Ioana Graur

Person

Poughkeepsie, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Creating knowledge base for optical proximity correction to reduce...
- Patent number 10,386,714
- Issue date Aug 20, 2019
- GLOBALFOUNDRIES Inc.
- Kriteshwar K. Kohli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process-metrology reproducibility bands for lithographic photomasks
- Patent number 10,210,292
- Issue date Feb 19, 2019
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Expansion of allowed design rule space by waiving benign geometries
- Patent number 10,042,973
- Issue date Aug 7, 2018
- GLOBALFOUNDRIES Inc.
- Ioana C. Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Process-metrology reproducibility bands for lithographic photomasks
- Patent number 9,928,316
- Issue date Mar 27, 2018
- International Business Machines Corporation
- Todd C. Bailey
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Test patterns for determining sizing and spacing of sub-resolution...
- Patent number 9,904,757
- Issue date Feb 27, 2018
- GLOBALFOUNDRIES Inc.
- Amr Y. Abdo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generative learning for realistic and ground rule clean hot spot sy...
- Patent number 9,690,898
- Issue date Jun 27, 2017
- GLOBALFOUNDRIES Inc.
- Ioana C. Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask error correction
- Patent number 9,330,225
- Issue date May 3, 2016
- International Business Machines Corporation
- Aditya Chaudhary
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Pattern improvement in multiprocess patterning
- Patent number 9,087,739
- Issue date Jul 21, 2015
- International Business Machines Corporation
- Derren N. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern improvement in multiprocess patterning
- Patent number 9,034,562
- Issue date May 19, 2015
- International Business Machines Corporation
- Derren Neylon Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Decomposition with multiple exposures in a process window based OPC...
- Patent number 8,392,871
- Issue date Mar 5, 2013
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Calibration of lithographic process models
- Patent number 8,174,681
- Issue date May 8, 2012
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photomask design verification
- Patent number 8,166,423
- Issue date Apr 24, 2012
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Short path customized mask correction
- Patent number 8,108,804
- Issue date Jan 31, 2012
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Efficient isotropic modeling approach to incorporate electromagneti...
- Patent number 8,078,995
- Issue date Dec 13, 2011
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for obtaining bounds on process parameters for OP...
- Patent number 8,059,884
- Issue date Nov 15, 2011
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methodology for image fidelity verification
- Patent number 7,860,701
- Issue date Dec 28, 2010
- International Business Machines Corporation
- Ioana Graur
- Y02 - TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMA...
Information Patent Grant
System for coloring a partially colored design in an alternating ph...
- Patent number 7,687,207
- Issue date Mar 30, 2010
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Local coloring for hierarchical OPC
- Patent number 7,650,587
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Closed-loop design for manufacturability process
- Patent number 7,624,369
- Issue date Nov 24, 2009
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Designer's intent tolerance bands for proximity correction and chec...
- Patent number 7,607,114
- Issue date Oct 20, 2009
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating mask patterns for alternating phase-shift mask lithography
- Patent number 7,475,380
- Issue date Jan 6, 2009
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
System for coloring a partially colored design in an alternating ph...
- Patent number 7,378,195
- Issue date May 27, 2008
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methodology for image fidelity verification
- Patent number 7,305,334
- Issue date Dec 4, 2007
- International Business Machines Corporation
- Ioana Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Designer's intent tolerance bands for proximity correction and chec...
- Patent number 7,266,798
- Issue date Sep 4, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of conflict avoidance in fabrication of gate-shrink alternat...
- Patent number 7,175,942
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pliant SRAF for improved performance and manufacturability
- Patent number 7,115,343
- Issue date Oct 3, 2006
- International Business Machines Corporation
- Ronald L. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for verification of resolution enhancement techniques and op...
- Patent number 6,996,797
- Issue date Feb 7, 2006
- International Business Machines Corporation
- Lars W. Liebmann
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Generating mask patterns for alternating phase-shift mask lithography
- Patent number 6,993,741
- Issue date Jan 31, 2006
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating phase shift mask design with optimized phase shapes
- Patent number 6,927,005
- Issue date Aug 9, 2005
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Phase-width balanced alternating phase shift mask design
- Patent number 6,901,576
- Issue date May 31, 2005
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CREATING KNOWLEDGE BASE FOR OPTICAL PROXIMITY CORRECTION TO REDUCE...
- Publication number 20180196340
- Publication date Jul 12, 2018
- GLOBALFOUNDRIES INC.
- Kriteshwar K. Kohli
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
- Publication number 20180101630
- Publication date Apr 12, 2018
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
EXPANSION OF ALLOWED DESIGN RULE SPACE BY WAIVING BENIGN GEOMETRIES
- Publication number 20180096093
- Publication date Apr 5, 2018
- GLOBALFOUNDRIES INC.
- Ioana C. Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TEST PATTERNS FOR DETERMINING SIZING AND SPACING OF SUB-RESOLUTION...
- Publication number 20170193150
- Publication date Jul 6, 2017
- GLOBALFOUNDRIES INC.
- Amr Y. Abdo
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
GENERATIVE LEARNING FOR REALISTIC AND GROUND RULE CLEAN HOT SPOT SY...
- Publication number 20160378902
- Publication date Dec 29, 2016
- GLOBALFOUNDRIES INC.
- Ioana C. Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS
- Publication number 20160283617
- Publication date Sep 29, 2016
- International Business Machines Corporation
- Todd C. Bailey
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
PHOTOMASK ERROR CORRECTION
- Publication number 20150356228
- Publication date Dec 10, 2015
- International Business Machines Corporation
- Aditya Chaudhary
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Pattern Improvement in Multiprocess Patterning
- Publication number 20140162380
- Publication date Jun 12, 2014
- International Business Machines Corporation
- Derren Neylon Dunn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DECOMPOSITION WITH MULTIPLE EXPOSURES IN A PROCESS WINDOW BASED OPC...
- Publication number 20110271238
- Publication date Nov 3, 2011
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Pattern Improvement in Multiprocess Patterning
- Publication number 20110091815
- Publication date Apr 21, 2011
- International Business Machines Corporation
- Derren N. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOMASK DESIGN VERIFICATION
- Publication number 20110061030
- Publication date Mar 10, 2011
- International Business Machines Corporation
- Scott M. Mansfield
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SHORT PATH CUSTOMIZED MASK CORRECTION
- Publication number 20100185999
- Publication date Jul 22, 2010
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EFFICIENT ISOTROPIC MODELING APPROACH TO INCORPORATE ELECTROMAGNETI...
- Publication number 20100175042
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Jaione Tirapu Azpiroz
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CALIBRATION OF LITHOGRAPHIC PROCESS MODELS
- Publication number 20100171031
- Publication date Jul 8, 2010
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and System for Obtaining Bounds on Process Parameters for OP...
- Publication number 20090123057
- Publication date May 14, 2009
- International Business Machines Corporation
- Maharaj Mukherjee
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ALTERNATING PHASE SHIFT MASK OPTIMIZATION FOR IMPROVED PROCESS WINDOW
- Publication number 20090037866
- Publication date Feb 5, 2009
- International Business Machines Corporation
- Ioana C. Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
System for Coloring a Partially Colored Design in an Alternating Ph...
- Publication number 20080244503
- Publication date Oct 2, 2008
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOCAL COLORING FOR HIERARCHICAL OPC
- Publication number 20080134130
- Publication date Jun 5, 2008
- International Business Machines Corporation
- Zachary Baum
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLOSED-LOOP DESIGN FOR MANUFACTURABILITY PROCESS
- Publication number 20080127029
- Publication date May 29, 2008
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODOLOGY FOR IMAGE FIDELITY VERIFICATION
- Publication number 20080071512
- Publication date Mar 20, 2008
- International Business Machines Corporation
- Ioana Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...
- Publication number 20070261013
- Publication date Nov 8, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...
- Publication number 20070083847
- Publication date Apr 12, 2007
- International Business Machines Corporation
- Scott M. Mansfield
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHODOLOGY FOR IMAGE FIDELITY VERIFICATION
- Publication number 20060282246
- Publication date Dec 14, 2006
- International Business Machines Corporation
- Ioana Graur
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Generating mask patterns for alternating phase-shift mask lithography
- Publication number 20060107248
- Publication date May 18, 2006
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM FOR COLORING A PARTIALLY COLORED DESIGN IN AN ALTERNATING PH...
- Publication number 20050287444
- Publication date Dec 29, 2005
- International Business Machines Corporation
- Ioana Graur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PLIANT SRAF FOR IMPROVED PERFORMANCE AND MANUFACTURABILITY
- Publication number 20050202321
- Publication date Sep 15, 2005
- International Business Machines Corporation
- Ronald L. Gordon
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF CONFLICT AVOIDANCE IN FABRICATION OF GATE-SHRINK ALTERNAT...
- Publication number 20050175906
- Publication date Aug 11, 2005
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GENERATING MASK PATTERNS FOR ALTERNATING PHASE-SHIFT MASK LITHOGRAPHY
- Publication number 20050014074
- Publication date Jan 20, 2005
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alternating phase shift mask design with optimized phase shapes
- Publication number 20040175635
- Publication date Sep 9, 2004
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Phase-width balanced alternating phase shift mask design
- Publication number 20040096752
- Publication date May 20, 2004
- International Business Machines Corporation
- Lars W. Liebmann
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Ioana Graur

Person

Patents Grantslast 30 patents

Creating knowledge base for optical proximity correction to reduce...

