Irwan Dani SETIJA

Person

Utrecht, NL

People

Patents Grantslast 30 patents

Information Patent Grant
Alignment measurement system
- Patent number 11,042,096
- Issue date Jun 22, 2021
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for calculating electromagnetic scattering pro...
- Patent number 10,948,409
- Issue date Mar 16, 2021
- ASML Netherlands B.V.
- Irwan Dani Setija
- G01 - MEASURING TESTING
Information Patent Grant
Alignment measurement system
- Patent number 10,942,461
- Issue date Mar 9, 2021
- ASML Netherlands B.V.
- Simon Reinald Huisman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a structure on a substrate
- Patent number 10,788,765
- Issue date Sep 29, 2020
- ASML Netherlands B.V.
- Stefan Michiel Witte
- G01 - MEASURING TESTING
Information Patent Grant
Method and apparatus for calculating electromagnetic scattering pro...
- Patent number 10,408,753
- Issue date Sep 10, 2019
- ASML Netherlands B.V.
- Maxim Pisarenco
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and apparatus for calculating electromagnetic scattering pr...
- Patent number 9,939,250
- Issue date Apr 10, 2018
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a structure on a substrate, mode...
- Patent number 9,772,562
- Issue date Sep 26, 2017
- ASML Netherlands B.V.
- Martijn Peter Mink
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reference library generation method for methods of inspection, insp...
- Patent number 8,875,078
- Issue date Oct 28, 2014
- ASML Netherlands B.V.
- Maxim Pisarenco
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 8,724,109
- Issue date May 13, 2014
- ASML Netherlands B.V.
- Irwan Dani Setija
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for calculating electromagnetic scattering pr...
- Patent number 8,706,455
- Issue date Apr 22, 2014
- ASML Netherlands B.V.
- Martijn Constant Van Beurden
- G01 - MEASURING TESTING
Information Patent Grant
Methods and apparatus for determining electromagnetic scattering pr...
- Patent number 8,645,109
- Issue date Feb 4, 2014
- ASML Netherlands B.V.
- Remco Dirks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Scatterometry method and measurement system for lithography
- Patent number 8,520,212
- Issue date Aug 27, 2013
- ASML Netherlands B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Grant
Inspection method and apparatus, lithographic apparatus, lithograph...
- Patent number 8,189,195
- Issue date May 29, 2012
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for angular-resolved spectroscopic lithography...
- Patent number 7,643,666
- Issue date Jan 5, 2010
- ASML Netherlands B.V.
- Irwan Dani Setija
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Lithographic apparatus, alignment system, and device manufacturing...
- Patent number 7,440,079
- Issue date Oct 21, 2008
- ASML Netherlands B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with alignment subsystem, device manufacturi...
- Patent number 7,002,667
- Issue date Feb 21, 2006
- ASML, Netherlands B.V.
- Leon Martin Levasier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus with alignment subsystem, device manufacturi...
- Patent number 6,995,831
- Issue date Feb 7, 2006
- ASML Netherlands B.V.
- Leon Martin Levasier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus, a method for determining a posit...
- Patent number 6,987,556
- Issue date Jan 17, 2006
- ASML Netherlands B.V.
- Maurits van der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic projection apparatus, a method for determining a posit...
- Patent number 6,704,089
- Issue date Mar 9, 2004
- ASML Netherlands B.V.
- Maurits van der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240241454
- Publication date Jul 18, 2024
- ASML NETHERLANDS B.V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND APPARATUS
- Publication number 20240184222
- Publication date Jun 6, 2024
- ASML NETHERLANDS B.V.
- Guido DE HAAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM
- Publication number 20240094643
- Publication date Mar 21, 2024
- ASML NETHERLANDS B.V.
- Filippo ALPEGGIANI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...
- Publication number 20220342228
- Publication date Oct 27, 2022
- ASML NETHERLANDS B.V.
- Irwan Dani SETIJA
- G02 - OPTICS
Information Patent Application
Alignment Measurement System
- Publication number 20200241433
- Publication date Jul 30, 2020
- ASML Netherlands B,V.
- Simon Reinald HUISMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Measurement System
- Publication number 20200142319
- Publication date May 7, 2020
- ASML Netherlands B.V.
- Stefan Michiel WITTE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR MEASURING A STRUCTURE ON A SUBSTRATE
- Publication number 20190354026
- Publication date Nov 21, 2019
- ASML NETHERLANDS B.V.
- Stefan Michiel WITTE
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Calculating Electromagnetic Scattering Pro...
- Publication number 20180011014
- Publication date Jan 11, 2018
- ASML NETHERLANDS B.V.
- Irwan Dani SETIJA
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Measuring a Structure on a Substrate, Mode...
- Publication number 20160313653
- Publication date Oct 27, 2016
- ASML NETHERLANDS B.V.
- Martijn Peter Mink
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Calculating Electromagnetic Scattering Pr...
- Publication number 20160273906
- Publication date Sep 22, 2016
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Calculating Electromagnetic Scattering Pro...
- Publication number 20130144560
- Publication date Jun 6, 2013
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G01 - MEASURING TESTING
Information Patent Application
Reference Library Generation Method for Methods of Inspection, Insp...
- Publication number 20130035911
- Publication date Feb 7, 2013
- ASML NETHERLANDS B.V.
- Maxim PISARENCO
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Scatterometry Method and Measurement System for Lithography
- Publication number 20110304851
- Publication date Dec 15, 2011
- ASML NETHERLANDS B.V.
- Willem Marie Julia Marcel Coene
- G01 - MEASURING TESTING
Information Patent Application
Methods and Apparatus for Determining Electromagnetic Scattering Pr...
- Publication number 20110137625
- Publication date Jun 9, 2011
- ASML NETHERLANDS B.V.
- Remco Dirks
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods and Apparatus for Calculating Electromagnetic Scattering Pr...
- Publication number 20110098992
- Publication date Apr 28, 2011
- ASML NETHERLANDS B.V.
- Martijn Constant VAN BEURDEN
- G01 - MEASURING TESTING
Information Patent Application
Method and Apparatus for Angular-Resolved Spectroscopic Lithography...
- Publication number 20110073775
- Publication date Mar 31, 2011
- ASML NETHERLANDS B.V.
- Irwan Danni Setija
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Inspection method and apparatus, lithographic apparatus, lithograph...
- Publication number 20080279442
- Publication date Nov 13, 2008
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method and apparatus for angular-resolved spectroscopic lithography...
- Publication number 20080069430
- Publication date Mar 20, 2008
- ASML NETHERLANDS B.V.
- Irwan Dani Setija
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Lithographic apparatus, alignment system, and device manufacturing...
- Publication number 20060215161
- Publication date Sep 28, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus, alignment system, and device manufacturing...
- Publication number 20060061743
- Publication date Mar 23, 2006
- ASML NETHERLANDS B.V.
- Arie Jeffrey Den Boef
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus with alignment subsystem, device manufacturi...
- Publication number 20050146699
- Publication date Jul 7, 2005
- ASML NETHERLANDS B.V.
- Leon Martin Levasier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic apparatus with alignment subsystem, device manufacturi...
- Publication number 20040179184
- Publication date Sep 16, 2004
- ASML NETHERLANDS B.V.
- Leon Martin Levasier
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic projection apparatus, a method for determining a posit...
- Publication number 20020006560
- Publication date Jan 17, 2002
- Maurits van der Schaar
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Irwan Dani SETIJA

Person

Patents Grantslast 30 patents

Alignment measurement system

Method and apparatus for calculating electromagnetic scattering pro...

Alignment measurement system

Method and apparatus for measuring a structure on a substrate

Method and apparatus for calculating electromagnetic scattering pro...

Methods and apparatus for calculating electromagnetic scattering pr...

Method and apparatus for measuring a structure on a substrate, mode...

Reference library generation method for methods of inspection, insp...

Method and apparatus for angular-resolved spectroscopic lithography...

Methods and apparatus for calculating electromagnetic scattering pr...

Methods and apparatus for determining electromagnetic scattering pr...

Scatterometry method and measurement system for lithography

Inspection method and apparatus, lithographic apparatus, lithograph...

Method and apparatus for angular-resolved spectroscopic lithography...

Lithographic apparatus, alignment system, and device manufacturing...

Lithographic apparatus with alignment subsystem, device manufacturi...

Lithographic apparatus with alignment subsystem, device manufacturi...

Lithographic projection apparatus, a method for determining a posit...

Lithographic projection apparatus, a method for determining a posit...

Patents Applicationslast 30 patents

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

METROLOGY METHOD AND APPARATUS

METROLOGY METHOD AND SYSTEM AND LITHOGRAPHIC SYSTEM

METROLOGY SYSTEMS, COHERENCE SCRAMBLER ILLUMINATION SOURCES AND MET...

Alignment Measurement System

Alignment Measurement System

METHOD AND APPARATUS FOR MEASURING A STRUCTURE ON A SUBSTRATE

Method and Apparatus for Calculating Electromagnetic Scattering Pro...

Method and Apparatus for Measuring a Structure on a Substrate, Mode...

Methods and Apparatus for Calculating Electromagnetic Scattering Pr...

Method and Apparatus for Calculating Electromagnetic Scattering Pro...

Reference Library Generation Method for Methods of Inspection, Insp...

Scatterometry Method and Measurement System for Lithography

Methods and Apparatus for Determining Electromagnetic Scattering Pr...

Methods and Apparatus for Calculating Electromagnetic Scattering Pr...

Method and Apparatus for Angular-Resolved Spectroscopic Lithography...

Inspection method and apparatus, lithographic apparatus, lithograph...

Method and apparatus for angular-resolved spectroscopic lithography...

Lithographic apparatus, alignment system, and device manufacturing...

Lithographic apparatus, alignment system, and device manufacturing...

Lithographic apparatus with alignment subsystem, device manufacturi...

Lithographic apparatus with alignment subsystem, device manufacturi...

Lithographic projection apparatus, a method for determining a posit...