Hugo Augustinus Joseph CRAMER

Person

Eindhoven, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus to determine a patterning process parameter us...
- Patent number 12,142,535
- Issue date Nov 12, 2024
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for process metrology
- Patent number 12,007,697
- Issue date Jun 11, 2024
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology targets
- Patent number 11,982,946
- Issue date May 14, 2024
- ASML Netherlands B.V.
- Nikhil Mehta
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus
- Patent number 11,940,739
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Nitesh Pandey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,784,098
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,728,224
- Issue date Aug 15, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,710,668
- Issue date Jul 25, 2023
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,650,047
- Issue date May 16, 2023
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of calibrating a plurality of metrology apparatuses, method...
- Patent number 11,556,060
- Issue date Jan 17, 2023
- ASML Netherlands B.V.
- Seyed Iman Mossavat
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Separation of contributions to metrology data
- Patent number 11,520,239
- Issue date Dec 6, 2022
- ASML Netherlands B.V.
- Wim Tjibbo Tel
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for process metrology
- Patent number 11,385,551
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Bert Verstraeten
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology apparatus
- Patent number 11,262,661
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,145,557
- Issue date Oct 12, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a parameter of a lithographic process, metrolog...
- Patent number 11,099,489
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,185
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 11,101,184
- Issue date Aug 24, 2021
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for measuring a parameter of a lithographic pr...
- Patent number 11,092,900
- Issue date Aug 17, 2021
- ASML Netherlands B.V.
- Maurits Van Der Schaar
- G01 - MEASURING TESTING
Information Patent Grant
Metrology apparatus and method for determining a characteristic of...
- Patent number 11,009,343
- Issue date May 18, 2021
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for measuring a parameter of interest using im...
- Patent number 10,983,445
- Issue date Apr 20, 2021
- ASML Netherlands B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Grant
Method of measuring a target, metrology apparatus, lithographic cel...
- Patent number 10,955,756
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Metrology method and apparatus with increased bandwidth
- Patent number 10,901,323
- Issue date Jan 26, 2021
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,871,367
- Issue date Dec 22, 2020
- ASML Netherlands B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Metrology method and apparatus, computer program and lithographic s...
- Patent number 10,845,713
- Issue date Nov 24, 2020
- ASML Netherlands B.V.
- Thomas Theeuwes
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,811,323
- Issue date Oct 20, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metrology method and apparatus with increased bandwidth
- Patent number 10,732,514
- Issue date Aug 4, 2020
- ASML Netherlands B.V.
- Hugo Augustinus Joseph Cramer
- G01 - MEASURING TESTING
Information Patent Grant
Substrate, metrology apparatus and associated methods for a lithogr...
- Patent number 10,677,589
- Issue date Jun 9, 2020
- ASML Netherlands B.V.
- Alok Verma
- G01 - MEASURING TESTING
Information Patent Grant
Statistical hierarchical reconstruction from metrology data
- Patent number 10,627,213
- Issue date Apr 21, 2020
- ASML Netherlands B.V.
- Seyed Iman Mossavat
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus to determine a patterning process parameter, a...
- Patent number 10,615,084
- Issue date Apr 7, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- G01 - MEASURING TESTING
Information Patent Grant
Method of determining an optimal focus height for a metrology appar...
- Patent number 10,571,363
- Issue date Feb 25, 2020
- ASML Netherlands B.V.
- Mariya Vyacheslavivna Medvedyeva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to determine a patterning process parameter
- Patent number 10,546,790
- Issue date Jan 28, 2020
- ASML Netherlands B.V.
- Adriaan Johan Van Leest
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD AND METROLOGY DEVICE
- Publication number 20240345489
- Publication date Oct 17, 2024
- ASML NETHERLANDS B.V.
- Vasco Tomas TENNER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Apparatus
- Publication number 20240184218
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD
- Publication number 20240160151
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel COENE
- G02 - OPTICS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20240014078
- Publication date Jan 11, 2024
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...
- Publication number 20230341813
- Publication date Oct 26, 2023
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND C...
- Publication number 20230141495
- Publication date May 11, 2023
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...
- Publication number 20230064193
- Publication date Mar 2, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA
- Publication number 20230042759
- Publication date Feb 9, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS
- Publication number 20220350260
- Publication date Nov 3, 2022
- ASML Holding N.V.
- Armand Eugene Albert
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR PROCESS METROLOGY
- Publication number 20220326625
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Bert VERSTRAETEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IMPROVEMENTS IN METROLOGY TARGETS
- Publication number 20220260929
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Nikhil MEHTA
- G01 - MEASURING TESTING
Information Patent Application
METROLOGY APPARATUS
- Publication number 20220121127
- Publication date Apr 21, 2022
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210384086
- Publication date Dec 9, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210335678
- Publication date Oct 28, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...
- Publication number 20210325174
- Publication date Oct 21, 2021
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20210035871
- Publication date Feb 4, 2021
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus with Increased Bandwidth
- Publication number 20200319562
- Publication date Oct 8, 2020
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...
- Publication number 20200284578
- Publication date Sep 10, 2020
- ASML NETHERLANDS B.V.
- Alok Verma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PATTERNING DEVICE, MANUFACTURING METHOD FOR A PATTERNING DEVICE, SY...
- Publication number 20200232933
- Publication date Jul 23, 2020
- ASML NETHERLANDS B.V.
- Thomas Leo Maria HOOGENBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of Measuring a Parameter of a Lithographic Process, Metrolog...
- Publication number 20200192231
- Publication date Jun 18, 2020
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200185281
- Publication date Jun 11, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200126872
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Calibrating a Plurality of Metrology Apparatuses, Method...
- Publication number 20200110341
- Publication date Apr 9, 2020
- ASML NETHERLANDS B.V.
- Seyed Iman MOSSAVAT
- G05 - CONTROLLING REGULATING
Information Patent Application
Method and Apparatus for Measuring a Parameter of a Lithographic Pr...
- Publication number 20200073254
- Publication date Mar 5, 2020
- ASML NETHERLANDS B.V.
- Maurits VAN DER SCHAAR
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER
- Publication number 20200013685
- Publication date Jan 9, 2020
- ASML NETHERLANDS B.V.
- Adriaan Johan VAN LEEST
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus
- Publication number 20190384184
- Publication date Dec 19, 2019
- ASML NETHERLANDS B.V.
- Nitesh Pandey
- G01 - MEASURING TESTING
Information Patent Application
Metrology Apparatus and Method for Determining a Characteristic of...
- Publication number 20190265028
- Publication date Aug 29, 2019
- Stichting VU
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Metrology Method and Apparatus with Increased Bandwidth
- Publication number 20190258177
- Publication date Aug 22, 2019
- ASML NETHERLANDS B.V.
- Hugo Augustinus Joseph CRAMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...
- Publication number 20190250094
- Publication date Aug 15, 2019
- ASML NETHERLANDS B.V.
- Nitesh PANDEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...
- Publication number 20190242782
- Publication date Aug 8, 2019
- ASML NETHERLANDS B.V.
- Mariya Vyacheslavivna MEDVEDYEVA
- G01 - MEASURING TESTING

