Igor V. Fomenkov

Person

San Diego, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
System for monitoring a plasma
- Patent number 12,171,053
- Issue date Dec 17, 2024
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Laser system for target metrology and alteration in an EUV light so...
- Patent number 12,078,934
- Issue date Sep 3, 2024
- ASML Netherlands B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,846,887
- Issue date Dec 19, 2023
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Guiding device and associated system
- Patent number 11,822,252
- Issue date Nov 21, 2023
- ASML Netherlands B.V.
- Dzmitry Labetski
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Prolonging optical element lifetime in an EUV lithography system
- Patent number 11,340,532
- Issue date May 24, 2022
- ASML Netherlands B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for monitoring a plasma
- Patent number 11,266,002
- Issue date Mar 1, 2022
- ASML Netherlands B.V.
- Michael Anthony Purvis
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with subsystem(s) for maintaining LPP drive laser...
- Patent number 10,966,308
- Issue date Mar 30, 2021
- ASML Netherlands B.V.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Guiding device and associated system
- Patent number 10,955,749
- Issue date Mar 23, 2021
- ASML Netherlands B.V.
- Dzmitry Labetski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Wavelength-based optical filtering
- Patent number 10,663,866
- Issue date May 26, 2020
- ASML Netherlands B.V.
- Alexander Anthony Schafgans
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Faceted EUV optical element
- Patent number 10,635,002
- Issue date Apr 28, 2020
- ASML Netherlands B.V.
- David C. Brandt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of controlling debris in an EUV light source
- Patent number 10,490,313
- Issue date Nov 26, 2019
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus for and method of controlling debris in an EUV light source
- Patent number 10,128,017
- Issue date Nov 13, 2018
- ASML Netherlands B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV LPP source with dose control and laser stabilization using vari...
- Patent number 9,832,852
- Issue date Nov 28, 2017
- ASML Netherlands B.V.
- Igor V. Fomenkov
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Drive laser for EUV light source
- Patent number 9,735,535
- Issue date Aug 15, 2017
- ASML Netherlands B.V.
- Alexander I. Ershov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Laser produced plasma EUV light source
- Patent number 9,713,239
- Issue date Jul 18, 2017
- ASML Netherlands B.V.
- Bjorn A. M. Hansson
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Material supply apparatus for extreme ultraviolet light source havi...
- Patent number 9,669,334
- Issue date Jun 6, 2017
- ASML Netherlands B.V.
- Igor V. Fomenkov
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Grant
Faceted EUV optical element
- Patent number 9,541,840
- Issue date Jan 10, 2017
- ASML Netherlands B.V.
- David C. Brandt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for buffer gas flow stabilization in a laser pr...
- Patent number 9,516,730
- Issue date Dec 6, 2016
- ASML Netherlands B.V.
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,462,668
- Issue date Oct 4, 2016
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV light source with subsystem(s) for maintaining LPP drive laser...
- Patent number 9,390,827
- Issue date Jul 12, 2016
- ASML Netherlands B.V.
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Beam position control for an extreme ultraviolet light source
- Patent number 9,167,679
- Issue date Oct 20, 2015
- ASML Netherlands B.V.
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 9,155,179
- Issue date Oct 6, 2015
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Thermal monitor for an extreme ultraviolet light source
- Patent number 9,148,941
- Issue date Sep 29, 2015
- ASML Netherlands B.V.
- Vladimir Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
System, method and apparatus for aligning and synchronizing target...
- Patent number 9,119,278
- Issue date Aug 25, 2015
- ASML Netherlands B.V.
- Christopher C. Chrobak
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Filter for material supply apparatus of an extreme ultraviolet ligh...
- Patent number 9,029,813
- Issue date May 12, 2015
- ASML Netherlands B.V.
- Igor V. Fomenkov
- B22 - CASTING POWDER METALLURGY
Information Patent Grant
Systems and methods for optics cleaning in an EUV light source
- Patent number 9,000,404
- Issue date Apr 7, 2015
- ASML Netherlands, B.V.
- Alexander N. Bykanov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Beam position control for an extreme ultraviolet light source
- Patent number 9,000,405
- Issue date Apr 7, 2015
- ASML Netherlands B.V.
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Energy sensors for light beam alignment
- Patent number 8,993,976
- Issue date Mar 31, 2015
- ASML Netherlands B.V.
- Matthew Graham
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Master oscillator—power amplifier drive laser with pre-pulse for EU...
- Patent number 8,958,143
- Issue date Feb 17, 2015
- ASML Netherlands B.V.
- Kai-Chung Hou
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Target for extreme ultraviolet light source
- Patent number 8,912,514
- Issue date Dec 16, 2014
- ASML Netherlands B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Patents Applicationslast 30 patents

Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20240419083
- Publication date Dec 19, 2024
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20240160109
- Publication date May 16, 2024
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20240085796
- Publication date Mar 14, 2024
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20220291591
- Publication date Sep 15, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS
- Publication number 20220260756
- Publication date Aug 18, 2022
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE
- Publication number 20220192000
- Publication date Jun 16, 2022
- ASML NETHERLANDS B.V.
- Igor Vladimirovich Fomenkov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20220151052
- Publication date May 12, 2022
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...
- Publication number 20210263422
- Publication date Aug 26, 2021
- ASML NETHERLANDS B.V.
- Robert Jay Rafac
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20210141311
- Publication date May 13, 2021
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM
- Publication number 20210109452
- Publication date Apr 15, 2021
- ASML NETHERLANDS B.V.
- Yue Ma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR MONITORING A PLASMA
- Publication number 20200344868
- Publication date Oct 29, 2020
- ASML NETHERLANDS B.V.
- Michael Anthony Purvis
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GUIDING DEVICE AND ASSOCIATED SYSTEM
- Publication number 20200089124
- Publication date Mar 19, 2020
- ASML NETHERLANDS B.V.
- Dzmitry LABETSKI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20190080811
- Publication date Mar 14, 2019
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE
- Publication number 20180330841
- Publication date Nov 15, 2018
- ASML NETHERLANDS B.V.
- Alexander I. Ershov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...
- Publication number 20180184509
- Publication date Jun 28, 2018
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
WAVELENGTH-BASED OPTICAL FILTERING
- Publication number 20180081280
- Publication date Mar 22, 2018
- ASML NETHERLANDS B.V.
- Alexander Anthony Schafgans
- G02 - OPTICS
Information Patent Application
EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...
- Publication number 20180020532
- Publication date Jan 18, 2018
- William N. Partlo
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FACETED EUV OPTICAL ELEMENT
- Publication number 20170097572
- Publication date Apr 6, 2017
- David C. Brandt
- G02 - OPTICS
Information Patent Application
FACETED EUV OPTICAL ELEMENT
- Publication number 20160179012
- Publication date Jun 23, 2016
- ASML NETHERLANDS B.V.
- David C. BRANDT
- G02 - OPTICS
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20160029471
- Publication date Jan 28, 2016
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150257246
- Publication date Sep 10, 2015
- ASML NETHERLANDS B.V.
- Vladimir B. Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
FILTER FOR MATERIAL SUPPLY APPARATUS OF AN EXTREME ULTRAVIOLET LIGH...
- Publication number 20150209701
- Publication date Jul 30, 2015
- ASML NETHERLANDS B.V.
- Igor V. Fomenkov
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20150076374
- Publication date Mar 19, 2015
- ASML NETHERLANDS B.V.
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140299791
- Publication date Oct 9, 2014
- Yezheng Tao
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140264092
- Publication date Sep 18, 2014
- Yezheng Tao
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE
- Publication number 20140264091
- Publication date Sep 18, 2014
- Vladimir B. Fleurov
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Thermal Monitor For An Extreme Ultraviolet Light Source
- Publication number 20140203195
- Publication date Jul 24, 2014
- Cymer, Inc.
- Vladimir Fleurov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
EUV OPTICS
- Publication number 20140176926
- Publication date Jun 26, 2014
- Norbert R. BOWERING
- G02 - OPTICS
Information Patent Application
EUV Light Source With Subsystem(s) For Maintaining LPP Drive Laser...
- Publication number 20140145096
- Publication date May 29, 2014
- CYMER, LLC
- William N. Partlo
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Master Oscillator-Power Amplifier Drive Laser With Pre-Pulse for EU...
- Publication number 20140146387
- Publication date May 29, 2014
- CYMER, LLC
- Kai-Chung Hou
- H01 - BASIC ELECTRIC ELEMENTS

