Itaru Kanno

Person

Kumamoto, JP

People

Patents Grantslast 30 patents

Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 11,367,630
- Issue date Jun 21, 2022
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method, recording medium and substrate process...
- Patent number 11,201,050
- Issue date Dec 14, 2021
- Tokyo Electron Limited
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning apparatus, substrate cleaning system, substrate...
- Patent number 10,998,183
- Issue date May 4, 2021
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing method
- Patent number 10,835,908
- Issue date Nov 17, 2020
- Tokyo Electron Limited
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 10,811,283
- Issue date Oct 20, 2020
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing system, substrate cleaning method, and recordi...
- Patent number 10,792,711
- Issue date Oct 6, 2020
- Tokyo Electron Limited
- Meitoku Aibara
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system and memory medium
- Patent number 10,734,255
- Issue date Aug 4, 2020
- Tokyo Electron Limited
- Kenji Sekiguchi
- B08 - CLEANING
Information Patent Grant
Substrate processing system, substrate cleaning method, and recordi...
- Patent number 10,272,478
- Issue date Apr 30, 2019
- Tokyo Electron Limited
- Meitoku Aibara
- B08 - CLEANING
Information Patent Grant
Substrate liquid processing method and substrate liquid processing...
- Patent number 10,242,889
- Issue date Mar 26, 2019
- Tokyo Electron Limited
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate processing apparatus, substrate processing method and sto...
- Patent number 10,083,845
- Issue date Sep 25, 2018
- Tokyo Electron Limited
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 10,043,652
- Issue date Aug 7, 2018
- Tokyo Electron Limited
- Miyako Kaneko
- B08 - CLEANING
Information Patent Grant
Substrate cleaning method, substrate cleaning system, and memory me...
- Patent number 9,953,826
- Issue date Apr 24, 2018
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and recording medium
- Patent number 9,818,598
- Issue date Nov 14, 2017
- Tokyo Electron Limited
- Meitoku Aibara
- B08 - CLEANING
Information Patent Grant
Substrate cleaning system
- Patent number 9,799,538
- Issue date Oct 24, 2017
- Tokyo Electron Limited
- Miyako Kaneko
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Substrate cleaning method and substrate cleaning system
- Patent number 9,443,712
- Issue date Sep 13, 2016
- Tokyo Electron Limited
- Miyako Kaneko
- B08 - CLEANING
Information Patent Grant
Substrate processing apparatus and substrate processing method
- Patent number 9,378,940
- Issue date Jun 28, 2016
- Tokyo Electron Limited
- Hisashi Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, manufacturing method of semiconductor device,...
- Patent number 9,362,184
- Issue date Jun 7, 2016
- Renesas Electronics Corporation
- Takahiko Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device, manufacturing method of semiconductor device,...
- Patent number 8,946,895
- Issue date Feb 3, 2015
- Renesas Electronics Corporation
- Takahiko Kato
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Manufacturing method of semiconductor device
- Patent number 8,569,136
- Issue date Oct 29, 2013
- Renesas Electronic Corporation
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-fluid nozzle for cleaning substrate and substrate cleaning appa...
- Patent number 8,037,891
- Issue date Oct 18, 2011
- Tokyo Electron Limited
- Itaru Kanno
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Semiconductor device manufacturing method
- Patent number 7,537,987
- Issue date May 26, 2009
- Renesas Technology Corp.
- Masahiko Higashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning composition for removing resists and method of manufacturi...
- Patent number 7,250,391
- Issue date Jul 31, 2007
- Renesas Technology Corp.
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cleaning agent for semiconductor device & method of fabrica...
- Patent number 6,730,239
- Issue date May 4, 2004
- Renesas Technology Corp.
- Itaru Kanno
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Method of manufacturing semiconductor device with improved removal...
- Patent number 6,713,232
- Issue date Mar 30, 2004
- Kao Corporation
- Seiji Muranaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Two-fluid cleaning jet nozzle, cleaning equipment and method of fab...
- Patent number 6,708,903
- Issue date Mar 23, 2004
- Renesas Technology Corp.
- Itaru Kanno
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Resist residue removal apparatus and method
- Patent number 6,358,329
- Issue date Mar 19, 2002
- Mitsubishi Denki Kabushiki Kaisha
- Seiji Muranaka
- B08 - CLEANING
Information Patent Grant
Method and apparatus for manufacturing semiconductor device
- Patent number 6,199,567
- Issue date Mar 13, 2001
- Mitsubishi Denki Kabushiki Kaisha
- Itaru Kanno
- B08 - CLEANING
Information Patent Grant
Post-treatment method for dry etching
