Hwayoung JIN

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Suwon-si, KR

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Patents Applicationslast 30 patents

Information Patent Application
RESIST UNDERLAYER COMPOSITION, AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053091
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Ahra CHO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20250053090
- Publication date Feb 13, 2025
- Samsung SDI Co., Ltd.
- Hwayoung JIN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20240061338
- Publication date Feb 22, 2024
- SAMSUNG SDI CO., LTD.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION FOR RESIST UNDERLAYER AND PATTERN FORMATION METHOD USIN...
- Publication number 20230288809
- Publication date Sep 14, 2023
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
RESIST UNDERLAYER COMPOSITION AND METHOD OF FORMING PATTERNS USING...
- Publication number 20230103089
- Publication date Mar 30, 2023
- Samsung SDI Co., Ltd.
- Yoojeong CHOI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY