Hui Zhang

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and method for forming an integrated barrier layer
- Patent number 7,867,914
- Issue date Jan 11, 2011
- Applied Materials, Inc.
- Ming Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple precursor cyclical deposition system
- Patent number 7,396,565
- Issue date Jul 8, 2008
- Applied Materials, Inc.
- Michael Xi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
System and method for forming an integrated barrier layer
- Patent number 7,279,432
- Issue date Oct 9, 2007
- Applied Materials, Inc.
- Ming Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple precursor cyclical deposition system
- Patent number 6,846,516
- Issue date Jan 25, 2005
- Applied Materials, Inc.
- Michael Xi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Selective deposition of a barrier layer on a metal film
- Patent number 6,809,026
- Issue date Oct 26, 2004
- Applied Materials, Inc.
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER
- Publication number 20110100295
- Publication date May 5, 2011
- Ming Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER
- Publication number 20080014352
- Publication date Jan 17, 2008
- Ming Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple precursor cyclical depositon system
- Publication number 20050008779
- Publication date Jan 13, 2005
- Michael Xi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
System and method for forming an integrated barrier layer
- Publication number 20030232497
- Publication date Dec 18, 2003
- Ming Xi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal nitride formation
- Publication number 20030224217
- Publication date Dec 4, 2003
- APPLIED MATERIALS, INC.
- Jeong Soo Byun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multiple precursor cyclical deposition system
- Publication number 20030190423
- Publication date Oct 9, 2003
- APPLIED MATERIALS, INC.
- Michael Xi Yang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Selective deposition of abarrier layer on a metal film
- Publication number 20030181035
- Publication date Sep 25, 2003
- APPLIED MATERIALS, INC.
- Hyungsuk Alexander Yoon
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of tungsten films for dynamic random access memory (DRAM...
- Publication number 20030157760
- Publication date Aug 21, 2003
- APPLIED MATERIALS, INC.
- Ming Xi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of tungsten for the formation of conformal tungsten sili...
- Publication number 20030123216
- Publication date Jul 3, 2003
- Hyungsuk A. Yoon
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

System and method for forming an integrated barrier layer

Multiple precursor cyclical deposition system

System and method for forming an integrated barrier layer

Multiple precursor cyclical deposition system

Selective deposition of a barrier layer on a metal film

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER

SYSTEM AND METHOD FOR FORMING AN INTEGRATED BARRIER LAYER

Multiple precursor cyclical depositon system

System and method for forming an integrated barrier layer

Metal nitride formation

Multiple precursor cyclical deposition system

Selective deposition of abarrier layer on a metal film

Deposition of tungsten films for dynamic random access memory (DRAM...

Deposition of tungsten for the formation of conformal tungsten sili...