Hyo Young KWON

Person

Suwon-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Method for securing program safety of HVDC system and HVDC system u...
- Patent number 12,050,447
- Issue date Jul 30, 2024
- HYOSUNG HEAVY INDUSTRIES CORPORATION
- Hyo Chul Kwon
- G05 - CONTROLLING REGULATING
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 10,556,986
- Issue date Feb 11, 2020
- Samsung SDI Co., Ltd.
- Youjung Park
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photocurable composition and device including barrier layer formed...
- Patent number 10,392,459
- Issue date Aug 27, 2019
- Cheil Industries, Inc.
- Ji Hye Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, organic layer composition, organic layer, and method of fo...
- Patent number 10,364,221
- Issue date Jul 30, 2019
- Samsung SDI Co., Ltd.
- Hyo Young Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 10,340,148
- Issue date Jul 2, 2019
- Samsung SDI Co., Ltd.
- Hyo Young Kwon
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 10,323,124
- Issue date Jun 18, 2019
- Samsung SDI Co., Ltd.
- Youn-Hee Nam
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Organic layer composition, organic layer, and method of forming pat...
- Patent number 10,066,057
- Issue date Sep 4, 2018
- Samsung SDI Co., Ltd.
- Yu-Shin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 9,971,243
- Issue date May 15, 2018
- Samsung SDI Co., Ltd.
- Yu-Shin Park
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, and method of forming patterns
- Patent number 9,873,815
- Issue date Jan 23, 2018
- Samsung SDI Co., Ltd.
- Soohyoun Mun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, polymer, organic layer composition, organic layer, and met...
- Patent number 9,862,668
- Issue date Jan 9, 2018
- Samsung SDI Co., Ltd.
- Youn-Hee Nam
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 9,758,612
- Issue date Sep 12, 2017
- Samsung SDI Co., Ltd.
- Ran Namgung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer for a hardmask composition, hardmask composition comprising...
- Patent number 9,725,389
- Issue date Aug 8, 2017
- Cheil Industries, Inc.
- Yun-Jun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist underlayer composition, method of forming patterns, and semi...
- Patent number 9,606,438
- Issue date Mar 28, 2017
- Cheil Industries, Inc.
- Min-Gyum Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer, organic layer composition, organic layer, and method of fo...
- Patent number 9,593,205
- Issue date Mar 14, 2017
- Samsung SDI Co., Ltd.
- Soo-Hyoun Mun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer, hardmask composition including monomer, and method for for...
- Patent number 9,556,094
- Issue date Jan 31, 2017
- Cheil Industries, Inc.
- Yun-Jun Kim
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Monomer for hardmask composition, hardmask composition including mo...
- Patent number 9,359,276
- Issue date Jun 7, 2016
- Cheil Industries, Inc.
- Yoo-Jeong Choi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Positive photosensitive resin composition, photosensitive resin fil...
- Patent number 9,329,475
- Issue date May 3, 2016
- Cheil Industries Inc.
- Ran Namgung
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist underlayer composition, method of forming patterns and semic...
- Patent number 9,195,136
- Issue date Nov 24, 2015
- Cheil Industries, Inc.
- Hyo-Young Kwon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive photosensitive resin composition, and organic insulator fi...
- Patent number 8,956,790
- Issue date Feb 17, 2015
- Cheil Industries Inc.
- Jun-Ho Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM FOR VARIABLY CONTROLLING SAMPLING FREQUENCY
- Publication number 20240192255
- Publication date Jun 13, 2024
- HYOSUNG HEAVY INDUSTRIES CORPORATION
- Hyo Chul KWON
- G01 - MEASURING TESTING
Information Patent Application
SERVICE IDENTIFYING AND PROCESSING METHOD USING LOW DISTANCE WIRELE...
- Publication number 20240129725
- Publication date Apr 18, 2024
- eStorm Co., LTD
- Jong Hyun WOO
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
BLOCKCHAIN BASED AUTHENTICATION AND TRANSACTION SYSTEM
- Publication number 20240046265
- Publication date Feb 8, 2024
- eStorm Co., LTD
- Jong Hyun WOO
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR SECURING PROGRAM SAFETY OF HVDC SYSTEM AND HVDC SYSTEM U...
- Publication number 20220269236
- Publication date Aug 25, 2022
- HYOSUNG HEAVY INDUSTRIES CORPORATION
- Hyo Chul KWON
- G05 - CONTROLLING REGULATING
Information Patent Application
MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING...
- Publication number 20170327640
- Publication date Nov 16, 2017
- Samsung SDI Co., Ltd.
- Yun-Jun KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20170114181
- Publication date Apr 27, 2017
- Samsung SDI Co., Ltd.
- Youjung PARK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20170110328
- Publication date Apr 20, 2017
- SAMSUNG SDI CO., LTD.
- Hyo Young KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20170008843
- Publication date Jan 12, 2017
- Samsung SDI Co., Ltd.
- Hyo Young KWON
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160363864
- Publication date Dec 15, 2016
- Samsung SDI Co., Ltd.
- Yu-Shin PARK
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS
- Publication number 20160322216
- Publication date Nov 3, 2016
- Samsung SDI Co., Ltd.
- Soohyoun MUN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...
- Publication number 20160297932
- Publication date Oct 13, 2016
- Samsung SDI Co., Ltd.
- Yu-Shin PARK
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160237195
- Publication date Aug 18, 2016
- Samsung SDI Co., Ltd.
- Ran NAMGUNG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160152771
- Publication date Jun 2, 2016
- Samsung SDI Co., Ltd.
- Soo-Hyoun MUN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND ME...
- Publication number 20160145379
- Publication date May 26, 2016
- Samsung SDI Co., Ltd.
- Youn-Hee NAM
- C07 - ORGANIC CHEMISTRY
Information Patent Application
POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...
- Publication number 20160090449
- Publication date Mar 31, 2016
- Samsung SDI Co., Ltd.
- Youn-Hee NAM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS, AND SEMI...
- Publication number 20160041470
- Publication date Feb 11, 2016
- CHEIL INDUSTRIES INC.
- Min-Gyum KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOCURABLE COMPOSITION AND DEVICE INCLUDING BARRIER LAYER FORMED...
- Publication number 20150318482
- Publication date Nov 5, 2015
- CHEIL INDUSTRIES INC.
- Ji Hye KWON
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FOR...
- Publication number 20150274622
- Publication date Oct 1, 2015
- CHEIL INDUSTRIES INC.
- Yun-Jun Kim
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Positive Photosensitive Resin Composition, Photosensitive Resin Fil...
- Publication number 20150160553
- Publication date Jun 11, 2015
- CHEIL INDUSTRIES INC.
- Hyo-Young KWON
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Positive Photosensitive Resin Composition, Photosensitive Resin Fil...
- Publication number 20150111153
- Publication date Apr 23, 2015
- CHEIL INDUSTRIES INC.
- Ran NAMGUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MO...
- Publication number 20150008212
- Publication date Jan 8, 2015
- Yoo-Jeong Choi
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING...
- Publication number 20140342273
- Publication date Nov 20, 2014
- Yun-Jun Kim
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS AND SEMIC...
- Publication number 20140319659
- Publication date Oct 30, 2014
- Hyo-Young KWON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive Photosensitive Resin Composition, and Organic Insulator Fi...
- Publication number 20140178816
- Publication date Jun 26, 2014
- Jun-Ho LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hyo Young KWON

