Inkyun SHIN

Person

Yongin-si, KR

People

Patents Grantslast 30 patents

Information Patent Grant
Blank mask and photomask using the same
- Patent number 12,276,905
- Issue date Apr 15, 2025
- SK enpulse Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Electron beam lithography method and apparatus
- Patent number 10,007,185
- Issue date Jun 26, 2018
- Samsung Electronics Co., Ltd.
- Sook Hyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of forming photomask
- Patent number 9,766,540
- Issue date Sep 19, 2017
- Samsung Electronics Co., Ltd.
- Jong Keun Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Exposure method using electron beam and substrate manufacturing met...
- Patent number 9,709,893
- Issue date Jul 18, 2017
- Samsung Electronics Co., Ltd.
- Sook Hyun Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of reducing registration errors of photomasks and photomask...
- Patent number 9,323,142
- Issue date Apr 26, 2016
- Samsung Electronics Co., Ltd.
- Jin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask and method of forming the same
- Patent number 9,223,199
- Issue date Dec 29, 2015
- Samsung Electronics Co., Ltd.
- Jong Keun Oh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240345468
- Publication date Oct 17, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20240192584
- Publication date Jun 13, 2024
- SK enpulse Co., Ltd.
- Hyung-joo LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230418150
- Publication date Dec 28, 2023
- SK enpulse Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME
- Publication number 20230408903
- Publication date Dec 21, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230367200
- Publication date Nov 16, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK FOR EXTREME ULTRAVIOLET
- Publication number 20230305382
- Publication date Sep 28, 2023
- SK enpulse Co., Ltd.
- Seong Yoon KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230213849
- Publication date Jul 6, 2023
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF PREPARING LAMINATE AND LAMINATE FOR OPTICAL USE
- Publication number 20230193043
- Publication date Jun 22, 2023
- SKC solmics Co., Ltd.
- Taewan KIM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...
- Publication number 20230185185
- Publication date Jun 15, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME
- Publication number 20230168574
- Publication date Jun 1, 2023
- SKC solmics Co., Ltd.
- Taewan KIM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230135037
- Publication date May 4, 2023
- SKC solmics Co., Ltd.
- Min Gyo Jeong
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK
- Publication number 20230135120
- Publication date May 4, 2023
- SKC solmics Co., Ltd.
- Sung Hoon SON
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230110529
- Publication date Apr 13, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230083755
- Publication date Mar 16, 2023
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MA...
- Publication number 20230064333
- Publication date Mar 2, 2023
- SKC solmics Co., Ltd.
- Taewan KIM
- B08 - CLEANING
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20230030141
- Publication date Feb 2, 2023
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20220397819
- Publication date Dec 15, 2022
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20220382141
- Publication date Dec 1, 2022
- SKC solmics Co., Ltd.
- GeonGon LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20220357647
- Publication date Nov 10, 2022
- SKC solmics Co., Ltd.
- GeonGon Lee
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK BLANK AND PHOTOMASK USING THE SAME
- Publication number 20220350237
- Publication date Nov 3, 2022
- SKC solmics Co., Ltd.
- Min Gyo JEONG
- G01 - MEASURING TESTING
Information Patent Application
PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF SEMICONDUCT...
- Publication number 20220350238
- Publication date Nov 3, 2022
- SKC solmics Co., Ltd.
- GeonGon LEE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20220214609
- Publication date Jul 7, 2022
- SKC solmics Co., Ltd.
- Hyung-joo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
BLANK MASK AND PHOTOMASK USING THE SAME
- Publication number 20220206380
- Publication date Jun 30, 2022
- SKC solmics Co., Ltd.
- Hyung-joo LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...
- Publication number 20180012730
- Publication date Jan 11, 2018
- Samsung Electronics Co., Ltd.
- SUKJONG BAE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS
- Publication number 20170192358
- Publication date Jul 6, 2017
- Samsung Electronics Co., Ltd.
- Sook Hyun LEE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EXPOSURE METHOD USING ELECTRON BEAM AND SUBSTRATE MANUFACTURING MET...
- Publication number 20160223903
- Publication date Aug 4, 2016
- Samsung Electronics Co., Ltd.
- SOOK HYUN LEE
- G02 - OPTICS
Information Patent Application
METHOD OF FORMING PHOTOMASK
- Publication number 20160124301
- Publication date May 5, 2016
- Jong Keun OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of Reducing Registration Errors of Photomasks and Photomask...
- Publication number 20150050584
- Publication date Feb 19, 2015
- Samsung Electronics Co., Ltd.
- Jin Choi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK AND METHOD OF FORMING THE SAME
- Publication number 20140113221
- Publication date Apr 24, 2014
- Jong Keun OH
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Nozzle, Substrate Processing Apparatus Including The Nozzle, And Pr...
- Publication number 20110253043
- Publication date Oct 20, 2011
- Samsung Electronics Co., Ltd.
- Seongyoon KIM
- H01 - BASIC ELECTRIC ELEMENTS

Inkyun SHIN

Person

Patents Grantslast 30 patents

Blank mask and photomask using the same

Electron beam lithography method and apparatus

Method of forming photomask

Exposure method using electron beam and substrate manufacturing met...

Methods of reducing registration errors of photomasks and photomask...

Photomask and method of forming the same

Patents Applicationslast 30 patents

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

SHADOW MASK AND METHOD OF MANUFACTURING BLANK MASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

PHOTOMASK FOR EXTREME ULTRAVIOLET

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD OF PREPARING LAMINATE AND LAMINATE FOR OPTICAL USE

METHOD AND APPARATUS FOR FORMING A BLANK MASK AND A LAYER FOR A BLA...

LAMINATE FOR BLANK MASK AND MANUFACTURING METHOD FOR THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD AND APPARATUS FOR MANUFACTURING A PHOTOMASK FROM A BLANK MASK

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

METHOD OF CLEANING SUBSTRATE FOR BLANK MASK, SUBSTRATE FOR BLANK MA...

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

PHOTOMASK BLANK AND PHOTOMASK USING THE SAME

PHOTOMASK BLANK, PHOTOMASK, AND MANUFACTURING METHOD OF SEMICONDUCT...

BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

CHARGED-PARTICLE BEAM EXPOSURE METHOD AND CHARGED-PARTICLE BEAM COR...

ELECTRON BEAM LITHOGRAPHY METHOD AND APPARATUS

EXPOSURE METHOD USING ELECTRON BEAM AND SUBSTRATE MANUFACTURING MET...

METHOD OF FORMING PHOTOMASK

Methods of Reducing Registration Errors of Photomasks and Photomask...

PHOTOMASK AND METHOD OF FORMING THE SAME

Nozzle, Substrate Processing Apparatus Including The Nozzle, And Pr...