Process-metrology reproducibility bands for lithographic photomasks

Expansion of allowed design rule space by waiving benign geometries

Process-metrology reproducibility bands for lithographic photomasks

Test patterns for determining sizing and spacing of sub-resolution...

Generative learning for realistic and ground rule clean hot spot sy...

Photomask error correction

Pattern improvement in multiprocess patterning

Pattern improvement in multiprocess patterning

Decomposition with multiple exposures in a process window based OPC...

Calibration of lithographic process models

Photomask design verification

Short path customized mask correction

Efficient isotropic modeling approach to incorporate electromagneti...

Method and system for obtaining bounds on process parameters for OP...

Methodology for image fidelity verification

System for coloring a partially colored design in an alternating ph...

Local coloring for hierarchical OPC

Closed-loop design for manufacturability process

Designer's intent tolerance bands for proximity correction and chec...

Generating mask patterns for alternating phase-shift mask lithography

System for coloring a partially colored design in an alternating ph...

Methodology for image fidelity verification

Designer's intent tolerance bands for proximity correction and chec...

Method of conflict avoidance in fabrication of gate-shrink alternat...

Pliant SRAF for improved performance and manufacturability

Method for verification of resolution enhancement techniques and op...

Generating mask patterns for alternating phase-shift mask lithography

Alternating phase shift mask design with optimized phase shapes

Phase-width balanced alternating phase shift mask design

Patents Applicationslast 30 patents

CREATING KNOWLEDGE BASE FOR OPTICAL PROXIMITY CORRECTION TO REDUCE...

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

EXPANSION OF ALLOWED DESIGN RULE SPACE BY WAIVING BENIGN GEOMETRIES

TEST PATTERNS FOR DETERMINING SIZING AND SPACING OF SUB-RESOLUTION...

GENERATIVE LEARNING FOR REALISTIC AND GROUND RULE CLEAN HOT SPOT SY...

PROCESS-METROLOGY REPRODUCIBILITY BANDS FOR LITHOGRAPHIC PHOTOMASKS

PHOTOMASK ERROR CORRECTION

Pattern Improvement in Multiprocess Patterning

DECOMPOSITION WITH MULTIPLE EXPOSURES IN A PROCESS WINDOW BASED OPC...

Pattern Improvement in Multiprocess Patterning

PHOTOMASK DESIGN VERIFICATION

SHORT PATH CUSTOMIZED MASK CORRECTION

EFFICIENT ISOTROPIC MODELING APPROACH TO INCORPORATE ELECTROMAGNETI...

CALIBRATION OF LITHOGRAPHIC PROCESS MODELS

Method and System for Obtaining Bounds on Process Parameters for OP...

ALTERNATING PHASE SHIFT MASK OPTIMIZATION FOR IMPROVED PROCESS WINDOW

System for Coloring a Partially Colored Design in an Alternating Ph...

LOCAL COLORING FOR HIERARCHICAL OPC

CLOSED-LOOP DESIGN FOR MANUFACTURABILITY PROCESS

METHODOLOGY FOR IMAGE FIDELITY VERIFICATION

DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...

DESIGNER'S INTENT TOLERANCE BANDS FOR PROXIMITY CORRECTION AND CHEC...

METHODOLOGY FOR IMAGE FIDELITY VERIFICATION

Generating mask patterns for alternating phase-shift mask lithography

SYSTEM FOR COLORING A PARTIALLY COLORED DESIGN IN AN ALTERNATING PH...

PLIANT SRAF FOR IMPROVED PERFORMANCE AND MANUFACTURABILITY

METHOD OF CONFLICT AVOIDANCE IN FABRICATION OF GATE-SHRINK ALTERNAT...

GENERATING MASK PATTERNS FOR ALTERNATING PHASE-SHIFT MASK LITHOGRAPHY

Alternating phase shift mask design with optimized phase shapes

Phase-width balanced alternating phase shift mask design