Hui-Fang Kuo

Person

Kaohsiung City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Optical proximity correction device and method
- Patent number 11,934,106
- Issue date Mar 19, 2024
- United Microelectronics Corp.
- Shu-Yen Liu
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask set for double exposure process and method of using the mask set
- Patent number 9,104,833
- Issue date Aug 11, 2015
- United Microelectronics Corp.
- Hui-Fang Kuo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Photography lighting fixture
- Patent number 9,010,948
- Issue date Apr 21, 2015
- Global Fiberoptics, Inc.
- Ho-Shang Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for optical proximity correction
- Patent number 8,930,858
- Issue date Jan 6, 2015
- United Microelectronics Corp.
- Hui-Fang Kuo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mask set for double exposure process and method of using the mask set
- Patent number 8,778,604
- Issue date Jul 15, 2014
- United Microelectronics Corp.
- Hui-Fang Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of optical proximity correction in combination with double p...
- Patent number 8,701,052
- Issue date Apr 15, 2014
- United Microelectronics Corp.
- Hui-Fang Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for making photomask layout
- Patent number 8,627,242
- Issue date Jan 7, 2014
- United Microelectronics Corp.
- Hui-Fang Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical proximity correction method
- Patent number 8,423,923
- Issue date Apr 16, 2013
- United Microelectronics Corp.
- Chia-Wei Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for selectively amending layout patterns
- Patent number 8,042,069
- Issue date Oct 18, 2011
- United Microelectronics Corp.
- Yu-Shiang Yang
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
Mask pattern correction and layout method
- Patent number 7,943,274
- Issue date May 17, 2011
- United Microelectronics Corp.
- Yu-Shiang Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of checking and correcting mask pattern
- Patent number 7,797,656
- Issue date Sep 14, 2010
- United Microelectronics Corp.
- Yu-Shiang Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL PROXIMITY CORRECTION DEVICE AND METHOD
- Publication number 20230384689
- Publication date Nov 30, 2023
- United Microelectronics Corp.
- Shu-Yen LIU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOGRAPHY LIGHTING FIXTURE
- Publication number 20140293572
- Publication date Oct 2, 2014
- Global Fiberoptics, Inc.
- Ho-Shang LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK SET FOR DOUBLE EXPOSURE PROCESS AND METHOD OF USING THE MASK SET
- Publication number 20140258946
- Publication date Sep 11, 2014
- UNITED MICROELECTRONICS CORP.
- Hui-Fang Kuo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Mask Set for Double Exposure Process and Method of Using the Mask Set
- Publication number 20130280645
- Publication date Oct 24, 2013
- Hui-Fang Kuo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Optical Proximity Correction Method
- Publication number 20130024824
- Publication date Jan 24, 2013
- Chia-Wei Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MASK PATTERN CORRECTION AND LAYOUT METHOD
- Publication number 20100086862
- Publication date Apr 8, 2010
- United Microelectronics Corp.
- Yu-Shiang Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR SELECTIVELY AMENDING LAYOUT PATTERNS
- Publication number 20100036644
- Publication date Feb 11, 2010
- Yu-Shiang Yang
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Method of checking and correcting mask pattern
- Publication number 20090193385
- Publication date Jul 30, 2009
- Yu-Shiang Yang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hui-Fang Kuo

Person

Patents Grantslast 30 patents

Optical proximity correction device and method

Mask set for double exposure process and method of using the mask set

Photography lighting fixture

Method for optical proximity correction

Mask set for double exposure process and method of using the mask set

Method of optical proximity correction in combination with double p...

Method for making photomask layout

Optical proximity correction method

Method for selectively amending layout patterns

Mask pattern correction and layout method

Method of checking and correcting mask pattern

Patents Applicationslast 30 patents

OPTICAL PROXIMITY CORRECTION DEVICE AND METHOD

PHOTOGRAPHY LIGHTING FIXTURE

MASK SET FOR DOUBLE EXPOSURE PROCESS AND METHOD OF USING THE MASK SET

Mask Set for Double Exposure Process and Method of Using the Mask Set

Optical Proximity Correction Method

MASK PATTERN CORRECTION AND LAYOUT METHOD

METHOD FOR SELECTIVELY AMENDING LAYOUT PATTERNS

Method of checking and correcting mask pattern