- Patent number 6,092,537
- Issue date Jul 25, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Itaru Kanno
- B24 - GRINDING POLISHING
Information Patent Grant
Washing apparatus and washing method
- Patent number 6,048,409
- Issue date Apr 11, 2000
- Mitsubishi Denki Kabushiki Kaisha
- Itaru Kanno
- B08 - CLEANING
Information Patent Grant
Washing apparatus and washing method
- Patent number 5,934,566
- Issue date Aug 10, 1999
- Mitsubishi Denki Kabushiki Kaisha
- Itaru Kanno
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20220277968
- Publication date Sep 1, 2022
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20200395230
- Publication date Dec 17, 2020
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SUBSTRATE PROCESS...
- Publication number 20190355574
- Publication date Nov 21, 2019
- TOKYO ELECTRON LIMITED
- Itaru Kanno
- F26 - DRYING
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...
- Publication number 20190118227
- Publication date Apr 25, 2019
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING METHOD
- Publication number 20180264492
- Publication date Sep 20, 2018
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM
- Publication number 20170345685
- Publication date Nov 30, 2017
- TOKYO ELECTRON LIMITED
- Kenji SEKIGUCHI
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...
- Publication number 20160225682
- Publication date Aug 4, 2016
- TOKYO ELECTRON LIMITED
- Itaru Kanno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...
- Publication number 20160163534
- Publication date Jun 9, 2016
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE LIQUID PROCESSING...
- Publication number 20160064257
- Publication date Mar 3, 2016
- TOKYO ELECTRON LIMITED
- Jun Nonaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...
- Publication number 20160035561
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM
- Publication number 20160035564
- Publication date Feb 4, 2016
- TOKYO ELECTRON LIMITED
- Meitoku AIBARA
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20150128995
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...
- Publication number 20150128994
- Publication date May 14, 2015
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE,...
- Publication number 20150104889
- Publication date Apr 16, 2015
- RENESAS ELECTRONICS CORPORATION
- Takahiko KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...
- Publication number 20150064910
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...
- Publication number 20150064911
- Publication date Mar 5, 2015
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM
- Publication number 20140144464
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Miyako Kaneko
- B08 - CLEANING
Information Patent Application
SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM
- Publication number 20140144465
- Publication date May 29, 2014
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...
- Publication number 20140041685
- Publication date Feb 13, 2014
- TOKYO ELECTRON LIMITED
- Miyako KANEKO
- B08 - CLEANING
Information Patent Application
SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
- Publication number 20130340796
- Publication date Dec 26, 2013
- Hisashi Kawano
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A SEMICONDUCTOR DEVICE
- Publication number 20130189835
- Publication date Jul 25, 2013
- RENESAS ELECTRONICS CORPORATION
- Hirokazu KURISU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
- Publication number 20120258576
- Publication date Oct 11, 2012
- Renesas Electronics Corporation
- Itaru KANNO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME
- Publication number 20110298097
- Publication date Dec 8, 2011
- Renesas Electronics Corporation
- Manabu Sueyoshi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR CLEANING A SEMICONDUCTOR DEVICE
- Publication number 20100330794
- Publication date Dec 30, 2010
- RENESAS TECHNOLOGY CORPORATION
- Hirokazu KURISU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR FABRICATING SEMICONDUCTOR DEVICE
- Publication number 20100178764
- Publication date Jul 15, 2010
- Kenji NARITA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE,...
- Publication number 20090218694
- Publication date Sep 3, 2009
- Takahiko KATO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
- Publication number 20090137118
- Publication date May 28, 2009
- RENESAS TECHNOLOGY CORP.
- Yusaku Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER
- Publication number 20090014028
- Publication date Jan 15, 2009
- RENESAS TECHNOLOGY CORP.
- Yusaku Hirota
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Two-fluid nozzle for cleaning substrate and substrate cleaning appa...
- Publication number 20070141849
- Publication date Jun 21, 2007
- TOKYO ELECTRON LIMITED
- Itaru Kanno
- B08 - CLEANING
Information Patent Application
SEMICONDUCTOR DEVICE MANUFACTURING METHOD
- Publication number 20070099406
- Publication date May 3, 2007
- Renesas Technology Corp.
- Masahiko Higashi
- H01 - BASIC ELECTRIC ELEMENTS

