Isao Hashimoto

Person

Ibaraki, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Electron beam irradiation apparatus for sterilizing sheet material
- Patent number 8,344,332
- Issue date Jan 1, 2013
- Hitachi, Ltd.
- Shiro Eguchi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Electron beam irradiating apparatus with monitoring device
- Patent number 8,227,776
- Issue date Jul 24, 2012
- Japan AE Power System Corporation
- Tomoyuki Hikosaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Electron beam irradiation apparatus for open-mouthed containers
- Patent number 8,222,614
- Issue date Jul 17, 2012
- Japan AE Power Systems Corporation
- Shiro Eguchi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Grant
Electron beam irradiation method, electron beam irradiation apparat...
- Patent number 7,767,987
- Issue date Aug 3, 2010
- Japan AE Power Systems Corporation
- Shiro Eguchi
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Ion beam processing apparatus and method of operating ion source th...
- Patent number 6,635,998
- Issue date Oct 21, 2003
- Hitachi, Ltd.
- Shigeru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanter
- Patent number 6,614,190
- Issue date Sep 2, 2003
- Hitachi, Ltd.
- Hiroyuki Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus and method of operating ion source th...
- Patent number 6,515,426
- Issue date Feb 4, 2003
- Hitachi, Ltd.
- Shigeru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and plasma processing method using the...
- Patent number 6,332,947
- Issue date Dec 25, 2001
- Hitachi, Ltd.
- Satoshi Ichimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus for processing work piece with ion be...
- Patent number 6,320,321
- Issue date Nov 20, 2001
- Hitachi, Ltd.
- Satoshi Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus
- Patent number 6,251,218
- Issue date Jun 26, 2001
- Hitachi, Ltd.
- Tatsuya Fujisawa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus for processing work piece with ion be...
- Patent number 6,184,625
- Issue date Feb 6, 2001
- Hitachi, Ltd.
- Satoshi Ogura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus capable of preventing discharge flaw produ...
- Patent number 6,104,025
- Issue date Aug 15, 2000
- Hitachi, Ltd.
- Katsumi Tokiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Plasma processing apparatus and plasma processing method using the...
- Patent number 5,961,773
- Issue date Oct 5, 1999
- Hitachi, Ltd.
- Satoshi Ichimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion implanting apparatus capable of preventing discharge flaw produ...
- Patent number 5,945,681
- Issue date Aug 31, 1999
- Hitachi, Ltd.
- Katsumi Tokiguchi
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Ion implanter for implanting ion on wafer with low contamination
- Patent number 5,932,883
- Issue date Aug 3, 1999
- Hitachi, Ltd.
- Isao Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion injection device and method therefor
- Patent number 5,753,923
- Issue date May 19, 1998
- Hitachi, Ltd.
- Kazuo Mera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Thickness/depth measuring apparatus and method for measuring the th...
- Patent number 5,371,582
- Issue date Dec 6, 1994
- Hitachi, Ltd.
- Tamaki Toba
- G01 - MEASURING TESTING
Information Patent Grant
Microwave-powered plasma-generating apparatus and method
- Patent number 5,266,146
- Issue date Nov 30, 1993
- Hitachi, Ltd.
- Yasunori Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion beam processing apparatus and specimen replacing method for the...
- Patent number 5,247,181
- Issue date Sep 21, 1993
- Hitachi, Ltd.
- Hisao Oonuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ion source and method of drawing out ion beam
- Patent number 4,870,284
- Issue date Sep 26, 1989
- Hitachi, Ltd.
- Isao Hashimoto
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Film formation through co-deposition with high and low energy beams
- Patent number 4,759,948
- Issue date Jul 26, 1988
- Hitachi, Ltd.
- Isao Hashimoto
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS FOR OPEN-MOUTHED CONTAINERS
- Publication number 20110084221
- Publication date Apr 14, 2011
- JAPAN AE POWER SYSTEMS CORPORATION
- Shiro Eguchi
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Application
ELECTRON BEAM IRRADIATION APPARATUS FOR STERILIZING SHEET MATERIAL
- Publication number 20110062347
- Publication date Mar 17, 2011
- JAPAN AE POWER SYSTEMS CORPORATION
- Shiro Eguchi
- A61 - MEDICAL OR VETERINARY SCIENCE HYGIENE
Information Patent Application
ELECTRON BEAM IRRADIATING APPARATUS WITH MONITORING DEVICE
- Publication number 20110062351
- Publication date Mar 17, 2011
- JAPAN AE POWER SYSTEMS CORPORATION
- Tomoyuki Hikosaka
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
Electron Beam Irradiation Method, Electron Beam Irradiation Apparat...
- Publication number 20090134338
- Publication date May 28, 2009
- JAPAN AE POWER SYSTEMS CORPORATION
- Shiro Eguchi
- A23 - FOODS OR FOODSTUFFS THEIR TREATMENT, NOT COVERED BY OTHER CLASSES
Information Patent Application
Ion beam processing apparatus and method of operating ion source th...
- Publication number 20030030009
- Publication date Feb 13, 2003
- Hitachi, Ltd.
- Shigeru Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion implanter
- Publication number 20020105277
- Publication date Aug 8, 2002
- Hiroyuki Tomita
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Ion beam processing apparatus for processing work piece with ion be...
- Publication number 20010005119
- Publication date Jun 28, 2001
- Hitachi, Ltd.
- Satoshi Ogura
- H01 - BASIC ELECTRIC ELEMENTS

Isao Hashimoto

Person

Patents Grantslast 30 patents

Electron beam irradiation apparatus for sterilizing sheet material

Electron beam irradiating apparatus with monitoring device

Electron beam irradiation apparatus for open-mouthed containers

Electron beam irradiation method, electron beam irradiation apparat...

Ion beam processing apparatus and method of operating ion source th...

Ion implanter

Ion beam processing apparatus and method of operating ion source th...

Plasma processing apparatus and plasma processing method using the...

Ion beam processing apparatus for processing work piece with ion be...

Ion beam processing apparatus

Ion beam processing apparatus for processing work piece with ion be...

Ion implanting apparatus capable of preventing discharge flaw produ...

Plasma processing apparatus and plasma processing method using the...

Ion implanting apparatus capable of preventing discharge flaw produ...

Ion implanter for implanting ion on wafer with low contamination

Ion injection device and method therefor

Thickness/depth measuring apparatus and method for measuring the th...

Microwave-powered plasma-generating apparatus and method

Ion beam processing apparatus and specimen replacing method for the...

Ion source and method of drawing out ion beam

Film formation through co-deposition with high and low energy beams

Patents Applicationslast 30 patents

ELECTRON BEAM IRRADIATION APPARATUS FOR OPEN-MOUTHED CONTAINERS

ELECTRON BEAM IRRADIATION APPARATUS FOR STERILIZING SHEET MATERIAL

ELECTRON BEAM IRRADIATING APPARATUS WITH MONITORING DEVICE

Electron Beam Irradiation Method, Electron Beam Irradiation Apparat...

Ion beam processing apparatus and method of operating ion source th...

Ion implanter

Ion beam processing apparatus for processing work piece with ion be...