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Ibrahim M. Ibrahim
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Santa Clara, CA, US
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Patents Grants
last 30 patents
Information
Patent Grant
Plasma reactor having an array of plural individually controlled ga...
Patent number
10,170,280
Issue date
Jan 1, 2019
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Mask etch plasma reactor having an array of optical sensors viewing...
Patent number
9,218,944
Issue date
Dec 22, 2015
Applied Materials, Inc.
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Plasma mask etch method of controlling a reactor tunable element in...
Patent number
8,017,029
Issue date
Sep 13, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Mask etch plasma reactor with variable process gas distribution
Patent number
7,976,671
Issue date
Jul 12, 2011
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
Patent number
7,520,999
Issue date
Apr 21, 2009
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
Patent number
7,504,041
Issue date
Mar 17, 2009
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
Patent number
7,431,797
Issue date
Oct 7, 2008
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
Patent number
7,419,551
Issue date
Sep 2, 2008
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Patents Applications
last 30 patents
Information
Patent Application
PLASMA REACTOR HAVING AN ARRAY OF PLURAL INDIVIDUALLY CONTROLLED GA...
Publication number
20160042917
Publication date
Feb 11, 2016
Applied Materials, Inc.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
Publication number
20100276391
Publication date
Nov 4, 2010
Applied Materials, Inc.
MICHAEL N. GRIMBERGEN
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...
Publication number
20090325387
Publication date
Dec 31, 2009
APPLIED MATERIALS, INC.
Xiaoyi Chen
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Plasma mask etch method of controlling a reactor tunable element in...
Publication number
20080099434
Publication date
May 1, 2008
Madhavi R. Chandrachood
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Mask etch plasma reactor with variable process gas distribution
Publication number
20080102202
Publication date
May 1, 2008
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Mask etch plasma reactor having an array of optical sensors viewing...
Publication number
20080102001
Publication date
May 1, 2008
Madhavi R. Chandrachood
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Application
Workpiece rotation apparatus for a plasma reactor system
Publication number
20080099451
Publication date
May 1, 2008
Richard Lewington
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with a dynamically adjustable plasma source power ap...
Publication number
20070256787
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Plasma reactor with apparatus for dynamically adjusting the plasma...
Publication number
20070256784
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of processing a workpiece in a plasma reactor with dynamic a...
Publication number
20070257008
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS
Information
Patent Application
Method of processing a workpiece in a plasma reactor employing a dy...
Publication number
20070257009
Publication date
Nov 8, 2007
APPLIED MATERIALS, INC.
Madhavi R. Chandrachood
H01 - BASIC ELECTRIC ELEMENTS