AND ILLUMINATING SYSTEM FOR A LITHOGRAPHY SYSTEM, LITH...
- Publication number 20210003925
- Publication date Jan 7, 2021
- Carl Zeiss SMT GMBH
- Hubert Holderer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY
- Publication number 20200348602
- Publication date Nov 5, 2020
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...
- Publication number 20200110340
- Publication date Apr 9, 2020
- Carl Zeiss SMT GMBH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...
- Publication number 20180373158
- Publication date Dec 27, 2018
- Carl Zeiss SMT GMBH
- Juergen Baier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20180181007
- Publication date Jun 28, 2018
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20150109591
- Publication date Apr 23, 2015
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20130114057
- Publication date May 9, 2013
- Carl Zeiss SMT GMBH
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT
- Publication number 20120154935
- Publication date Jun 21, 2012
- Carl Zeiss SMT GMBH
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT
- Publication number 20120140341
- Publication date Jun 7, 2012
- Carl Zeiss SMT GMBH
- Ulrich Weber
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20110199597
- Publication date Aug 18, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM
- Publication number 20110051267
- Publication date Mar 3, 2011
- CARL ZEISS LASER OPTICS GmbH
- Holger Kierey
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT
- Publication number 20110025992
- Publication date Feb 3, 2011
- CARL ZEISS LASER OPTICS GmbH
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20110019169
- Publication date Jan 27, 2011
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
COMPOSITE STRUCTURE FOR MICROLITHOGRAPHY AND OPTICAL ARRANGEMENT
- Publication number 20090142615
- Publication date Jun 4, 2009
- Carl Zeiss SMT AG
- Claudia EKSTEIN
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Imaging Device in a Projection Exposure Machine
- Publication number 20090141258
- Publication date Jun 4, 2009
- Carl Zeiss SMT AG
- Stephan Back
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION
- Publication number 20090135385
- Publication date May 28, 2009
- Carl Zeiss SMT AG
- Bernhard Gellrich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY
- Publication number 20090040487
- Publication date Feb 12, 2009
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR MOUNTING TWO OR MORE ELEMENTS AND METHOD FOR PROCESSI...
- Publication number 20090015947
- Publication date Jan 15, 2009
- Hubert Holderer
- G01 - MEASURING TESTING
Information Patent Application
Adjustment Arrangement of an Optical Element
- Publication number 20090009892
- Publication date Jan 8, 2009
- Carl Zeiss SMT AG
- Klaus Beck
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20080239503
- Publication date Oct 2, 2008
- Carl Zeiss SMT AG
- Olaf Conradi
- G02 - OPTICS
Information Patent Application
IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE
- Publication number 20080174757
- Publication date Jul 24, 2008
- Carl Zeiss SMT AG
- Wolfgang Hummel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION METHOD INCLUDING PUPILLARY FILTERING AND A PROJECTION LE...
- Publication number 20080143984
- Publication date Jun 19, 2008
- Carl Zeiss SMT AG
- Hubert HOLDERER
- G02 - OPTICS
Information Patent Application
Optical measuring system, and a projection objective
- Publication number 20080100930
- Publication date May 1, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
ARRANGEMENT OF TWO CONNECTED BODIES
- Publication number 20080100815
- Publication date May 1, 2008
- Carl Zeiss SMT AG
- Hubert Holderer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Support structure for temporarily supporting a substrate
- Publication number 20070285647
- Publication date Dec 13, 2007
- Carl Zeiss SMT AG
- Yim-Bun Patrick Kwan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Holding and positioning apparatus for an optical element
- Publication number 20070223116
- Publication date Sep 27, 2007
- Ulrich Weber
- G02 - OPTICS
Information Patent Application
Method for connection of an optical element to a mount structure
- Publication number 20070171552
- Publication date Jul 26, 2007
- Hubert Holderer
- G02 - OPTICS
Information Patent Application
ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT
- Publication number 20070014038
- Publication date Jan 18, 2007
- Klaus Beck
- G02 - OPTICS

Hubert Holderer

Person

Patents Grantslast 30 patents

Facet mirror for an illumination optical unit of a projection expos...

Measurement illumination optical unit for guiding illumination ligh...

Beam-forming and illuminating system for a lithography system, lith...

Imaging optical unit for EUV microlithography

Method for producing an illumination system for an EUV projection e...

Method for producing an illumination system for an EUV projection e...

Optical imaging device with thermal attenuation

Optical imaging device with thermal attenuation

Imaging device in a projection exposure facility

Holding arrangement for an optical element

Holding arrangement for an optical element

Optical system having heat dissipation arrangement

Optical imaging device with thermal attenuation

Reflective optical element for use in an EUV system

Projection objective of a microlithographic projection exposure app...

Imaging device in a projection exposure facility

Projection objective of a microlithographic projection exposure app...

Composite structure for microlithography and optical arrangement

Apparatus for mounting two or more elements and method for processi...

Projection method including pupillary filtering and a projection le...

Imaging device in a projection exposure machine

Adjustment arrangement of an optical element

Microlithographic projection exposure apparatus

Process for connecting an optical element of a microlithographic pr...

Imaging device in a projection exposure machine

Adjustment arrangement of an optical element

Method for connection of an optical element to a mount structure

Facet mirror having a number of mirror facets

Projection method including pupillary filtering and a projection le...

Imaging device in a projection exposure facility

Patents Applicationslast 30 patents

FACET MIRROR FOR AN ILLUMINATION OPTICAL UNIT OF A PROJECTION EXPOS...

MEASUREMENT ILLUMINATION OPTICAL UNIT FOR GUIDING ILLUMINATION LIGH...

BEAM-FORMING AND ILLUMINATING SYSTEM FOR A LITHOGRAPHY SYSTEM, LITH...

IMAGING OPTICAL UNIT FOR EUV MICROLITHOGRAPHY

METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...

METHOD FOR PRODUCING AN ILLUMINATION SYSTEM FOR AN EUV PROJECTION E...

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT

HOLDING ARRANGEMENT FOR AN OPTICAL ELEMENT

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

REFLECTIVE OPTICAL ELEMENT FOR USE IN AN EUV SYSTEM

OPTICAL SYSTEM HAVING AN OPTICAL ARRANGEMENT

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

COMPOSITE STRUCTURE FOR MICROLITHOGRAPHY AND OPTICAL ARRANGEMENT

Imaging Device in a Projection Exposure Machine

OPTICAL IMAGING DEVICE WITH THERMAL ATTENUATION

IMAGING DEVICE IN A PROJECTION EXPOSURE FACILITY

APPARATUS FOR MOUNTING TWO OR MORE ELEMENTS AND METHOD FOR PROCESSI...

Adjustment Arrangement of an Optical Element

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

IMAGING DEVICE IN A PROJECTION EXPOSURE MACHINE

PROJECTION METHOD INCLUDING PUPILLARY FILTERING AND A PROJECTION LE...

Optical measuring system, and a projection objective

ARRANGEMENT OF TWO CONNECTED BODIES

Support structure for temporarily supporting a substrate

Holding and positioning apparatus for an optical element

Method for connection of an optical element to a mount structure

ADJUSTMENT ARRANGEMENT OF AN OPTICAL ELEMENT