Hun Jae JANG

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,165,866
- Issue date Dec 10, 2024
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 12,042,828
- Issue date Jul 23, 2024
- Samsung Electronics Co., Ltd.
- Seung Min Shin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer cleaning apparatus, method for cleaning wafer and method for...
- Patent number 11,862,457
- Issue date Jan 2, 2024
- Samsung Electronics Co., Ltd.
- Seongkeun Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-chamber apparatus
- Patent number 11,721,565
- Issue date Aug 8, 2023
- Samsung Electronics Co., Ltd.
- Yong Jun Choi
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus and wafer cleaning method using the same
- Patent number 11,648,594
- Issue date May 16, 2023
- Samsung Electronics Co., Ltd.
- Seung Min Shin
- B08 - CLEANING
Information Patent Grant
Wafer cleaning equipment
- Patent number 11,605,545
- Issue date Mar 14, 2023
- Samsung Electronics Co., Ltd.
- Hun Jae Jang
- B08 - CLEANING
Information Patent Grant
Wafer cleaning apparatus, method for cleaning wafer and method for...
- Patent number 11,581,182
- Issue date Feb 14, 2023
- Samsung Electronics Co., Ltd.
- Seongkeun Cho
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
MULTI-CHAMBER APPARATUS
- Publication number 20230343613
- Publication date Oct 26, 2023
- Samsung Electronics Co., Ltd.
- Yong Jun CHOI
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME
- Publication number 20230249230
- Publication date Aug 10, 2023
- Samsung Electronics Co., Ltd.
- Seung Min SHIN
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS, METHOD FOR CLEANING WAFER AND METHOD FOR...
- Publication number 20230154743
- Publication date May 18, 2023
- Samsung Electronics Co., Ltd.
- Seongkeun CHO
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS, METHOD FOR CLEANING WAFER AND METHOD FOR...
- Publication number 20220262621
- Publication date Aug 18, 2022
- Samsung Electronics Co., Ltd.
- Seongkeun CHO
- B08 - CLEANING
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME
- Publication number 20220084812
- Publication date Mar 17, 2022
- Samsung Electronics Co., Ltd.
- Sung Hyun Park
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME
- Publication number 20210060625
- Publication date Mar 4, 2021
- Samsung Electronics Co., Ltd.
- Seung Min SHIN
- B08 - CLEANING
Information Patent Application
MULTI-CHAMBER APPARATUS
- Publication number 20200343113
- Publication date Oct 29, 2020
- Samsung Electronics Co., Ltd.
- Yong Jun CHOI
- B08 - CLEANING
Information Patent Application
WAFER CLEANING EQUIPMENT
- Publication number 20200335361
- Publication date Oct 22, 2020
- Samsung Electronics Co., Ltd.
- Hun Jae JANG
- B08 - CLEANING

Hun Jae JANG

Person

Patents Grantslast 30 patents

Wafer cleaning apparatus and wafer cleaning method using the same

Wafer cleaning apparatus and wafer cleaning method using the same

Wafer cleaning apparatus, method for cleaning wafer and method for...

Multi-chamber apparatus

Wafer cleaning apparatus and wafer cleaning method using the same

Wafer cleaning equipment

Wafer cleaning apparatus, method for cleaning wafer and method for...

Patents Applicationslast 30 patents

MULTI-CHAMBER APPARATUS

WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME

WAFER CLEANING APPARATUS, METHOD FOR CLEANING WAFER AND METHOD FOR...

WAFER CLEANING APPARATUS, METHOD FOR CLEANING WAFER AND METHOD FOR...

WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME

WAFER CLEANING APPARATUS AND WAFER CLEANING METHOD USING THE SAME

MULTI-CHAMBER APPARATUS

WAFER CLEANING EQUIPMENT