Isamu Seto

Person

Tokyo, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Charged particle beam exposure apparatus
- Patent number 6,407,397
- Issue date Jun 18, 2002
- Advantest Corporation
- Isamu Seto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle beam lithography apparatus and system capable of r...
- Patent number 6,399,954
- Issue date Jun 4, 2002
- Advantest Corporation
- Isamu Seto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 6,242,751
- Issue date Jun 5, 2001
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,969,365
- Issue date Oct 19, 1999
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of providing changed particle beam exposure in which represe...
- Patent number 5,965,895
- Issue date Oct 12, 1999
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Charged-particle-beam exposure device and charged-particle-beam exp...
- Patent number 5,757,015
- Issue date May 26, 1998
- Fujitsu Limited
- Akio Takemoto
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,721,432
- Issue date Feb 24, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,719,402
- Issue date Feb 17, 1998
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of and system for charged particle beam exposure
- Patent number 5,546,319
- Issue date Aug 13, 1996
- Fujitsu Limited
- Takamasa Satoh
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
Charged-particle-beam exposure device and charged-particle-beam exp...
- Publication number 20010013581
- Publication date Aug 16, 2001
- Akio Takemoto
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Charged particle beam exposure apparatus

Charged-particle beam lithography apparatus and system capable of r...

Charged-particle-beam exposure device and charged-particle-beam exp...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of providing changed particle beam exposure in which represe...

Charged-particle-beam exposure device and charged-particle-beam exp...

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Method of and system for charged particle beam exposure

Patents Applicationslast 30 patents

Charged-particle-beam exposure device and charged-particle-beam exp...