Igor Matheus Petronella Aarts

Person

Chester, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Metrology method and associated metrology and lithographic apparatuses
- Patent number 12,032,299
- Issue date Jul 9, 2024
- ASML Netherlands B.V.
- Patricius Aloysius Jacobus Tinnemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wafer alignment using form birefringence of targets or product
- Patent number 11,971,665
- Issue date Apr 30, 2024
- ASML Holding N.V.
- Joshua Adams
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of sensing alignment marks
- Patent number 11,899,380
- Issue date Feb 13, 2024
- ASML Holding N.V.
- Krishanu Shome
- G01 - MEASURING TESTING
Information Patent Grant
Adaptive alignment
- Patent number 11,513,446
- Issue date Nov 29, 2022
- ASML Holding N.V.
- Greger Göte Andersson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Noise correction for alignment signal
- Patent number 11,493,852
- Issue date Nov 8, 2022
- ASML Holdings N.V.
- Zahrasadat Dastouri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment sensor apparatus for process sensitivity compensation
- Patent number 11,175,593
- Issue date Nov 16, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark for two-dimensional alignment in an alignment system
- Patent number 11,156,928
- Issue date Oct 26, 2021
- ASML Holding N.V.
- Gerrit Johannes Nijmeijer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adaptive filter for in-line correction
- Patent number 10,928,738
- Issue date Feb 23, 2021
- ASML Holding N.V.
- Eric Brian Catey
- G01 - MEASURING TESTING
Information Patent Grant
Broad spectrum radiation by supercontinuum generation using a taper...
- Patent number 10,802,208
- Issue date Oct 13, 2020
- ASML Holding N.V.
- King Pui Leung
- G01 - MEASURING TESTING
Information Patent Grant
Alignment system wafer stack beam analyzer
- Patent number 10,488,767
- Issue date Nov 26, 2019
- ASML Holding N.V.
- Krishanu Shome
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measurement method comprising in-situ printing of apparatus mark an...
- Patent number 10,481,507
- Issue date Nov 19, 2019
- ASML Holding N.V.
- Kevin J. Violette
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT
- Publication number 20240168397
- Publication date May 23, 2024
- ASML NETHERLANDS B.V.
- Joshua ADAMS
- G01 - MEASURING TESTING
Information Patent Application
GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...
- Publication number 20230176494
- Publication date Jun 8, 2023
- ASML Holding N.V.
- Zahrasadat DASTOURI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES
- Publication number 20230017491
- Publication date Jan 19, 2023
- ASML NETHERLANDS B.V.
- Patricius Aloysius Jacobus TINNEMANS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT
- Publication number 20220137523
- Publication date May 5, 2022
- ASML Holding N.V.
- Joshua ADAMS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
NOISE CORRECTION FOR ALIGNMENT SIGNAL
- Publication number 20220066334
- Publication date Mar 3, 2022
- Zahrasadat DASTOURI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADAPTIVE ALIGNMENT
- Publication number 20210397103
- Publication date Dec 23, 2021
- ASML Holding N.V.
- Greger Göte Andersson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Sensor Apparatus for Process Sensivity Compensation
- Publication number 20210132509
- Publication date May 6, 2021
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BROAD SPECTRUM RADIATION BY SUPERCONTINUUM GENERATION USING A TAPER...
- Publication number 20210033779
- Publication date Feb 4, 2021
- ASML Holding N.V.
- King Pui LEUNG
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Mark For Two-Dimensional Alignment In An Alignment System
- Publication number 20200124995
- Publication date Apr 23, 2020
- ASML Holding N.V.
- Gerrit Johannes NIJMEIJER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Adaptive Filter for In-Line Correction
- Publication number 20190227443
- Publication date Jul 25, 2019
- ASML Holding N.V.
- Eric Brian CATEY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment System Wafer Stack Beam Analyzer
- Publication number 20190204759
- Publication date Jul 4, 2019
- ASML Holding N.V.
- Krishanu SHOME
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AN...
- Publication number 20190196341
- Publication date Jun 27, 2019
- ASML Holding N.V.
- Kevin J VIOLETTE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BROAD SPECTRUM RADIATION BY SUPERCONTINUUM GENERATION USING A TAPER...
- Publication number 20190154910
- Publication date May 23, 2019
- ASML Holding N.V.
- King Pui LEUNG
- G02 - OPTICS
Information Patent Application
Quantitative Reticle Distortion Measurement System
- Publication number 20150212425
- Publication date Jul 30, 2015
- ASML Holding N.V.
- Michael Andrew Chieda
- G01 - MEASURING TESTING

Igor Matheus Petronella Aarts

Person

Patents Grantslast 30 patents

Metrology method and associated metrology and lithographic apparatuses

Wafer alignment using form birefringence of targets or product

Apparatus for and method of sensing alignment marks

Adaptive alignment

Noise correction for alignment signal

Alignment sensor apparatus for process sensitivity compensation

Alignment mark for two-dimensional alignment in an alignment system

Adaptive filter for in-line correction

Broad spectrum radiation by supercontinuum generation using a taper...

Alignment system wafer stack beam analyzer

Measurement method comprising in-situ printing of apparatus mark an...

Patents Applicationslast 30 patents

ASYMMETRY EXTENDED GRID MODEL FOR WAFER ALIGNMENT

GENERATING AN ALIGNMENT SIGNAL BASED ON LOCAL ALIGNMENT MARK DISTOR...

METROLOGY METHOD AND ASSOCIATED METROLOGY AND LITHOGRAPHIC APPARATUSES

WAFER ALIGNMENT USING FORM BIREFRINGENCE OF TARGETS OR PRODUCT

NOISE CORRECTION FOR ALIGNMENT SIGNAL

ADAPTIVE ALIGNMENT

Alignment Sensor Apparatus for Process Sensivity Compensation

BROAD SPECTRUM RADIATION BY SUPERCONTINUUM GENERATION USING A TAPER...

Alignment Mark For Two-Dimensional Alignment In An Alignment System

Adaptive Filter for In-Line Correction

Alignment System Wafer Stack Beam Analyzer

MEASUREMENT METHOD COMPRISING IN-SITU PRINTING OF APPARATUS MARK AN...

BROAD SPECTRUM RADIATION BY SUPERCONTINUUM GENERATION USING A TAPER...

Quantitative Reticle Distortion Measurement System