Isamu TAKAGI

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Kawasaki-shi, JP

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Patents Grantslast 30 patents

Information Patent Grant
Method of forming resist pattern and negative tone-development resi...
- Patent number 9,250,531
- Issue date Feb 2, 2016
- Tokyo Ohka Kogyo Co., Ltd.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive resist composition and method of forming resist pattern
- Patent number 8,586,281
- Issue date Nov 19, 2013
- Tokyo Ohka Kogyo Co., Ltd.
- Jun Iwashita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive resin composition and method of forming pattern
- Patent number 8,216,763
- Issue date Jul 10, 2012
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing resist pattern
- Patent number 7,105,265
- Issue date Sep 12, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF FORMING RESIST PATTERN AND NEGATIVE TONE-DEVELOPMENT RESI...
- Publication number 20140004467
- Publication date Jan 2, 2014
- TOKYO OHKA KOGYO CO., LTD.
- Tomoyuki Hirano
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POSITIVE RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN
- Publication number 20110311912
- Publication date Dec 22, 2011
- Tokyo Ohka Kogyo Co., Ltd.
- Jun IWASHITA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PHOTOSENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN
- Publication number 20090220889
- Publication date Sep 3, 2009
- Tokyo Ohka Kogyo Co., Ltd.
- Kazufumi Sato
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition for formation of antireflection film, and antireflectio...
- Publication number 20060292488
- Publication date Dec 28, 2006
- Tokyo Ohka Kogyo Co., Ltd.
- Toshikazu Takayama
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Method and removing resist pattern
- Publication number 20050130055
- Publication date Jun 16, 2005
- Hiroyuki Ohnishi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY