Isao YOSHIDA

Person

Osaka, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 10,160,721
- Issue date Dec 25, 2018
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, photoresist composition, and method for producing...
- Patent number 9,513,549
- Issue date Dec 6, 2016
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt, photoresist composition, and method for producing photoresist...
- Patent number 8,889,333
- Issue date Nov 18, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound and chemically amplified positive resist composition
- Patent number 8,808,960
- Issue date Aug 19, 2014
- Sumitomo Chemical Company, Limited
- Makoto Akita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 8,802,352
- Issue date Aug 12, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,765,351
- Issue date Jul 1, 2014
- Sumitomo Chemical Company, Limted
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Compound, resin, photoresist composition, and method for producing...
- Patent number 8,741,541
- Issue date Jun 3, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, photoresist composition and method for producing photoresist...
- Patent number 8,741,544
- Issue date Jun 3, 2014
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and photoresist composition containing the same
- Patent number 8,735,044
- Issue date May 27, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt, photoresist composition and process for producing photoresist...
- Patent number 8,685,617
- Issue date Apr 1, 2014
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photoresist composition
- Patent number 8,530,135
- Issue date Sep 10, 2013
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Salt and photoresist composition comprising the same
- Patent number 8,530,138
- Issue date Sep 10, 2013
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 8,378,016
- Issue date Feb 19, 2013
- Sumitomo Chemical Company, Limited
- Nobuo Ando
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified resist composition and salt employed therein
- Patent number 8,288,077
- Issue date Oct 16, 2012
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt and process for producing acid generator
- Patent number 8,236,842
- Issue date Aug 7, 2012
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 8,124,803
- Issue date Feb 28, 2012
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Resin suitable for an acid generator
- Patent number 7,932,334
- Issue date Apr 26, 2011
- Sumitomo Chemical Company, Limited
- Nobuo Ando
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,893,293
- Issue date Feb 22, 2011
- Sumitomo Chemical Company, Limited
- Makoto Akita
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified posi...
- Patent number 7,862,980
- Issue date Jan 4, 2011
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,786,322
- Issue date Aug 31, 2010
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition
- Patent number 7,759,045
- Issue date Jul 20, 2010
- Sumitomo Chemical Company, Limited
- Makoto Akita
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified posi...
- Patent number 7,667,050
- Issue date Feb 23, 2010
- Sumitomo Chemical Company, Limited
- Junji Shigematsu
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified posi...
- Patent number 7,579,132
- Issue date Aug 25, 2009
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemically amplified positive resist composition, (meth)acrylate de...
- Patent number 7,556,908
- Issue date Jul 7, 2009
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,531,686
- Issue date May 12, 2009
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,527,910
- Issue date May 5, 2009
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified posi...
- Patent number 7,439,006
- Issue date Oct 21, 2008
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,301,047
- Issue date Nov 27, 2007
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Salt suitable for an acid generator and a chemically amplified resi...
- Patent number 7,262,321
- Issue date Aug 28, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Chemical amplification type resist composition
- Patent number 7,220,532
- Issue date May 22, 2007
- Sumitomo Chemical Company, Limited
- Yoshiyuki Takata
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC

Patents Applicationslast 30 patents

Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20180065924
- Publication date Mar 8, 2018
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING...
- Publication number 20150064622
- Publication date Mar 5, 2015
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20130052588
- Publication date Feb 28, 2013
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20130040239
- Publication date Feb 14, 2013
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING...
- Publication number 20120295201
- Publication date Nov 22, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...
- Publication number 20120264060
- Publication date Oct 18, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST...
- Publication number 20120164579
- Publication date Jun 28, 2012
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME
- Publication number 20120052440
- Publication date Mar 1, 2012
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PROCESS FOR PRODUCING ACID GENERATOR
- Publication number 20110201823
- Publication date Aug 18, 2011
- Sumitomo Chemical Company, Limited
- Isao YOSHIDA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POS...
- Publication number 20110165519
- Publication date Jul 7, 2011
- Nobuo ANDO
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20110117493
- Publication date May 19, 2011
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
PHOTORESIST COMPOSITION
- Publication number 20110076617
- Publication date Mar 31, 2011
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN
- Publication number 20110020749
- Publication date Jan 27, 2011
- Sumitomo Chemical Company, Limited
- Koji Ichikawa
- C07 - ORGANIC CHEMISTRY
Information Patent Application
SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
- Publication number 20100304293
- Publication date Dec 2, 2010
- Sumitomo Chemical Company, Limited
- Koji ICHIKAWA
- C07 - ORGANIC CHEMISTRY
Information Patent Application
COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20100233628
- Publication date Sep 16, 2010
- Sumitomo Chemical Company, Limited
- Makoto AKITA
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
- Publication number 20090004600
- Publication date Jan 1, 2009
- Sumitomo Chemical Company, Limited
- Makoto Akita
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemically amplified positive resist composition
- Publication number 20090004601
- Publication date Jan 1, 2009
- Sumitomo Chemical Company, Limited
- Makoto Akita
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified posi...
- Publication number 20080086014
- Publication date Apr 10, 2008
- Sumitomo Chemical Company, Limited
- Junji Shigematsu
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified posi...
- Publication number 20080081293
- Publication date Apr 3, 2008
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified posi...
- Publication number 20080076063
- Publication date Mar 27, 2008
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified posi...
- Publication number 20080044738
- Publication date Feb 21, 2008
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070184382
- Publication date Aug 9, 2007
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Resin suitable for an acid generator and a chemically amplified pos...
- Publication number 20070149702
- Publication date Jun 28, 2007
- Sumitomo Chemical Company, Limited
- Nobuo Ando
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070122750
- Publication date May 31, 2007
- Sumitomo Chemical Company, Limited
- Satoshi Yamaguchi
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070100158
- Publication date May 3, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070100159
- Publication date May 3, 2007
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070100096
- Publication date May 3, 2007
- Sumitomo Chemical Company, Limited
- Yukako Harada
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Salt suitable for an acid generator and a chemically amplified resi...
- Publication number 20070027336
- Publication date Feb 1, 2007
- Sumitomo Chemical Company, Limited
- Isao Yoshida
- C07 - ORGANIC CHEMISTRY
Information Patent Application
Chemically amplified positive resist composition, (meth)acrylate de...
- Publication number 20050266351
- Publication date Dec 1, 2005
- Sumitomo Chemical Company, Limited
- Ichiki Takemoto
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Chemical amplification type positive resist composition and a resin...
- Publication number 20050100819
- Publication date May 12, 2005
- Sumitomo Chemical Company, Limited
- Yusuke Fuji
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Isao YOSHIDA

Person

Patents Grantslast 30 patents

Salt and photoresist composition containing the same

Compound, resin, photoresist composition, and method for producing...

Salt, photoresist composition, and method for producing photoresist...

Compound and chemically amplified positive resist composition

Salt, photoresist composition and method for producing photoresist...

Salt and photoresist composition containing the same

Compound, resin, photoresist composition, and method for producing...

Salt, photoresist composition and method for producing photoresist...

Salt and photoresist composition containing the same

Salt, photoresist composition and process for producing photoresist...

Photoresist composition

Salt and photoresist composition comprising the same

Chemically amplified positive resist composition

Chemically amplified resist composition and salt employed therein

Salt and process for producing acid generator

Salt suitable for an acid generator and a chemically amplified resi...

Resin suitable for an acid generator

Chemically amplified positive resist composition

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemically amplified positive resist composition

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified posi...

Chemically amplified positive resist composition, (meth)acrylate de...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemical amplification type resist composition

Patents Applicationslast 30 patents

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING...

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

SALT, PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST...

COMPOUND, RESIN, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING...

SALT, PHOTORESIST COMPOSITION, AND METHOD FOR PRODUCING PHOTORESIST...

SALT, PHOTORESIST COMPOSITION AND PROCESS FOR PRODUCING PHOTORESIST...

SALT AND PHOTORESIST COMPOSITION COMPRISING THE SAME

SALT AND PROCESS FOR PRODUCING ACID GENERATOR

RESIN SUITABLE FOR AN ACID GENERATOR AND A CHEMICALLY AMPLIFIED POS...

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PHOTORESIST COMPOSITION

CHEMICALLY AMPLIFIED RESIST COMPOSITION AND SALT EMPLOYED THEREIN

SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME

COMPOUND AND CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION

Chemically amplified positive resist composition

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified posi...

Salt suitable for an acid generator and a chemically amplified resi...

Resin suitable for an acid generator and a chemically amplified pos...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Salt suitable for an acid generator and a chemically amplified resi...

Chemically amplified positive resist composition, (meth)acrylate de...

Chemical amplification type positive resist composition and a resin...