Ian G. Brown

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 11,538,684
- Issue date Dec 27, 2022
- Tokyo Electron Limited
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
System and method for enhanced removal of metal hardmask using ultr...
- Patent number 10,828,680
- Issue date Nov 10, 2020
- Tokyo Electron Limited
- Ian J. Brown
- B08 - CLEANING
Information Patent Grant
UV-assisted stripping of hardened photoresist to create chemical te...
- Patent number 10,490,402
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Mark Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Systems and methodologies for vapor phase hydroxyl radical processi...
- Patent number 10,490,399
- Issue date Nov 26, 2019
- Tokyo Electron Limited
- Ian J. Brown
- B08 - CLEANING
Information Patent Grant
Method and hardware for enhanced removal of post etch polymer and h...
- Patent number 10,347,503
- Issue date Jul 9, 2019
- Tokyo Electron Limited
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and system using atmospheric pressure ato...
- Patent number 10,249,509
- Issue date Apr 2, 2019
- Tokyo Electron Limited
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process gas generation for cleaning of substrates
- Patent number 9,966,280
- Issue date May 8, 2018
- Tokyo Electron Limited
- Ian J Brown
- B08 - CLEANING
Information Patent Grant
Method of stripping photoresist on a single substrate system
- Patent number 9,875,916
- Issue date Jan 23, 2018
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Etch system and method for single substrate processing
- Patent number 9,852,920
- Issue date Dec 26, 2017
- Tokyo Electron Limited
- Ian J Brown
- B08 - CLEANING
Information Patent Grant
Controlling cleaning of a layer on a substrate using nozzles
- Patent number 9,735,026
- Issue date Aug 15, 2017
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system of process chemical temperature control using an...
- Patent number 9,513,556
- Issue date Dec 6, 2016
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 9,454,081
- Issue date Sep 27, 2016
- Tokyo Electron Limited
- Mark H Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sonic energy to generate active species for surface preparation, cl...
- Patent number 9,327,322
- Issue date May 3, 2016
- Tokyo Electron Limited
- Ian J Brown
- B08 - CLEANING
Information Patent Grant
Etch system and method for single substrate processing
- Patent number 9,257,292
- Issue date Feb 9, 2016
- Tokyo Electron Limited
- Ian J Brown
- B08 - CLEANING
Information Patent Grant
Sequential stage mixing for a resist batch strip process
- Patent number 9,075,318
- Issue date Jul 7, 2015
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Sequential stage mixing for single substrate strip processing
- Patent number 8,940,103
- Issue date Jan 27, 2015
- Tokyo Electron Limited
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Line pattern collapse mitigation through gap-fill material application
- Patent number 8,795,952
- Issue date Aug 5, 2014
- Tokyo Electron Limited
- Mark H. Somervell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for monitoring contamination on a substrate
- Patent number 8,083,862
- Issue date Dec 27, 2011
- Tokyo Electron Limited
- Ian J. Brown
- B08 - CLEANING
Information Patent Grant
Method for removing damaged dielectric material
- Patent number 7,795,148
- Issue date Sep 14, 2010
- Tokyo Electron Limited
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for selective removal of damaged multi-stack bilayer films
- Patent number 7,723,237
- Issue date May 25, 2010
- Tokyo Electron Limited
- Sandra Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and system for patterning a dielectric film
- Patent number 7,288,483
- Issue date Oct 30, 2007
- Tokyo Electron Limited
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for measuring liquid level in a sealed container
- Patent number 6,067,855
- Issue date May 30, 2000
- Advanced Micro Devices, Inc.
- Ian G. Brown
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...
- Publication number 20200066509
- Publication date Feb 27, 2020
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Application
ATOMIC LAYER ETCHING SYSTEMS AND METHODS
- Publication number 20170345665
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Jacques FAGUET
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM OF CONTROLLING TREATMENT LIQUID DISPENSE FOR SPINNING SUBSTR...
- Publication number 20170301567
- Publication date Oct 19, 2017
- IAN J BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER REMOVAL USING CHROMOPHORES AND LIGHT EXPOSURE
- Publication number 20170278695
- Publication date Sep 28, 2017
- TOKYO ELECTRON LIMITED
- Ian J. BROWN
- B08 - CLEANING
Information Patent Application
SYSTEMS AND METHODOLOGIES FOR VAPOR PHASE HYDROXYL RADICAL PROCESSI...