Hugo Augustinus Joseph CRAMER

Person

Patents Grantslast 30 patents

Method and apparatus to determine a patterning process parameter us...

Method for process metrology

Metrology targets

Metrology apparatus

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Metrology apparatus and method for determining a characteristic of...

Method of calibrating a plurality of metrology apparatuses, method...

Separation of contributions to metrology data

Method for process metrology

Metrology apparatus

Method and apparatus to determine a patterning process parameter

Method of measuring a parameter of a lithographic process, metrolog...

Method and apparatus to determine a patterning process parameter

Method and apparatus to determine a patterning process parameter

Method and apparatus for measuring a parameter of a lithographic pr...

Metrology apparatus and method for determining a characteristic of...

Method and apparatus for measuring a parameter of interest using im...

Method of measuring a target, metrology apparatus, lithographic cel...

Metrology method and apparatus with increased bandwidth

Substrate, metrology apparatus and associated methods for a lithogr...

Metrology method and apparatus, computer program and lithographic s...

Method and apparatus to determine a patterning process parameter

Metrology method and apparatus with increased bandwidth

Substrate, metrology apparatus and associated methods for a lithogr...

Statistical hierarchical reconstruction from metrology data

Method and apparatus to determine a patterning process parameter, a...

Method of determining an optimal focus height for a metrology appar...

Method and apparatus to determine a patterning process parameter

Patents Applicationslast 30 patents

METROLOGY METHOD AND METROLOGY DEVICE

Metrology Apparatus

DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY METHOD

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

DARK FIELD DIGITAL HOLOGRAPHIC MICROSCOPE AND ASSOCIATED METROLOGY...

METHOD OF DETERMINING A SAMPLING SCHEME, ASSOCIATED APPARATUS AND C...

METROLOGY METHOD AND DEVICE FOR MEASURING A PERIODIC STRUCTURE ON A...

SEPARATION OF CONTRIBUTIONS TO METROLOGY DATA

A METHOD FOR FILTERING AN IMAGE AND ASSOCIATED METROLOGY APPARATUS

METHOD FOR PROCESS METROLOGY

IMPROVEMENTS IN METROLOGY TARGETS

METROLOGY APPARATUS

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METROLOGY APPARATUS AND METHOD FOR DETERMINING A CHARACTERISTIC OF...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Metrology Method and Apparatus with Increased Bandwidth

SUBSTRATE, METROLOGY APPARATUS AND ASSOCIATED METHODS FOR A LITHOGR...

PATTERNING DEVICE, MANUFACTURING METHOD FOR A PATTERNING DEVICE, SY...

Method of Measuring a Parameter of a Lithographic Process, Metrolog...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Method of Calibrating a Plurality of Metrology Apparatuses, Method...

Method and Apparatus for Measuring a Parameter of a Lithographic Pr...

METHOD AND APPARATUS TO DETERMINE A PATTERNING PROCESS PARAMETER

Metrology Apparatus

Metrology Apparatus and Method for Determining a Characteristic of...

Metrology Method and Apparatus with Increased Bandwidth

METHOD AND APPARATUS FOR MEASURING A PARAMETER OF INTEREST USING IM...

METHOD OF DETERMINING AN OPTIMAL FOCUS HEIGHT FOR A METROLOGY APPAR...