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Patents Grantslast 30 patents

Information Patent Grant
Phase shift mask for extreme ultraviolet lithography and a method o...
- Patent number 12,099,293
- Issue date Sep 24, 2024
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift masks for extreme ultraviolet lithography
- Patent number 11,774,846
- Issue date Oct 3, 2023
- Samsung Electronics Co., Ltd.
- Seongsue Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase shift masks for extreme ultraviolet lithography
- Patent number 11,487,197
- Issue date Nov 1, 2022
- Samsung Electronics Co., Ltd.
- Seongsue Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 11,372,323
- Issue date Jun 28, 2022
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-shift mask for extreme ultraviolet lithography
- Patent number 10,719,008
- Issue date Jul 21, 2020
- Samsung Electronics Co., Ltd.
- Hwanseok Seo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHASE SHIFT MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20230018819
- Publication date Jan 19, 2023
- Samsung Electronics Co., Ltd.
- SEONGSUE KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY AND A METHOD O...
- Publication number 20210389662
- Publication date Dec 16, 2021
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE SHIFT MASKS FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20210318608
- Publication date Oct 14, 2021
- Samsung Electronics Co., Ltd.
- SEONGSUE KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20200209732
- Publication date Jul 2, 2020
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHASE-SHIFT MASK FOR EXTREME ULTRAVIOLET LITHOGRAPHY
- Publication number 20180143527
- Publication date May 24, 2018
- Samsung Electronics Co., Ltd.
- Hwanseok SEO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY