Irvinder Kaur

Person

Northborough, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 11,940,731
- Issue date Mar 26, 2024
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymers useful as surface leveling agents
- Patent number 11,859,082
- Issue date Jan 2, 2024
- Rohm and Haas Electronic Materials LLC
- Mingqi Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,796,916
- Issue date Oct 24, 2023
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Photoresist pattern trimming compositions and pattern formation met...
- Patent number 11,754,927
- Issue date Sep 12, 2023
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist pattern trimming compositions and pattern formation met...
- Patent number 11,506,981
- Issue date Nov 22, 2022
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pattern formation methods and photoresist pattern overcoat composit...
- Patent number 11,003,074
- Issue date May 11, 2021
- Rohm and Haas Electronic Materials LLC
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Pattern-formation methods
- Patent number 10,684,549
- Issue date Jun 16, 2020
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,578,969
- Issue date Mar 3, 2020
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,481,495
- Issue date Nov 19, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,241,407
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Topcoat compositions containing fluorinated thermal acid generators
- Patent number 10,241,411
- Issue date Mar 26, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Acid generator compounds and photoresists comprising same
- Patent number 10,221,131
- Issue date Mar 5, 2019
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist topcoat compositions and methods of processing photores...
- Patent number 10,197,918
- Issue date Feb 5, 2019
- Rohm and Haas Electronic Materials LLC
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Topcoat compositions and pattern-forming methods
- Patent number 10,042,259
- Issue date Aug 7, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Thermal acid generators and photoresist pattern trimming compositio...
- Patent number 10,007,179
- Issue date Jun 26, 2018
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern trimming methods
- Patent number 9,869,933
- Issue date Jan 16, 2018
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern trimming compositions and methods
- Patent number 9,760,011
- Issue date Sep 12, 2017
- Rohm and Haas Electronic Materials LLC
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoresist pattern trimming compositions and methods
- Patent number 9,696,629
- Issue date Jul 4, 2017
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Ionic thermal acid generators for low temperature applications
- Patent number 9,541,834
- Issue date Jan 10, 2017
- Rohm and Haas Electronic Materials LLC
- Gerhard Pohlers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators and photoresists comprising same
- Patent number 9,256,125
- Issue date Feb 9, 2016
- Rohm and Haas Electronic Materials, LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Dendritic compounds, photoresist compositions and methods of making...
- Patent number 9,128,372
- Issue date Sep 8, 2015
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator, photoresist, coated substrate, and method of f...
- Patent number 9,110,369
- Issue date Aug 18, 2015
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photoacid generator, photoresist, coated substrate, and method of f...
- Patent number 9,067,909
- Issue date Jun 30, 2015
- Rohm and Haas Electronic Materials LLC
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoacid generator, photoresist, coated substrate, and method of f...
- Patent number 9,046,767
- Issue date Jun 2, 2015
- Rohm and Haas Electronic Materials LLC
- Emad Aqad
- C07 - ORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
POLYMERS USEFUL AS SURFACE LEVELING AGENTS
- Publication number 20240093027
- Publication date Mar 21, 2024
- Rohm and Haas Electronic Materials L.L.C.
- Mingqi Li
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230251575
- Publication date Aug 10, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230161257
- Publication date May 25, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230152697
- Publication date May 18, 2023
- Rohm and Haas Electronic Materials L.L.C.
- KE YANG
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS
- Publication number 20230104679
- Publication date Apr 6, 2023
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLYMERS USEFUL AS SURFACE LEVELING AGENTS
- Publication number 20220204760
- Publication date Jun 30, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Mingqi Li
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING P...
- Publication number 20220128906
- Publication date Apr 28, 2022
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20210232047
- Publication date Jul 29, 2021
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...
- Publication number 20200379353
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder KAUR
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...
- Publication number 20200379351
- Publication date Dec 3, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20200004152
- Publication date Jan 2, 2020
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder KAUR
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20190243246
- Publication date Aug 8, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190235385
- Publication date Aug 1, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190203065
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20190204741
- Publication date Jul 4, 2019
- Rohm and Haas Electronic Materials L.L.C.
- Joshua A. Kaitz
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...
- Publication number 20180314155
- Publication date Nov 1, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Xisen Hou
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERN-FORMATION METHODS
- Publication number 20180188654
- Publication date Jul 5, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS
- Publication number 20180118970
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS
- Publication number 20180118968
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20180120703
- Publication date May 3, 2018
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
PATTERN TRIMMING COMPOSITIONS AND METHODS
- Publication number 20170255102
- Publication date Sep 7, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN TRIMMING METHODS
- Publication number 20170255103
- Publication date Sep 7, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Kevin Rowell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123313
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...
- Publication number 20170123314
- Publication date May 4, 2017
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME
- Publication number 20160347709
- Publication date Dec 1, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...
- Publication number 20160333212
- Publication date Nov 17, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Cong Liu
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS
- Publication number 20160187783
- Publication date Jun 30, 2016
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS
- Publication number 20150212414
- Publication date Jul 30, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Gerhard POHLERS
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF F...
- Publication number 20150118618
- Publication date Apr 30, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Emad Aqad
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF F...
- Publication number 20150064620
- Publication date Mar 5, 2015
- Rohm and Haas Electronic Materials L.L.C.
- Irvinder Kaur
- C07 - ORGANIC CHEMISTRY

Irvinder Kaur

Person

Patents Grantslast 30 patents

Photoresist topcoat compositions and methods of processing photores...

Polymers useful as surface leveling agents

Pattern formation methods and photoresist pattern overcoat composit...

Photoresist pattern trimming compositions and pattern formation met...

Photoresist pattern trimming compositions and pattern formation met...

Pattern formation methods and photoresist pattern overcoat composit...

Pattern-formation methods

Photoresist topcoat compositions and methods of processing photores...

Topcoat compositions containing fluorinated thermal acid generators

Thermal acid generators and photoresist pattern trimming compositio...

Topcoat compositions containing fluorinated thermal acid generators

Acid generator compounds and photoresists comprising same

Photoresist topcoat compositions and methods of processing photores...

Topcoat compositions and pattern-forming methods

Thermal acid generators and photoresist pattern trimming compositio...

Pattern trimming methods

Pattern trimming compositions and methods

Photoresist pattern trimming compositions and methods

Ionic thermal acid generators for low temperature applications

Acid generators and photoresists comprising same

Dendritic compounds, photoresist compositions and methods of making...

Photoacid generator, photoresist, coated substrate, and method of f...

Photoacid generator, photoresist, coated substrate, and method of f...

Photoacid generator, photoresist, coated substrate, and method of f...

Patents Applicationslast 30 patents

POLYMERS USEFUL AS SURFACE LEVELING AGENTS

PHOTORESIST TOPCOAT COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS

POLYMERS USEFUL AS SURFACE LEVELING AGENTS

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS OF TRIMMING P...

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND PATTERN FORMATION MET...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PATTERN FORMATION METHODS AND PHOTORESIST PATTERN OVERCOAT COMPOSIT...

PATTERN-FORMATION METHODS

TOPCOAT COMPOSITIONS AND PATTERN-FORMING METHODS

TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PATTERN TRIMMING COMPOSITIONS AND METHODS

PATTERN TRIMMING METHODS

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIO...

ACID GENERATOR COMPOUNDS AND PHOTORESISTS COMPRISING SAME

PHOTORESIST TOPCOAT COMPOSITIONS AND METHODS OF PROCESSING PHOTORES...

PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS

IONIC THERMAL ACID GENERATORS FOR LOW TEMPERATURE APPLICATIONS

PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF F...

PHOTOACID GENERATOR, PHOTORESIST, COATED SUBSTRATE, AND METHOD OF F...