Issei Takemoto

Person

Yokohama, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Photosensitive polyimide precursor and its use for pattern formation
- Patent number 6,319,656
- Issue date Nov 20, 2001
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitve polymide precursor and its use for pattern formation
- Patent number 6,025,113
- Issue date Feb 15, 2000
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Light-sensitive polymer composition with poly(amic acid), bisazide,...
- Patent number 4,565,767
- Issue date Jan 21, 1986
- Hitachi, Ltd.
- Fumio Kataoka
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Heat-resistant silicone block polymer
- Patent number 4,513,132
- Issue date Apr 23, 1985
- Hitachi, Ltd.
- Fusaji Shoji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Photosensitive compositions containing polyamides acid with photose...
- Patent number 4,321,319
- Issue date Mar 23, 1982
- Hitachi, Ltd.
- Fusaji Shoji
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Liquid crystal display device
- Patent number 4,273,420
- Issue date Jun 16, 1981
- Hitachi, Ltd.
- Takeshi Watanabe
- G02 - OPTICS
Information Patent Grant
Flame-retardant epoxy resin compositions
- Patent number 4,145,369
- Issue date Mar 20, 1979
- Hitachi, Ltd.
- Yasuo Hira
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Photosensitive polyimide precursor and its use for pattern formation
- Publication number 20020048726
- Publication date Apr 25, 2002
- Hitachi Chemical Company, Ltd.
- Haruhiko Kikkawa
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Issei Takemoto

Person

Patents Grantslast 30 patents

Photosensitive polyimide precursor and its use for pattern formation

Photosensitve polymide precursor and its use for pattern formation

Light-sensitive polymer composition with poly(amic acid), bisazide,...

Heat-resistant silicone block polymer

Photosensitive compositions containing polyamides acid with photose...

Liquid crystal display device

Flame-retardant epoxy resin compositions

Patents Applicationslast 30 patents

Photosensitive polyimide precursor and its use for pattern formation