Ikuo Sawada

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Austin, TX, US

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Patents Applicationslast 30 patents

Information Patent Application
CAPACITIVELY COUPLED PLASMA EQUIPMENT WITH UNIFORM PLASMA DENSITY
- Publication number 20140138030
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CAPACITIVELY COUPLED PLASMA EQUIPMENT WITH UNIFORM PLASMA DENSITY
- Publication number 20140141619
- Publication date May 22, 2014
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RADICAL PASSING DEVICE AND SUBSTRATE PROCESSING APPARATUS
- Publication number 20130081761
- Publication date Apr 4, 2013
- TOKYO ELECTRON LIMITED
- Ikuo Sawada
- H01 - BASIC ELECTRIC ELEMENTS