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Hyunjong Shim
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San Ramon, CA, US
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Patents Grants
last 30 patents
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Patent Grant
Mask shrink layer for high aspect ratio dielectric etch
Patent number
10,431,458
Issue date
Oct 1, 2019
Lam Research Corporation
Eric A. Hudson
H01 - BASIC ELECTRIC ELEMENTS
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Patent Grant
Mask shrink layer for high aspect ratio dielectric etch
Patent number
9,543,148
Issue date
Jan 10, 2017
Lam Research Corporation
Eric A. Hudson
H01 - BASIC ELECTRIC ELEMENTS
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last 30 patents
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Patent Application
MASK SHRINK LAYER FOR HIGH ASPECT RATIO DIELECTRIC ETCH
Publication number
20170076945
Publication date
Mar 16, 2017
LAM RESEARCH CORPORATION
Eric A. Hudson
H01 - BASIC ELECTRIC ELEMENTS