Hyou Takahashi

Person

Haibara-gun, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 9,052,594
- Issue date Jun 9, 2015
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Actinic ray-sensitive or radiation-sensitive resin composition and...
- Patent number 9,046,766
- Issue date Jun 2, 2015
- FUJIFILM Corporation
- Takayuki Kato
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Positive photosensitive composition and method of forming pattern u...
- Patent number 8,080,361
- Issue date Dec 20, 2011
- FUJIFILM Corporation
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Resist composition and method of pattern formation with the same
- Patent number 7,914,965
- Issue date Mar 29, 2011
- FUJIFILM Corporation
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for electron beam, EUV or X-ray
- Patent number 7,521,168
- Issue date Apr 21, 2009
- FUJIFILM Corporation
- Kazuyoshi Mizutani
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Chemical amplification resist composition and pattern-forming metho...
- Patent number 7,425,404
- Issue date Sep 16, 2008
- FUJIFILM Corporation
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition for immersion exposure and pattern formation met...
- Patent number 7,326,516
- Issue date Feb 5, 2008
- FUJIFILM Corporation
- Fumiyuki Nishiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition and pattern formation method using the...
- Patent number 7,285,369
- Issue date Oct 23, 2007
- FUJIFILM Corporation
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Positive-working resist composition
- Patent number 7,241,551
- Issue date Jul 10, 2007
- FUJIFILM Corporation
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Positive resist composition
- Patent number 7,105,273
- Issue date Sep 12, 2006
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Stimulus sensitive compound and stimulus sensitive composition cont...
- Patent number 7,094,515
- Issue date Aug 22, 2006
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Resist composition
- Patent number 7,083,892
- Issue date Aug 1, 2006
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Resist composition
- Patent number 6,902,862
- Issue date Jun 7, 2005
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...
- Publication number 20120058431
- Publication date Mar 8, 2012
- FUJIFILM CORPORATION
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...
- Publication number 20100009288
- Publication date Jan 14, 2010
- FUJIFILM CORPORATION
- Takayuki Kato
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Positive photosensitive composition and method of forming pattern u...
- Publication number 20070172761
- Publication date Jul 26, 2007
- FUJIFILM Corporation
- Hyou Takahashi
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Resist composition
- Publication number 20060147837
- Publication date Jul 6, 2006
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition and method of pattern formation with the same
- Publication number 20060068320
- Publication date Mar 30, 2006
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Chemical amplification resist composition and pattern-forming metho...
- Publication number 20060040208
- Publication date Feb 23, 2006
- Fuji Photo Film Co., Ltd.
- Shinji Tarutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for immersion exposure and pattern formation met...
- Publication number 20050186503
- Publication date Aug 25, 2005
- Fuji Photo Film Co., Ltd.
- Fumiyuki Nishiyama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern forming method using the same
- Publication number 20050079441
- Publication date Apr 14, 2005
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition and pattern formation method using the...
- Publication number 20050064329
- Publication date Mar 24, 2005
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive-working resist composition
- Publication number 20040248035
- Publication date Dec 9, 2004
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Stimulus sensitive compound and stimulus sensitive composition cont...
- Publication number 20040185378
- Publication date Sep 23, 2004
- Fuji Photo Film Co., Ltd.
- Kunihiko Kodama
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20040058272
- Publication date Mar 25, 2004
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20040053160
- Publication date Mar 18, 2004
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Positive resist composition
- Publication number 20040043323
- Publication date Mar 4, 2004
- Fuji Photo Film Co., Ltd.
- Shoichiro Yasunami
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition
- Publication number 20040005513
- Publication date Jan 8, 2004
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Resist composition for electron beam, EUV or X-ray
- Publication number 20030198894
- Publication date Oct 23, 2003
- Fuji Photo Film Co., Ltd.
- Kazuyoshi Mizutani
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Negative resist composition
- Publication number 20030165772
- Publication date Sep 4, 2003
- Fuji Photo Film Co., Ltd.
- Hyou Takahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Hyou Takahashi

Person

Patents Grantslast 30 patents

Positive photosensitive composition and method of forming pattern u...

Actinic ray-sensitive or radiation-sensitive resin composition and...

Positive photosensitive composition and method of forming pattern u...

Resist composition and method of pattern formation with the same

Resist composition for electron beam, EUV or X-ray

Chemical amplification resist composition and pattern-forming metho...

Resist composition for immersion exposure and pattern formation met...

Positive resist composition and pattern formation method using the...

Positive-working resist composition

Positive resist composition

Stimulus sensitive compound and stimulus sensitive composition cont...

Resist composition

Resist composition

Patents Applicationslast 30 patents

POSITIVE PHOTOSENSITIVE COMPOSITION AND METHOD OF FORMING PATTERN U...

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND...

Positive photosensitive composition and method of forming pattern u...

Resist composition

Resist composition and method of pattern formation with the same

Chemical amplification resist composition and pattern-forming metho...

Resist composition for immersion exposure and pattern formation met...

Positive resist composition and pattern forming method using the same

Positive resist composition and pattern formation method using the...

Positive-working resist composition

Stimulus sensitive compound and stimulus sensitive composition cont...

Resist composition

Resist composition

Positive resist composition

Resist composition

Resist composition for electron beam, EUV or X-ray

Negative resist composition