Person

Patents Grantslast 30 patents

Method for securing program safety of HVDC system and HVDC system u...

Polymer, organic layer composition, and method of forming patterns

Photocurable composition and device including barrier layer formed...

Monomer, organic layer composition, organic layer, and method of fo...

Polymer, organic layer composition, and method of forming patterns

Polymer, organic layer composition, organic layer, and method of fo...

Organic layer composition, organic layer, and method of forming pat...

Polymer, organic layer composition, organic layer, and method of fo...

Polymer, organic layer composition, and method of forming patterns

Monomer, polymer, organic layer composition, organic layer, and met...

Polymer, organic layer composition, organic layer, and method of fo...

Monomer for a hardmask composition, hardmask composition comprising...

Resist underlayer composition, method of forming patterns, and semi...

Polymer, organic layer composition, organic layer, and method of fo...

Monomer, hardmask composition including monomer, and method for for...

Monomer for hardmask composition, hardmask composition including mo...

Positive photosensitive resin composition, photosensitive resin fil...

Resist underlayer composition, method of forming patterns and semic...

Positive photosensitive resin composition, and organic insulator fi...

Patents Applicationslast 30 patents

SYSTEM FOR VARIABLY CONTROLLING SAMPLING FREQUENCY

SERVICE IDENTIFYING AND PROCESSING METHOD USING LOW DISTANCE WIRELE...

BLOCKCHAIN BASED AUTHENTICATION AND TRANSACTION SYSTEM

METHOD FOR SECURING PROGRAM SAFETY OF HVDC SYSTEM AND HVDC SYSTEM U...

MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING...

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

MONOMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

POLYMER, ORGANIC LAYER COMPOSITION, AND METHOD OF FORMING PATTERNS

ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FORMING PAT...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

MONOMER, POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND ME...

POLYMER, ORGANIC LAYER COMPOSITION, ORGANIC LAYER, AND METHOD OF FO...

RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS, AND SEMI...

PHOTOCURABLE COMPOSITION AND DEVICE INCLUDING BARRIER LAYER FORMED...

MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FOR...

Positive Photosensitive Resin Composition, Photosensitive Resin Fil...

Positive Photosensitive Resin Composition, Photosensitive Resin Fil...

MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING MO...

MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING...

RESIST UNDERLAYER COMPOSITION, METHOD OF FORMING PATTERNS AND SEMIC...

Positive Photosensitive Resin Composition, and Organic Insulator Fi...