Isao Nishimura

Person

Edogawa-ku, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Circuit board
- Patent number 11,582,860
- Issue date Feb 14, 2023
- JSR Corporation
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Circuit board
- Patent number 11,516,906
- Issue date Nov 29, 2022
- JSR Corporation
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
High-frequency circuit laminate and method for producing same, and...
- Patent number 11,134,568
- Issue date Sep 28, 2021
- JSR Corporation
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Method of producing microfluidic device, microfluidic device, and p...
- Patent number 10,272,426
- Issue date Apr 30, 2019
- JSR Corporation
- Isao Nishimura
- B81 - MICRO-STRUCTURAL TECHNOLOGY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 9,348,226
- Issue date May 24, 2016
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Acid generators, sulfonic acids, sulfonyl halides, and radiation se...
- Patent number 8,043,786
- Issue date Oct 25, 2011
- JSR Corporation
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,638,261
- Issue date Dec 29, 2009
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,531,286
- Issue date May 12, 2009
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive resin composition
- Patent number 7,521,169
- Issue date Apr 21, 2009
- JSR Corporation
- Yukio Nishimura
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Photoresist polymers
- Patent number 7,517,634
- Issue date Apr 14, 2009
- JSR Corporation
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photoresist polymer compositions
- Patent number 7,510,817
- Issue date Mar 31, 2009
- JSR Corporation
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Synthesis of photoresist polymers
- Patent number 7,399,806
- Issue date Jul 15, 2008
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition
- Patent number 7,297,461
- Issue date Nov 20, 2007
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Synthesis of photoresist polymers
- Patent number 7,250,475
- Issue date Jul 31, 2007
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Composition having permitivity being radiation-sensitively changeab...
- Patent number 7,205,085
- Issue date Apr 17, 2007
- JSR Corporation
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Radiation-sensitive composition changing in refractive index and ut...
- Patent number 7,125,647
- Issue date Oct 24, 2006
- JSR Corporation
- Isao Nishimura
- G02 - OPTICS
Information Patent Grant
Radiation-sensitive composition changing in refractive index and me...
- Patent number 7,108,954
- Issue date Sep 19, 2006
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Radiation-sensitive composition capable of having refractive index...
- Patent number 7,071,255
- Issue date Jul 4, 2006
- JSR Corporation
- Isao Nishimura
- G02 - OPTICS
Information Patent Grant
Radiation sensitive resin composition, cathode separator and EL dis...
- Patent number 6,994,944
- Issue date Feb 7, 2006
- JSR Corporation
- Isao Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Composition having refractive index sensitively changeable by radia...
- Patent number 6,828,078
- Issue date Dec 7, 2004
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation-sensitive composition, insulating film and organic EL dis...
- Patent number 6,797,450
- Issue date Sep 28, 2004
- JSR Corporation
- Masayoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Radiation sensitive resin composition for forming barrier ribs for...
- Patent number 6,756,165
- Issue date Jun 29, 2004
- JSR Corporation
- Isao Nishimura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Preparation of copolymers
- Patent number 6,677,419
- Issue date Jan 13, 2004
- International Business Machines Corporation
- Phillip J. Brock
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition and use of the same in an int...
- Patent number 6,399,267
- Issue date Jun 4, 2002
- JSR Corporation
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Radiation sensitive resin composition
- Patent number 5,958,648
- Issue date Sep 28, 1999
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
CIRCUIT BOARD
- Publication number 20200344870
- Publication date Oct 29, 2020
- JSR Corporation
- Isao NISHIMURA
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH-FREQUENCY CIRCUIT LAMINATE AND METHOD FOR PRODUCING SAME, AND...
- Publication number 20200281076
- Publication date Sep 3, 2020
- JSR Corporation
- Isao NISHIMURA
- B32 - LAYERED PRODUCTS
Information Patent Application
METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND P...
- Publication number 20160310944
- Publication date Oct 27, 2016
- JSR Corporation
- Isao NISHIMURA
- B32 - LAYERED PRODUCTS
Information Patent Application
DISPENSING NOZZLE AND AUTOMATIC ANALYZER
- Publication number 20100150782
- Publication date Jun 17, 2010
- Beckman Coulter, Inc.
- Norichika Fukushima
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
CLEANING DEVICE AND ANALYZER
- Publication number 20100126536
- Publication date May 27, 2010
- Beckman Coulter, Inc.
- Hiroshi Tsuruta
- B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
Information Patent Application
RADIATION-SENSITIVE RESIN COMPOSITION
- Publication number 20090148790
- Publication date Jun 11, 2009
- JSR Corporation
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DISPENSING APPARATUS, DISPENSING METHOD, AND AUTOMATIC ANALYZER
- Publication number 20090056477
- Publication date Mar 5, 2009
- OLYMPUS CORPORATION
- Isao NISHIMURA
- G01 - MEASURING TESTING
Information Patent Application
Radiation-Sensitive Resin Composition
- Publication number 20080187859
- Publication date Aug 7, 2008
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Compos...
- Publication number 20080026314
- Publication date Jan 31, 2008
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-Sensitive Resin Composition
- Publication number 20070269735
- Publication date Nov 22, 2007
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Synthesis of Photresist Polymers
- Publication number 20070185276
- Publication date Aug 9, 2007
- Symyx Technologies, Inc.
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Acid generators, sulfonic acids, sulfonyl halides, and radiation se...
- Publication number 20070054214
- Publication date Mar 8, 2007
- Satoshi Ebata
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Photoresist polymer compositions
- Publication number 20060257781
- Publication date Nov 16, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234153
- Publication date Oct 19, 2006
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060234154
- Publication date Oct 19, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20060223001
- Publication date Oct 5, 2006
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist polymers
- Publication number 20060217519
- Publication date Sep 28, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Synthesis of photoresist polymers
- Publication number 20060122346
- Publication date Jun 8, 2006
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation sensitive resin composition, cathode separator and EL dis...
- Publication number 20050260526
- Publication date Nov 24, 2005
- JSR Corporation
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation sensitive resin composition
- Publication number 20050171226
- Publication date Aug 4, 2005
- Isao Nishimura
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Synthesis of photoresist polymers
- Publication number 20050059787
- Publication date Mar 17, 2005
- Didier Benoit
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Radiation-sensitive composition changing in refractive index and me...
- Publication number 20040013972
- Publication date Jan 22, 2004
- Isao Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition having permitivity being radiation-sensitively changeab...
- Publication number 20040005506
- Publication date Jan 8, 2004
- Isao Nishimura
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20030219680
- Publication date Nov 27, 2003
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive resin composition
- Publication number 20030203309
- Publication date Oct 30, 2003
- Yukio Nishimura
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Radiation-sensitive composition capable of having refractive index...
- Publication number 20030187119
- Publication date Oct 2, 2003
- Isao Nishimura
- G02 - OPTICS
Information Patent Application
Radiation-sensitive composition changing in refractive index and ut...
- Publication number 20030171468
- Publication date Sep 11, 2003
- Isao Nishimura
- G02 - OPTICS
Information Patent Application
Composition having refractive index sensitively changeable by radia...
- Publication number 20030064303
- Publication date Apr 3, 2003
- Isao Nishimura
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Radiation-sensitive composition, insulating film and organic el dis...
- Publication number 20030054284
- Publication date Mar 20, 2003
- Masayoshi Suzuki
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Radiation sensitive resin composition, cathode separator and el dis...
- Publication number 20020055059
- Publication date May 9, 2002
- JSR CORPORATION
- Isao Nishimura
- H01 - BASIC ELECTRIC ELEMENTS

