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Huiyuan Wang

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  • Santa Clara, CA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Thermal deposition of silicon-germanium
    • Patent number 11,830,734
    • Issue date Nov 28, 2023
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Diffusion barriers for germanium
    • Patent number 11,791,155
    • Issue date Oct 17, 2023
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Defect free germanium oxide gap fill
    • Patent number 11,781,218
    • Issue date Oct 10, 2023
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Non-conformal high selectivity film for etch critical dimension con...
    • Patent number 11,702,751
    • Issue date Jul 18, 2023
    • Applied Materials, Inc.
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    3D NAND etch
    • Patent number 11,515,170
    • Issue date Nov 29, 2022
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Grant

    Deposition of low-stress boron-containing layers
    • Patent number 11,495,454
    • Issue date Nov 8, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    Deposition of low-stress carbon-containing layers
    • Patent number 11,404,263
    • Issue date Aug 2, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Grant

    3D NAND etch
    • Patent number 10,886,140
    • Issue date Jan 5, 2021
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

  • Information Patent Application

    DEFECT FREE GERMANIUM OXIDE GAP FILL
    • Publication number 20230407468
    • Publication date Dec 21, 2023
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    THERMAL DEPOSITION OF SILICON-GERMANIUM
    • Publication number 20220375750
    • Publication date Nov 24, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS CARBON-CONTAINING LAYERS
    • Publication number 20220319841
    • Publication date Oct 6, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    SUPER-CONFORMAL GERMANIUM OXIDE FILMS
    • Publication number 20220186365
    • Publication date Jun 16, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DEFECT FREE GERMANIUM OXIDE GAP FILL
    • Publication number 20220189824
    • Publication date Jun 16, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    CONFORMAL SILICON-GERMANIUM FILM DEPOSITION
    • Publication number 20220165566
    • Publication date May 26, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Selective Deposition of Germanium
    • Publication number 20220108888
    • Publication date Apr 7, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    DIFFUSION BARRIERS FOR GERMANIUM
    • Publication number 20220068640
    • Publication date Mar 3, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS CARBON-CONTAINING LAYERS
    • Publication number 20220044926
    • Publication date Feb 10, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    DEPOSITION OF LOW-STRESS BORON-CONTAINING LAYERS
    • Publication number 20220044927
    • Publication date Feb 10, 2022
    • Applied Materials, Inc.
    • Huiyuan Wang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    PLASMA CLEANING METHODS FOR PROCESSING CHAMBERS
    • Publication number 20210384015
    • Publication date Dec 9, 2021
    • Applied Materials, Inc.
    • Huiyuan WANG
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    STACK FOR 3D-NAND MEMORY CELL
    • Publication number 20210327891
    • Publication date Oct 21, 2021
    • Applied Materials, Inc.
    • Takehito Koshizawa
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    3D NAND Etch
    • Publication number 20210118691
    • Publication date Apr 22, 2021
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Non-Conformal High Selectivity Film For Etch Critical Dimension Con...
    • Publication number 20210047733
    • Publication date Feb 18, 2021
    • Applied Materials, Inc.
    • Bo Qi
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
  • Information Patent Application

    3D NAND Etch
    • Publication number 20200035505
    • Publication date Jan 30, 2020
    • Applied Materials, Inc.
    • Shishi Jiang
    • H01 - BASIC ELECTRIC ELEMENTS
  • Information Patent Application

    Low Temperature Atomic Layer Deposition Of Silicon Nitride
    • Publication number 20190330736
    • Publication date Oct 31, 2019
    • Applied Materials, Inc.
    • Huiyuan Wang
    • C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...