Itaru Kanno

Person

Patents Grantslast 30 patents

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate processing method, recording medium and substrate process...

Substrate cleaning apparatus, substrate cleaning system, substrate...

Substrate processing method

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate processing system, substrate cleaning method, and recordi...

Substrate cleaning method, substrate cleaning system and memory medium

Substrate processing system, substrate cleaning method, and recordi...

Substrate liquid processing method and substrate liquid processing...

Substrate processing apparatus, substrate processing method and sto...

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate cleaning method, substrate cleaning system, and memory me...

Substrate cleaning method and recording medium

Substrate cleaning system

Substrate cleaning method and substrate cleaning system

Substrate processing apparatus and substrate processing method

Semiconductor device, manufacturing method of semiconductor device,...

Semiconductor device, manufacturing method of semiconductor device,...

Manufacturing method of semiconductor device

Two-fluid nozzle for cleaning substrate and substrate cleaning appa...

Semiconductor device manufacturing method

Cleaning composition for removing resists and method of manufacturi...

Cleaning agent for semiconductor device &#x00026; method of fabrica...

Method of manufacturing semiconductor device with improved removal...

Two-fluid cleaning jet nozzle, cleaning equipment and method of fab...

Resist residue removal apparatus and method

Method and apparatus for manufacturing semiconductor device

Post-treatment method for dry etching

Washing apparatus and washing method

Washing apparatus and washing method

Patents Applicationslast 30 patents

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE PROCESSING METHOD, RECORDING MEDIUM AND SUBSTRATE PROCESS...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...

SUBSTRATE PROCESSING METHOD

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM AND MEMORY MEDIUM

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND STO...

SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...

SUBSTRATE LIQUID PROCESSING METHOD AND SUBSTRATE LIQUID PROCESSING...

SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDI...

SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SUBSTRATE CLEANING METHOD, SUBSTRATE CLEANING SYSTEM, AND MEMORY ME...

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE,...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING SYSTEM AND MEMORY...

SUBSTRATE PROCESSING METHOD, SUBSTRATE PROCESSING APPARATUS AND STO...

SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING SYSTEM

SUBSTRATE CLEANING SYSTEM, SUBSTRATE CLEANING METHOD AND MEMORY MEDIUM

SUBSTRATE CLEANING APPARATUS, SUBSTRATE CLEANING SYSTEM, SUBSTRATE...

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

METHOD FOR CLEANING A SEMICONDUCTOR DEVICE

MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME

METHOD FOR CLEANING A SEMICONDUCTOR DEVICE

METHOD FOR FABRICATING SEMICONDUCTOR DEVICE

SEMICONDUCTOR DEVICE, MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE,...

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

METHOD OF CLEANING SUBSTRATES AND SUBSTRATE CLEANER

Two-fluid nozzle for cleaning substrate and substrate cleaning appa...

SEMICONDUCTOR DEVICE MANUFACTURING METHOD

Cleaning agent for semiconductor device & method of fabrica...