Hun Sang KIM

Person

San Ramon, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Processing chamber with substrate edge enhancement processing
- Patent number 11,094,511
- Issue date Aug 17, 2021
- Applied Materials, Inc.
- Changhun Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas flow for condensation reduction with a substrate processing chuck
- Patent number 10,770,329
- Issue date Sep 8, 2020
- Applied Materials, Inc.
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gas flow for condensation reduction with a substrate processing chuck
- Patent number 10,186,444
- Issue date Jan 22, 2019
- Applied Materials, Inc.
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming features in a silicon containing layer
- Patent number 9,627,216
- Issue date Apr 18, 2017
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Simplified litho-etch-litho-etch process
- Patent number 9,425,058
- Issue date Aug 23, 2016
- Applied Materials, Inc.
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of etching a boron doped carbon hardmask
- Patent number 9,287,124
- Issue date Mar 15, 2016
- Applied Materials, Inc.
- Byungkook Kong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selective self-aligned double patterning of regions in an integrate...
- Patent number 8,293,656
- Issue date Oct 23, 2012
- Applied Materials, Inc.
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching carbonaceous layers with sulfur-based etchants
- Patent number 8,133,819
- Issue date Mar 13, 2012
- Applied Materials, Inc.
- Judy Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PROCESSING CHAMBER WITH SUBSTRATE EDGE ENHANCEMENT PROCESSING
- Publication number 20200152431
- Publication date May 14, 2020
- Applied Materials, Inc.
- Changhun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEMS AND METHODS FOR POWER PLANT MODEL OPTIMIZATION
- Publication number 20160299999
- Publication date Oct 13, 2016
- GENERAL ELECTRIC COMPANY
- Golda James
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GAS FLOW FOR CONDENSATION REDUCTION WITH A SUBSTRATE PROCESSING CHUCK
- Publication number 20160276197
- Publication date Sep 22, 2016
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIMPLIFIED LITHO-ETCH-LITHO-ETCH PROCESS
- Publication number 20160027654
- Publication date Jan 28, 2016
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SHALLOW TRENCH ISOLATION FORMATION IN A SILICON GERMANI...
- Publication number 20150371889
- Publication date Dec 24, 2015
- Applied Materials, Inc.
- HUN SANG KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER
- Publication number 20150099345
- Publication date Apr 9, 2015
- Applied Materials, Inc.
- BYUNGKOOK KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON...
- Publication number 20150064880
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Jun Wan KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF ETCHING A BORON DOPED CARBON HARDMASK
- Publication number 20150064914
- Publication date Mar 5, 2015
- Applied Materials, Inc.
- Byungkook KONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF ALIGNED DUAL PATTERNING TECHNIQUE ENHANCEMENT WITH MAGNETIC SH...
- Publication number 20140212994
- Publication date Jul 31, 2014
- Applied Materials, Inc.
- Hun Sang KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELECTIVE SELF-ALIGNED DOUBLE PATTERNING OF REGIONS IN AN INTEGRATE...
- Publication number 20100297850
- Publication date Nov 25, 2010
- Hun Sang Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA ETCHING CARBONACEOUS LAYERS WITH SULFUR-BASED ETCHANTS
- Publication number 20090212010
- Publication date Aug 27, 2009
- Judy Wang
- H01 - BASIC ELECTRIC ELEMENTS

Hun Sang KIM

Person

Patents Grantslast 30 patents

Processing chamber with substrate edge enhancement processing

Gas flow for condensation reduction with a substrate processing chuck

Gas flow for condensation reduction with a substrate processing chuck

Method for forming features in a silicon containing layer

Simplified litho-etch-litho-etch process

Method of etching a boron doped carbon hardmask

Selective self-aligned double patterning of regions in an integrate...

Plasma etching carbonaceous layers with sulfur-based etchants

Patents Applicationslast 30 patents

PROCESSING CHAMBER WITH SUBSTRATE EDGE ENHANCEMENT PROCESSING

SYSTEMS AND METHODS FOR POWER PLANT MODEL OPTIMIZATION

GAS FLOW FOR CONDENSATION REDUCTION WITH A SUBSTRATE PROCESSING CHUCK

SIMPLIFIED LITHO-ETCH-LITHO-ETCH PROCESS

METHODS FOR SHALLOW TRENCH ISOLATION FORMATION IN A SILICON GERMANI...

METHOD FOR FORMING FEATURES IN A SILICON CONTAINING LAYER

POST ETCH TREATMENT TECHNOLOGY FOR ENHANCING PLASMA-ETCHED SILICON...

METHOD OF ETCHING A BORON DOPED CARBON HARDMASK

SELF ALIGNED DUAL PATTERNING TECHNIQUE ENHANCEMENT WITH MAGNETIC SH...

SELECTIVE SELF-ALIGNED DOUBLE PATTERNING OF REGIONS IN AN INTEGRATE...

PLASMA ETCHING CARBONACEOUS LAYERS WITH SULFUR-BASED ETCHANTS