Issei Imahashi

Person

Yamanashi, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for plasma processing
- Patent number 6,431,114
- Issue date Aug 13, 2002
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma polishing method
- Patent number 6,284,668
- Issue date Sep 4, 2001
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming polycrystalline silicon film in process of manufa...
- Patent number RE36371
- Issue date Nov 2, 1999
- Tokyo Electron Limited
- Issei Imahashi
- 427 - Coating processes
Information Patent Grant
Semiconductor processing system
- Patent number 5,695,564
- Issue date Dec 9, 1997
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus with a rotating electromagnetic field
- Patent number 5,554,223
- Issue date Sep 10, 1996
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low frequency electron cyclotron resonance plasma processor
- Patent number 5,537,004
- Issue date Jul 16, 1996
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for manufacturing a liquid crystal display substrate, and...
- Patent number 5,529,630
- Issue date Jun 25, 1996
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for manufacturing a liquid crystal display substrate
- Patent number 5,413,958
- Issue date May 9, 1995
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor wafer heat treatment apparatus
- Patent number 5,414,244
- Issue date May 9, 1995
- Tokyo Electron Limited
- Issei Imahashi
- C30 - CRYSTAL GROWTH
Information Patent Grant
Plasma processing method
- Patent number 5,374,327
- Issue date Dec 20, 1994
- Tokyo Electron Limited
- Issei Imahashi
- G01 - MEASURING TESTING
Information Patent Grant
Method of forming polycrystalling silicon film in process of manufa...
- Patent number 5,372,836
- Issue date Dec 13, 1994
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma processing apparatus
- Patent number 5,342,472
- Issue date Aug 30, 1994
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for processing semiconductor wafer comprising continuousl...
- Patent number 5,338,362
- Issue date Aug 16, 1994
- Tokyo Electron Limited
- Issei Imahashi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Probe apparatus
- Patent number 5,198,755
- Issue date Mar 30, 1993
- Tokyo Electron Limited
- Towl Ikeda
- G01 - MEASURING TESTING
Information Patent Grant
Plasma generating apparatus
- Patent number 5,173,641
- Issue date Dec 22, 1992
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport apparatus for ion implantation apparatus
- Patent number 5,004,924
- Issue date Apr 2, 1991
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport apparatus for ion implantation apparatus
- Patent number 4,873,447
- Issue date Oct 10, 1989
- Tokyo Electron Limited
- Issei Imahashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for registering a mask pattern in a photo-etching apparat...
- Patent number 4,441,250
- Issue date Apr 10, 1984
- Telmec Co., Ltd.
- Issei Imahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for measuring a gap distance between a mask an...
- Patent number 4,397,078
- Issue date Aug 9, 1983
- Telmec Co., Ltd.
- Issei Imahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Linear motor
- Patent number 4,390,827
- Issue date Jun 28, 1983
- Telmec Co., Ltd.
- Issei Imahashi
- G05 - CONTROLLING REGULATING
Information Patent Grant
Method for registering a mask pattern in a photo-etching apparatus...
- Patent number 4,377,028
- Issue date Mar 22, 1983
- Telmec Co., Ltd.
- Issei Imahashi
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Micro-displacement device
- Patent number 4,347,452
- Issue date Aug 31, 1982
- Telmec Co., Ltd.
- Issei Imahashi
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER

Issei Imahashi

Person

Patents Grantslast 30 patents

Method and apparatus for plasma processing

Plasma polishing method

Method of forming polycrystalline silicon film in process of manufa...

Semiconductor processing system

Plasma processing apparatus with a rotating electromagnetic field

Low frequency electron cyclotron resonance plasma processor

Apparatus for manufacturing a liquid crystal display substrate, and...

Method for manufacturing a liquid crystal display substrate

Semiconductor wafer heat treatment apparatus

Plasma processing method

Method of forming polycrystalling silicon film in process of manufa...

Plasma processing apparatus

Apparatus for processing semiconductor wafer comprising continuousl...

Probe apparatus

Plasma generating apparatus

Wafer transport apparatus for ion implantation apparatus

Wafer transport apparatus for ion implantation apparatus

Apparatus for registering a mask pattern in a photo-etching apparat...

Method and apparatus for measuring a gap distance between a mask an...

Linear motor

Method for registering a mask pattern in a photo-etching apparatus...

Micro-displacement device