Isao Nishimura

Person

Patents Grantslast 30 patents

Circuit board

Circuit board

High-frequency circuit laminate and method for producing same, and...

Method of producing microfluidic device, microfluidic device, and p...

Radiation-sensitive resin composition

Acid generators, sulfonic acids, sulfonyl halides, and radiation se...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Photoresist polymers

Photoresist polymer compositions

Synthesis of photoresist polymers

Radiation sensitive resin composition

Synthesis of photoresist polymers

Composition having permitivity being radiation-sensitively changeab...

Radiation-sensitive composition changing in refractive index and ut...

Radiation-sensitive composition changing in refractive index and me...

Radiation-sensitive composition capable of having refractive index...

Radiation sensitive resin composition, cathode separator and EL dis...

Composition having refractive index sensitively changeable by radia...

Radiation-sensitive composition, insulating film and organic EL dis...

Radiation sensitive resin composition for forming barrier ribs for...

Preparation of copolymers

Radiation sensitive resin composition and use of the same in an int...

Radiation sensitive resin composition

Patents Applicationslast 30 patents

CIRCUIT BOARD

HIGH-FREQUENCY CIRCUIT LAMINATE AND METHOD FOR PRODUCING SAME, AND...

METHOD OF PRODUCING MICROFLUIDIC DEVICE, MICROFLUIDIC DEVICE, AND P...

DISPENSING NOZZLE AND AUTOMATIC ANALYZER

CLEANING DEVICE AND ANALYZER

RADIATION-SENSITIVE RESIN COMPOSITION

DISPENSING APPARATUS, DISPENSING METHOD, AND AUTOMATIC ANALYZER

Radiation-Sensitive Resin Composition

Silane Compound, Polysiloxane, and Radiation-Sensitive Resin Compos...

Radiation-Sensitive Resin Composition

Synthesis of Photresist Polymers

Acid generators, sulfonic acids, sulfonyl halides, and radiation se...

Photoresist polymer compositions

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Photoresist polymers

Synthesis of photoresist polymers

Radiation sensitive resin composition, cathode separator and EL dis...

Radiation sensitive resin composition

Synthesis of photoresist polymers

Radiation-sensitive composition changing in refractive index and me...

Composition having permitivity being radiation-sensitively changeab...

Radiation-sensitive resin composition

Radiation-sensitive resin composition

Radiation-sensitive composition capable of having refractive index...

Radiation-sensitive composition changing in refractive index and ut...

Composition having refractive index sensitively changeable by radia...

Radiation-sensitive composition, insulating film and organic el dis...

Radiation sensitive resin composition, cathode separator and el dis...