Huey-Chiang Liou

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Forming semiconductor structures
- Patent number 8,513,111
- Issue date Aug 20, 2013
- Intel Corporation
- Robert P. Meagley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and compositions for reducing line wide roughness
- Patent number 7,867,687
- Issue date Jan 11, 2011
- Intel Corporation
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Brush for cleaning wafer
- Patent number 7,469,443
- Issue date Dec 30, 2008
- Intel Corporation
- Huey-Chiang Liou
- B08 - CLEANING
Information Patent Grant
Immersion liquids with siloxane polymer for immersion lithography
- Patent number 7,391,501
- Issue date Jun 24, 2008
- Intel Corporation
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Zeolite-carbon doped oxide composite low k dielectric
- Patent number 7,303,985
- Issue date Dec 4, 2007
- Intel Corporation
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming an opening for an interconnect structure in a di...
- Patent number 7,125,793
- Issue date Oct 24, 2006
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors for film formation
- Patent number 7,071,125
- Issue date Jul 4, 2006
- Intel Corporation
- Michael L. McSwiney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Air gap integration
- Patent number 6,995,073
- Issue date Feb 7, 2006
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Langmuir-blodgett chemically amplified photoresist
- Patent number 6,864,192
- Issue date Mar 8, 2005
- Intel Corporation
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ZEOLITE - CARBON DOPED OXIDE COMPOSITE LOW K DIELECTRIC
- Publication number 20080220213
- Publication date Sep 11, 2008
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming semiconductor structures
- Publication number 20060255432
- Publication date Nov 16, 2006
- Robert P. Meagley
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Brush for cleaning wafer
- Publication number 20060151003
- Publication date Jul 13, 2006
- Intel Corporation
- Huey-Chiang Liou
- B08 - CLEANING
Information Patent Application
Precursors for film formation
- Publication number 20060063394
- Publication date Mar 23, 2006
- Michael L. McSwiney
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Immersion liquids for immersion lithography
- Publication number 20050164502
- Publication date Jul 28, 2005
- Hai Deng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and materials for self-aligned dual damascene interconnect s...
- Publication number 20050133920
- Publication date Jun 23, 2005
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Zeolite-carbon doped oxide composite low k dielectric
- Publication number 20050107242
- Publication date May 19, 2005
- Hai Deng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and compositions for reducing line wide roughness
- Publication number 20050084793
- Publication date Apr 21, 2005
- Wang Yueh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Air gap integration
- Publication number 20050012219
- Publication date Jan 20, 2005
- Huey-Chiang Liou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Forming semiconductor structures
- Publication number 20040145030
- Publication date Jul 29, 2004
- Robert P. Meagley
- H01 - BASIC ELECTRIC ELEMENTS

Huey-Chiang Liou

Person

Patents Grantslast 30 patents

Forming semiconductor structures

Methods and compositions for reducing line wide roughness

Brush for cleaning wafer

Immersion liquids with siloxane polymer for immersion lithography

Zeolite-carbon doped oxide composite low k dielectric

Method for forming an opening for an interconnect structure in a di...

Precursors for film formation

Air gap integration

Langmuir-blodgett chemically amplified photoresist

Patents Applicationslast 30 patents

ZEOLITE - CARBON DOPED OXIDE COMPOSITE LOW K DIELECTRIC

Forming semiconductor structures

Brush for cleaning wafer

Precursors for film formation

Immersion liquids for immersion lithography

Method and materials for self-aligned dual damascene interconnect s...

Zeolite-carbon doped oxide composite low k dielectric

Methods and compositions for reducing line wide roughness

Air gap integration

Forming semiconductor structures