Igor V. Fomenkov

Person

Patents Grantslast 30 patents

System for monitoring a plasma

Laser system for target metrology and alteration in an EUV light so...

Prolonging optical element lifetime in an EUV lithography system

Guiding device and associated system

Prolonging optical element lifetime in an EUV lithography system

System for monitoring a plasma

EUV light source with subsystem(s) for maintaining LPP drive laser...

Guiding device and associated system

Wavelength-based optical filtering

Faceted EUV optical element

Method of controlling debris in an EUV light source

Apparatus for and method of controlling debris in an EUV light source

EUV LPP source with dose control and laser stabilization using vari...

Drive laser for EUV light source

Laser produced plasma EUV light source

Material supply apparatus for extreme ultraviolet light source havi...

Faceted EUV optical element

Systems and methods for buffer gas flow stabilization in a laser pr...

Target for extreme ultraviolet light source

EUV light source with subsystem(s) for maintaining LPP drive laser...

Beam position control for an extreme ultraviolet light source

Target for extreme ultraviolet light source

Thermal monitor for an extreme ultraviolet light source

System, method and apparatus for aligning and synchronizing target...

Filter for material supply apparatus of an extreme ultraviolet ligh...

Systems and methods for optics cleaning in an EUV light source

Beam position control for an extreme ultraviolet light source

Energy sensors for light beam alignment

Master oscillator—power amplifier drive laser with pre-pulse for EU...

Target for extreme ultraviolet light source

Patents Applicationslast 30 patents

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

GUIDING DEVICE AND ASSOCIATED SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

OXYGEN-LOSS RESISTANT TOP COATING FOR OPTICAL ELEMENTS

LASER SYSTEM FOR SOURCE MATERIAL CONDITIONING IN AN EUV LIGHT SOURCE

SYSTEM FOR MONITORING A PLASMA

LASER SYSTEM FOR TARGET METROLOGY AND ALTERATION IN AN EUV LIGHT SO...

GUIDING DEVICE AND ASSOCIATED SYSTEM

PROLONGING OPTICAL ELEMENT LIFETIME IN AN EUV LITHOGRAPHY SYSTEM

SYSTEM FOR MONITORING A PLASMA

GUIDING DEVICE AND ASSOCIATED SYSTEM

METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

APPARATUS FOR AND METHOD OF CONTROLLING DEBRIS IN AN EUV LIGHT SOURCE

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...

WAVELENGTH-BASED OPTICAL FILTERING

EUV LIGHT SOURCE WITH SUBSYSTEM(S) FOR MAINTAINING LPP DRIVE LASER...

FACETED EUV OPTICAL ELEMENT

FACETED EUV OPTICAL ELEMENT

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

FILTER FOR MATERIAL SUPPLY APPARATUS OF AN EXTREME ULTRAVIOLET LIGH...

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

TARGET FOR EXTREME ULTRAVIOLET LIGHT SOURCE

EXTREME ULTRAVIOLET LIGHT SOURCE

BEAM POSITION CONTROL FOR AN EXTREME ULTRAVIOLET LIGHT SOURCE

Thermal Monitor For An Extreme Ultraviolet Light Source

EUV OPTICS

EUV Light Source With Subsystem(s) For Maintaining LPP Drive Laser...

Master Oscillator-Power Amplifier Drive Laser With Pre-Pulse for EU...