- Publication number 20170263436
- Publication date Sep 14, 2017
- TOKYO ELECTRON LIMITED
- Ian J. BROWN
- B08 - CLEANING
Information Patent Application
METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING LIQU...
- Publication number 20170092484
- Publication date Mar 30, 2017
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20160363868
- Publication date Dec 15, 2016
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Techniques for Spin-on-Carbon Planarization
- Publication number 20160358786
- Publication date Dec 8, 2016
- TOKYO ELECTRON LIMITED
- Joshua S. Hooge
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ETCH SYSTEM AND METHOD FOR SINGLE SUBSTRATE PROCESSING
- Publication number 20160155647
- Publication date Jun 2, 2016
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM OF CONTROLLING TREATMENT LIQUID DISPENSE FOR SPINNING SUBSTR...
- Publication number 20150136183
- Publication date May 21, 2015
- IAN J BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM FOR PROCESSING SUBSTRATES WITH TWO OR MORE ULTRAVIOLET LIGHT...
- Publication number 20150136186
- Publication date May 21, 2015
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- B08 - CLEANING
Information Patent Application
System and Method for Enhanced Removal of Metal Hardmask Using Ultr...
- Publication number 20150128990
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- B08 - CLEANING
Information Patent Application
Method and Hardware for Enhanced Removal of Post Etch Polymer and H...
- Publication number 20150128991
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20150125791
- Publication date May 7, 2015
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
UV-Assisted Stripping of Hardened Photoresist to Create Chemical Te...
- Publication number 20150064917
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Mark Somervell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROLLING CLEANING OF A LAYER ON A SUBSTRATE USING NOZZLES
- Publication number 20140144463
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM OF PROCESS CHEMICAL TEMPERATURE CONTROL USING AN...
- Publication number 20140137892
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUBSTRATE CLEANING METHOD AND SYSTEM USING ATMOSPHERIC PRESSURE ATO...
- Publication number 20140130825
- Publication date May 15, 2014
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS GAS GENERATION FOR CLEANING OF SUBSTRATES
- Publication number 20140096792
- Publication date Apr 10, 2014
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- B08 - CLEANING
Information Patent Application
METHOD OF STRIPPING PHOTORESIST ON A SINGLE SUBSTRATE SYSTEM
- Publication number 20140007902
- Publication date Jan 9, 2014
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND SYSTEM FOR RAPID MIXING OF PROCESS CHEMICALS USING AN IN...
- Publication number 20130319465
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SONIC ENERGY TO GENERATE ACTIVE SPECIES FOR SURFACE PREPARATION, CL...
- Publication number 20130319459
- Publication date Dec 5, 2013
- TOKYO ELECTRON LIMITED
- IAN J BROWN
- B08 - CLEANING
Information Patent Application
SEQUENTIAL STAGE MIXING FOR A RESIST BATCH STRIP PROCESS
- Publication number 20130233351
- Publication date Sep 12, 2013
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEQUENTIAL STAGE MIXING FOR SINGLE SUBSTRATE STRIP PROCESSING
- Publication number 20130233343
- Publication date Sep 12, 2013
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INCREASING MASKING LAYER ETCH RATE AND SELECTIVITY
- Publication number 20120248061
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
ETCH SYSTEM AND METHOD FOR SINGLE SUBSTRATE PROCESSING
- Publication number 20120247505
- Publication date Oct 4, 2012
- TOKYO ELECTRON LIMITED
- IAN J. BROWN
- B08 - CLEANING
Information Patent Application
LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION
- Publication number 20110205505
- Publication date Aug 25, 2011
- TOKYO ELECTRON LIMITED
- Mark H. SOMERVELL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR MONITORING CONTAMINATION ON A SUBSTRATE
- Publication number 20080216871
- Publication date Sep 11, 2008
- TOKYO ELECTRON LIMITED
- Ian J. Brown
- B08 - CLEANING
Information Patent Application
METHOD FOR SELECTIVE REMOVAL OF DAMAGED MULTI-STACK BILAYER FILMS
- Publication number 20080142988
- Publication date Jun 19, 2008
- TOKYO ELECTRON LIMITED
- Sandra Hyland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for removing damaged dielectric material
- Publication number 20070235411
- Publication date Oct 11, 2007
- TOKYO ELECTON LIMITED
- Ian J. Brown
- H01 - BASIC ELECTRIC ELEMENTS

Ian G. Brown

Person

Patents Grantslast 30 patents

UV-assisted stripping of hardened photoresist to create chemical te...

