Hung-Eil Kim

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of forming an electronic device including forming features w...
- Patent number 8,003,545
- Issue date Aug 23, 2011
- Spansion LLC
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for optimizing an optical proximity correction...
- Patent number 7,788,609
- Issue date Aug 31, 2010
- GLOBALFOUNDRIES Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,657,864
- Issue date Feb 2, 2010
- GLOBALFOUNDRIES Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System and method for designing an integrated circuit device
- Patent number 7,543,256
- Issue date Jun 2, 2009
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of forming narrowly spaced flash memory contact openings and...
- Patent number 7,507,661
- Issue date Mar 24, 2009
- Spansion LLC
- Emmanuil H. Lingunis
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask CD measurement monitor outside of the pellicle area
- Patent number 7,422,828
- Issue date Sep 9, 2008
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and method for fabricating contact holes
- Patent number 7,384,725
- Issue date Jun 10, 2008
- Advanced Micro Devices, Inc.
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two mask photoresist exposure pattern for dense and isolated regions
- Patent number 7,368,225
- Issue date May 6, 2008
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optimizing an integrated circuit layout by taking into consideratio...
- Patent number 7,313,769
- Issue date Dec 25, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for integrated circuit device design and manufact...
- Patent number 7,269,804
- Issue date Sep 11, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for metrology recipe generation and review and an...
- Patent number 7,207,017
- Issue date Apr 17, 2007
- Advanced Micro Devices, Inc.
- Cyrus Tabery
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for design rule creation and selection
- Patent number 7,194,725
- Issue date Mar 20, 2007
- Advanced Micro Devices, Inc.
- Todd P. Lukanc
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of verifying an optical proximity correction (OPC) model
- Patent number 7,065,738
- Issue date Jun 20, 2006
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning for elongated VSS contact flash memory
- Patent number 7,018,922
- Issue date Mar 28, 2006
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning for elliptical Vss contact on flash memory
- Patent number 6,900,124
- Issue date May 31, 2005
- Advanced Micro Devices, Inc.
- Hung-eil Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for determining flow rates for contact formation
- Patent number 6,811,932
- Issue date Nov 2, 2004
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two mask photoresist exposure pattern for dense and isolated regions
- Patent number 6,803,178
- Issue date Oct 12, 2004
- Advanced Micro Devices, Inc.
- Ramkumar Subramanian
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist mask that combines attenuated and alternating phase shi...
- Patent number 6,593,039
- Issue date Jul 15, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Accurate contact critical dimension measurement using variable thre...
- Patent number 6,581,023
- Issue date Jun 17, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G01 - MEASURING TESTING
Information Patent Grant
Tri-tone mask process for dense and isolated patterns
- Patent number 6,576,376
- Issue date Jun 10, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dark field trench in an alternating phase shift mask to avoid phase...
- Patent number 6,566,020
- Issue date May 20, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method to improve accuracy of model-based optical proximity correction
- Patent number 6,544,699
- Issue date Apr 8, 2003
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR OPTIMIZING AN OPTICAL PROXIMITY CORRECTION...
- Publication number 20090249261
- Publication date Oct 1, 2009
- HUNG-EIL KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES W...
- Publication number 20090209107
- Publication date Aug 20, 2009
- SPANSION LLC
- Todd Lukanc
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...
- Publication number 20070209030
- Publication date Sep 6, 2007
- Advanced Micro Devices, Inc.
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method of forming narrowly spaced flash memory contact openings and...
- Publication number 20060035459
- Publication date Feb 16, 2006
- Emmanuil H. Lingunis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for integrated circuit device design and manufact...
- Publication number 20050229125
- Publication date Oct 13, 2005
- Cyrus E. Tabery
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System and method for fabricating contact holes
- Publication number 20050221233
- Publication date Oct 6, 2005
- Anna M. Minvielle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Dark field trench in an alternating phase shift mask to avoid phase...
- Publication number 20020160275
- Publication date Oct 31, 2002
- Advanced Micro Devices, Inc.
- Hung-Eil Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hung-Eil Kim

Person

Patents Grantslast 30 patents

Method of forming an electronic device including forming features w...

Method and apparatus for optimizing an optical proximity correction...

System and method for integrated circuit device design and manufact...

System and method for designing an integrated circuit device

Method of forming narrowly spaced flash memory contact openings and...

Mask CD measurement monitor outside of the pellicle area

System and method for fabricating contact holes

Two mask photoresist exposure pattern for dense and isolated regions

Optimizing an integrated circuit layout by taking into consideratio...

System and method for integrated circuit device design and manufact...

Method and system for metrology recipe generation and review and an...

System and method for design rule creation and selection

Method of verifying an optical proximity correction (OPC) model

Patterning for elongated VSS contact flash memory

Patterning for elliptical Vss contact on flash memory

Method and system for determining flow rates for contact formation

Two mask photoresist exposure pattern for dense and isolated regions

Photoresist mask that combines attenuated and alternating phase shi...

Accurate contact critical dimension measurement using variable thre...

Tri-tone mask process for dense and isolated patterns

Dark field trench in an alternating phase shift mask to avoid phase...

Method to improve accuracy of model-based optical proximity correction

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR OPTIMIZING AN OPTICAL PROXIMITY CORRECTION...

METHOD OF FORMING AN ELECTRONIC DEVICE INCLUDING FORMING FEATURES W...

SYSTEM AND METHOD FOR INTEGRATED CIRCUIT DEVICE DESIGN AND MANUFACT...

Method of forming narrowly spaced flash memory contact openings and...

System and method for integrated circuit device design and manufact...

System and method for fabricating contact holes

Dark field trench in an alternating phase shift mask to avoid phase...