System and method for enhanced removal of metal hardmask using ultr...

UV-assisted stripping of hardened photoresist to create chemical te...

Systems and methodologies for vapor phase hydroxyl radical processi...

Method and hardware for enhanced removal of post etch polymer and h...

Substrate cleaning method and system using atmospheric pressure ato...

Process gas generation for cleaning of substrates

Method of stripping photoresist on a single substrate system

Etch system and method for single substrate processing

Controlling cleaning of a layer on a substrate using nozzles

Method and system of process chemical temperature control using an...

Line pattern collapse mitigation through gap-fill material application

Sonic energy to generate active species for surface preparation, cl...

Etch system and method for single substrate processing

Sequential stage mixing for a resist batch strip process

Sequential stage mixing for single substrate strip processing

Line pattern collapse mitigation through gap-fill material application

Method and system for monitoring contamination on a substrate

Method for removing damaged dielectric material

Method for selective removal of damaged multi-stack bilayer films

Method and system for patterning a dielectric film

Apparatus and method for measuring liquid level in a sealed container

Patents Applicationslast 30 patents

UV-ASSISTED STRIPPING OF HARDENED PHOTORESIST TO CREATE CHEMICAL TE...

ATOMIC LAYER ETCHING SYSTEMS AND METHODS

SYSTEM OF CONTROLLING TREATMENT LIQUID DISPENSE FOR SPINNING SUBSTR...

POLYMER REMOVAL USING CHROMOPHORES AND LIGHT EXPOSURE

SYSTEMS AND METHODOLOGIES FOR VAPOR PHASE HYDROXYL RADICAL PROCESSI...

METHOD AND APPARATUS FOR DRYING SEMICONDUCTOR SUBSTRATES USING LIQU...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

Techniques for Spin-on-Carbon Planarization

ETCH SYSTEM AND METHOD FOR SINGLE SUBSTRATE PROCESSING

SYSTEM OF CONTROLLING TREATMENT LIQUID DISPENSE FOR SPINNING SUBSTR...

SYSTEM FOR PROCESSING SUBSTRATES WITH TWO OR MORE ULTRAVIOLET LIGHT...

System and Method for Enhanced Removal of Metal Hardmask Using Ultr...

Method and Hardware for Enhanced Removal of Post Etch Polymer and H...

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

UV-Assisted Stripping of Hardened Photoresist to Create Chemical Te...

CONTROLLING CLEANING OF A LAYER ON A SUBSTRATE USING NOZZLES

METHOD AND SYSTEM OF PROCESS CHEMICAL TEMPERATURE CONTROL USING AN...

SUBSTRATE CLEANING METHOD AND SYSTEM USING ATMOSPHERIC PRESSURE ATO...

PROCESS GAS GENERATION FOR CLEANING OF SUBSTRATES

METHOD OF STRIPPING PHOTORESIST ON A SINGLE SUBSTRATE SYSTEM

METHOD AND SYSTEM FOR RAPID MIXING OF PROCESS CHEMICALS USING AN IN...

SONIC ENERGY TO GENERATE ACTIVE SPECIES FOR SURFACE PREPARATION, CL...

SEQUENTIAL STAGE MIXING FOR A RESIST BATCH STRIP PROCESS

SEQUENTIAL STAGE MIXING FOR SINGLE SUBSTRATE STRIP PROCESSING

INCREASING MASKING LAYER ETCH RATE AND SELECTIVITY

ETCH SYSTEM AND METHOD FOR SINGLE SUBSTRATE PROCESSING

LINE PATTERN COLLAPSE MITIGATION THROUGH GAP-FILL MATERIAL APPLICATION

METHOD AND SYSTEM FOR MONITORING CONTAMINATION ON A SUBSTRATE

METHOD FOR SELECTIVE REMOVAL OF DAMAGED MULTI-STACK BILAYER FILMS

Method for removing damaged dielectric material